Patent classifications
H05H1/246
SYSTEM AND METHOD FOR OPERATING A PLASMA JET CONFIGURATION
The invention relates to a system (1) for generating and controlling a non-thermal atmospheric pressure plasma, comprising: a discharge space (10) into which a working gas can be introduced via a first opening (12), wherein a plasma (5) can be generated in the discharge space (10), wherein the discharge space (10) has a second opening (14), so that the plasma (5, 6) can exit from the discharge space (10) through this second opening (14) and at least one high-voltage electrode (20) for generating an electromagnetic field for generating a plasma (5) in the discharge space (10). The plasma (5, 6) exiting through the second opening (14) is controlled by a throughflow controller (40) of the system (1), which throughflow controller (40) is designed to adjust a volume flow (60) of the working gas through the first opening (12) from a working gas source (50) into the discharge space (10). In this case, the throughflow controller (40) is further designed to assume at least a first state and a second state, wherein in the first state no working gas is supplied from the working gas source (50) to the discharge space (10), so that no plasma (5) exits from the second opening (14) even when there is a generated electromagnetic field in the discharge space (10), and wherein in the second state the working gas is supplied from the working gas source (50) to the discharge space (10), a plasma (5) is generated in the discharge space (10) and the plasma (5, 6) exits from the second opening (14).
Nozzle, substrate processing apparatus including the same, and substrate processing method
The inventive concept provides a nozzle for dispensing a treatment liquid in which plasma is generated. The nozzle includes a body having an interior space, a liquid supply unit that supplies the treatment liquid into the interior space, and electrodes that generate the plasma in the interior space. The liquid supply unit supplies the treatment liquid in a bubbling state into the interior space, or causes the treatment liquid to bubble in the interior space.
Method for making and using cold atmospheric plasma stimulated media for cancer treatment
A method for preparing cold atmospheric plasma stimulated cell culture media with a cold atmospheric plasma system having a delivery port out of which an inert gas flows. The inert gas may be helium. The method comprises the steps of placing a cell culture media in a first well, the first well having a bottom and having a diameter greater than 20 mm; wherein the cell culture media placed in the first well has a volume of 4 ml or less, treating the cell culture media in the first well with cold atmospheric plasma, wherein the treating is performed with a gap between the delivery port and the bottom of the first well is between 2.5 cm and 3.5 cm, and transferring a portion of the treated media to cultured cancer cells in a second well. The cold atmospheric plasma may be applied for 0.5 minutes to 2 minutes.
Plasma device with an external RF hollow cathode for plasma cleaning of high vacuum systems
A compact cylindrical vacuum chamber made from a dielectric ceramic or glass wrapped with a cylindrical electrode connected to an RF source make a hollow cathode RF plasma source. The dielectric cylinder is used as the vacuum container with the conductive electrode outside the vacuum region to excite plasma inside. A gas is supplied by a gas source at low flow on one end of the cylinder and after being excited exhausts into a connected vacuum chamber carrying excited metastables and radicals. RF power is applied to the electrode to excite the plasma via the hollow cathode effect. This remote RF plasma source can be used to create ions, electrons, excited metastables, and atomic radicals for use downstream depending on choices of gas, pressure, flow rates, RF power and frequency, and extraction electrodes.
DIFFUSIVE PLASMA AIR TREATMENT AND MATERIAL PROCESSING
The Diffusive Plasma is for effective treatment of contaminated air and material processing. Air is purified and disinfected by passing through the diffusive plasma device which includes a reactor or a plurality of reactors arranged in parallel or series and is energized by a high voltage alternating current power supply. The diffuser, being electrically isolated, provides extra nucleation sites to initiate discharges. It serves to improve the generation of uniform and consistent plasma and to reduce the variation of discharge properties among the reactors. The addition of a diffuser, thereby, enhances the overall effectiveness of decomposing chemicals and destroying microbes to achieve high air treatment and material processing performance. The diffuser can be made of suitable filtering materials to additionally serve as a filter. By incorporating suitable catalytic materials with the diffuser, the reactor becomes a catalytic plasma reactor wherein the plasma environment provides enhanced catalytic functions. Effective plasma power deposition may be obtained by controlling the amplitude, waveform period and shape of the voltage applied to the electrodes of the reactor and hence the operation of the reactors with plasma discharged of selected conditions for optimizing the treatment and processing efficiency while minimizing the generation of unwanted bi-product gases. The present invention also relates to a method for effective air treatment and material processing.
IN SITU TAILORING OF MATERIAL PROPERTIES IN 3D PRINTED ELECTRONICS
Systems and methods for highly reproducible and focused plasma jet printing and patterning of materials using appropriate ink containing aerosol through nozzles with narrow orifice and tubes with controlled dielectric constant connected to high voltage power supply, in the presence of electric field and plasma, that enables morphological and/or bulk chemical modification and/or surface chemical modification of the material in the aerosol and/or the substrate prior to printing, during printing and post printing.
Capacitively coupled devices and oscillators
Certain embodiments described herein are directed to devices that can be used to sustain a capacitively coupled plasma. In some examples, a capacitive device can be used to sustain a capacitively coupled plasma in a torch in the absence of any substantial inductive coupling. In certain embodiments, a helium gas flow can be used with the capacitive device to sustain a capacitively coupled plasma.
Plasma emitting method and plasma emitting device
Water is flowed inside main body section formed from an insulating material such that a specified space remains inside the main body section. Electrodes and are arranged along the outer walls of the main body section and voltage is applied to the electrodes. Processing gas present inside the main body section is plasmarized and plasma is emitted to the water flowing inside the main body section.
SYSTEMS AND METHODS FOR IGNITING PLASMA WITHIN TUBES
A system is provided for generating plasma within narrow diameter tubes, e.g., tubes with an inner diameter of less than 1 millimeter. The system may comprise the tube, a nozzle connected to at least one end of the tube configured to supply a gas into the interior of the tube at atmospheric pressure, at least one ring-shaped anode electrode and configured to surround an outer surface of the tube, at least one ring-shaped cathode electrode spaced apart from the anode electrode along the longitudinal axis and configured to surround the outer surface of the tube, and a voltage source connected to the at least one anode electrode. When activated, the system is configured to generate an electric field between the electrodes which ignites a plasma within the gas in the interior of the tube.
Plasma irradiation apparatus and plasma irradiation method
Provided are a plasma irradiation apparatus and plasma irradiation method capable of converting a silica precursor to a high quality silica film in a short time without thermal effects on the object being processed. This plasma irradiation apparatus 1 is provided with a plasma-generating unit 12 and an irradiation unit 80 for irradiating the plasma generated by the plasma-generating unit 12 on an object to be processed, and is characterized in that irradiation unit 80 comprises a coating part 85 capable of coating a liquid on the object being processed.