Certain embodiments described herein are directed to devices that can be used to sustain a capacitively coupled plasma. In some examples, a capacitive device can be used to sustain a capacitively coupled plasma in a torch in the absence of any substantial inductive coupling. In certain embodiments, a helium gas flow can be used with the capacitive device to sustain a capacitively coupled plasma.

One aspect of the invention provides a method of generating ultraviolet radiation. The method includes: introducing a mixture of nitrogen gas and helium gas into a dielectric barrier discharge device including a high voltage electrode and a ground electrode separated by a gap and a dielectric; and applying suitable electricity to the high voltage electrode, thereby generating ultraviolet radiation. Another aspect of the invention provides a plasma- and ultraviolet-generating nozzle including: a dielectric barrier discharge device; and a controller programmed to control flows of gas into the dielectric barrier discharge device and application of suitable electricity to the dielectric barrier discharge device to selectively generate either plasma or ultraviolet radiation. Another aspect of the invention provides a printing system including: a motion control system; and the plasma- and ultraviolet-generating nozzle as described herein coupled to the motion control system.

In an inductively coupled plasma torch unit, two coils, a first ceramic block, and a second ceramic block are arranged, and an annular chamber is provided. Plasma generated in the chamber is ejected toward a substrate through an opening in the chamber. The chamber and the substrate are caused to relatively move having an orientation perpendicular to a longitudinal direction of the opening, thereby processing the substrate. A shield cylinder is disposed around the coil inside a rotating cylindrical ceramic tube, thereby making it possible to achieve compatibility of ignitibility and shielding properties.

An ionization device includes a first electrode comprising a conductive member coated with a dielectric layer. The ionization device also includes a spine extending adjacent to and at least partially along the first electrode. The ionization device further includes a second electrode comprising conductive segments disposed adjacent the first electrode. Each one of the conductive segments contacts the spine at a respective contact location. The dielectric layer of the first electrode separates the conductive member of the first electrode from the spine and the second electrode. The ionization device is configured to create plasma generating locations corresponding to respective crossings of the first electrode and the second electrode.

Embodiments disclosed herein include a plasma source, an abatement system and a vacuum processing system for abating compounds produced in semiconductor processes. In one embodiment, a plasma source includes a dielectric tube and a coil antenna surrounding the tube. The coil antenna includes a plurality of turns, and at least one turn is shorted. Selectively shorting one or more turns of the coil antenna helps reduce the inductance of the coil antenna, allowing higher power to be supplied to the coil antenna that covers more processing volume. Higher power supplied to the coil antenna and larger processing volume lead to an improved DRE.

An inductively coupled plasma (ICP) torch is described that includes a tapered outer end. A system embodiment includes, but is not limited to, a tubular sample injector configured to receive an aerosolized sample in an interior defined by walls of the tubular sample injector; an inner tube surrounding at least a portion of the tubular sample injector to form a first annular space between the inner tube and the walls of the tubular sample injector, the inner tube defining at least one inlet port for introduction of an auxiliary gas into the first annular space; and an outer tube surrounding at least a portion of the inner tube to form a second annular space, the outer tube defining at least one inlet port for introduction of a cooling gas into the second annular space, the outer tube having a flared region at an outlet of the outer tube.

According to one embodiment of the present disclosure, there can be provided a plasma generating device for performing plasma discharge, the plasma generating device having multiple operation modes including a first mode and a second mode, and including: a first power supply capable of changing a frequency within a first frequency range; a second power supply capable of changing a frequency within a second frequency range that is at least partially different from the first frequency range; a dielectric tube; and an antenna module including a first unit coil wound around the dielectric tube at least one time, a second unit coil wound around the dielectric tube at least one time, and a first capacitor connected in series between the first unit coil and the second unit coil.

According to one embodiment of the present disclosure, there can be provided a plasma generating device for performing plasma discharge, the plasma generating device having multiple operation modes including a first mode and a second mode, and including: a first power supply capable of changing a frequency within a first frequency range; a second power supply capable of changing a frequency within a second frequency range that is at least partially different from the first frequency range; a dielectric tube; and an antenna module including a first unit coil wound around the dielectric tube at least one time, a second unit coil wound around the dielectric tube at least one time, and a first capacitor connected in series between the first unit coil and the second unit coil.

An inductively coupled plasma (ICP) torch is described that includes an injector protector to shield an injector end. A system embodiment includes, but is not limited to, a tubular sample injector configured to receive an aerosolized sample in an interior defined by walls of the tubular sample injector; an injector protector surrounding at least a portion of the tubular sample injector; an inner tube surrounding at least a portion of the injector protector to form a first annular space between the inner tube and the injector protector, the inner tube defining at least one inlet port for introduction of an auxiliary gas into the first annular space; and an outer tube surrounding at least a portion of the inner tube to form a second annular space, the outer tube defining at least one inlet port for introduction of a cooling gas into the second annular space.

A generator includes a plasma production tube made of a dielectric at least on a surface of the plasma production tube; an antenna that includes a linear conductor and a dielectric that coats the conductor; a high-frequency power supply connected to the antenna; and a gas supply unit that supplies a gas for generating radicals or ions to an interior of the plasma production tube. The antenna is disposed to extend to a vicinity of the other end of the plasma production tube. The antenna is disposed in a groove formed in an axial direction on an inner surface of the plasma production tube. The antenna is disposed in a groove formed in a circumferential direction on an inner surface of the plasma production tube at least in a portion of the vicinity of the other end of the plasma production tube.