H05H1/44

SYSTEM FOR HIGH TEMPERATURE CHEMICAL PROCESSING

A method and apparatus for making carbon black. A plasma gas is flowed into a plasma forming region containing at least one, magnetically isolated, plasma torch containing at least one electrode, and forming a plasma. Collecting the plasma formed in a cooled header and flowing the plasma through at least one reaction region to heat the reaction region, and injecting carbon black forming feedstock into the reaction region, resulting in the formation of at least one grade of carbon black. An apparatus for making carbon black is also described including a plasma forming section containing at least one, magnetically isolated plasma torch containing at least one electrode, in fluid flow communication with at least one carbon black forming reactor section, the plasma section and reactor section separated by a plasma formed collection header.

Axial feed plasma spraying device
10576484 · 2020-03-03 · ·

A spray coating apparatus includes a cathode and an anode nozzle to form a pair. A front end of the anode nozzle is provided with three or more plasma jet jetting holes, and a spray material jetting hole is disposed at the center of an area surrounded by the plasma jet jetting holes. The spray material jetted through the jetting hole is fed into the center axis of a complex plasma arc or a complex plasma jet. The spray material jetted through the spray material jetting hole is melted at high thermal efficiency, to thereby enhance yield of coating film. Reflection of the spray material by the outer periphery of plasma flame, penetration of the spray material through plasma flame, and scattering of the spray material caused by reflection or penetration, due to the differences in particle diameter, mass, etc. of the spray material is prevented.

Axial feed plasma spraying device
10576484 · 2020-03-03 · ·

A spray coating apparatus includes a cathode and an anode nozzle to form a pair. A front end of the anode nozzle is provided with three or more plasma jet jetting holes, and a spray material jetting hole is disposed at the center of an area surrounded by the plasma jet jetting holes. The spray material jetted through the jetting hole is fed into the center axis of a complex plasma arc or a complex plasma jet. The spray material jetted through the spray material jetting hole is melted at high thermal efficiency, to thereby enhance yield of coating film. Reflection of the spray material by the outer periphery of plasma flame, penetration of the spray material through plasma flame, and scattering of the spray material caused by reflection or penetration, due to the differences in particle diameter, mass, etc. of the spray material is prevented.

Device for generating an atmospheric plasma beam, and method for treating the surface of a workpiece
10555411 · 2020-02-04 · ·

A device for generating an atmospheric plasma beam for treating the surface of a workpiece includes a tubular housing with an axis, an inner electrode within the housing, and a nozzle assembly with a nozzle opening for discharging a plasma beam to be generated in the housing. The direction of the nozzle opening runs at an angle relative to the axis, and the nozzle assembly can be rotated about the axis. By the aforementioned device, disadvantages are at least partly eliminated and uniform treatment of the surface is achieved in that a shield surrounds the nozzle assembly, and the shield is designed to change the intensity of the interaction of the plasma beam to be generated with the surface of the workpiece depending on the rotational angle of the nozzle assembly relative to the axis. Also provided are a system and method for treating the surface of a workpiece.

Device for generating an atmospheric plasma beam, and method for treating the surface of a workpiece
10555411 · 2020-02-04 · ·

A device for generating an atmospheric plasma beam for treating the surface of a workpiece includes a tubular housing with an axis, an inner electrode within the housing, and a nozzle assembly with a nozzle opening for discharging a plasma beam to be generated in the housing. The direction of the nozzle opening runs at an angle relative to the axis, and the nozzle assembly can be rotated about the axis. By the aforementioned device, disadvantages are at least partly eliminated and uniform treatment of the surface is achieved in that a shield surrounds the nozzle assembly, and the shield is designed to change the intensity of the interaction of the plasma beam to be generated with the surface of the workpiece depending on the rotational angle of the nozzle assembly relative to the axis. Also provided are a system and method for treating the surface of a workpiece.

Liquid treatment apparatus including first electrode, second electrode, and first and second insulators surrounding lateral surface of first electrode

A liquid treatment apparatus includes a liquid storing vessel, a first electrode, a second electrode at least partly arranged inside the vessel, a tubular first insulator surrounding a first-electrode lateral surface with a first space interposed therebetween, and including a first opening in an end surface in contact with the liquid, a tubular second insulator surrounding the first-electrode lateral surface inside the first insulator, a gas supply device supplying gas into the first space and ejecting the gas into the liquid through the first opening, and a power supply applying a voltage between the first and second electrodes and producing plasma. The second insulator is arranged with a second space interposed between the first and second insulators. Portions of the first and second insulators, those portions being positioned inside the vessel, are covered with the gas when the gas is supplied into the first space by the gas supply device.

Liquid treatment apparatus including first electrode, second electrode, and first and second insulators surrounding lateral surface of first electrode

A liquid treatment apparatus includes a liquid storing vessel, a first electrode, a second electrode at least partly arranged inside the vessel, a tubular first insulator surrounding a first-electrode lateral surface with a first space interposed therebetween, and including a first opening in an end surface in contact with the liquid, a tubular second insulator surrounding the first-electrode lateral surface inside the first insulator, a gas supply device supplying gas into the first space and ejecting the gas into the liquid through the first opening, and a power supply applying a voltage between the first and second electrodes and producing plasma. The second insulator is arranged with a second space interposed between the first and second insulators. Portions of the first and second insulators, those portions being positioned inside the vessel, are covered with the gas when the gas is supplied into the first space by the gas supply device.

Plasma treatment apparatus and method of plasma treating a substrate using the same

Exemplary embodiments of the inventive concept provide a plasma treatment apparatus with a substrate support unit, a plasma unit, a first rotation driving unit, and a gas supply part. The substrate support unit supports a substrate. The plasma unit generates a plasma and provides the plasma to the substrate. The first rotation driving unit is coupled to the plasma unit to rotate the plasma unit with respect to the substrate support unit. The gas supply part supplies a source gas to the plasma unit. The plasma unit includes a body, a first electrode located in the body, a second electrode located in the body and facing the first electrode, and a pipe located between the first and second electrodes to flow the source gas therethrough.

Plasma treatment apparatus and method of plasma treating a substrate using the same

Exemplary embodiments of the inventive concept provide a plasma treatment apparatus with a substrate support unit, a plasma unit, a first rotation driving unit, and a gas supply part. The substrate support unit supports a substrate. The plasma unit generates a plasma and provides the plasma to the substrate. The first rotation driving unit is coupled to the plasma unit to rotate the plasma unit with respect to the substrate support unit. The gas supply part supplies a source gas to the plasma unit. The plasma unit includes a body, a first electrode located in the body, a second electrode located in the body and facing the first electrode, and a pipe located between the first and second electrodes to flow the source gas therethrough.

Plasma Treatment for Bottle Seals

Disclosed herein are embodiments of a plasma treatment system and methods for utilizing directed plasma to reduce instances of gas venting and leaking of contents from plastic bottles due to scratches occurring on sealing interfaces of the bottles and closures. In an embodiment, a plasma treatment system for repairing scratches applied to PET bottles comprises one or more plasma nozzles disposed along a bottle filling line and a plasma being issued by the plasma nozzles to repair the scratches. The plasma nozzles are arranged into a configuration that uniformly distributes plasma to all parts of a neck finish comprising the PET bottles. The plasma treatment of the PET bottles is performed prior to capping of the bottles. In an embodiment, the plasma treatment is performed after filling the bottles with contents so as to avoid a risk of scratches from misaligned filling tubes.