A hybrid plasma source and an operation method thereof, the hybrid plasma source is formed by combining the mechanisms of microwave plasma and transformer coupled plasma for gas dissociation and chemical activation. A reaction chamber of the hybrid plasma source is composed of two microwave resonant chambers and sets of hollow metal tubes, after a high-intensity electric field is generated by the microwave resonant chambers to generate a plasma, a high power and high density plasma generated by the highly-efficient coupling mechanism of the transformer coupled plasma is capable of greatly improving a gas conductance, each set of the hollow metal tubes is driven by each set of ferrite transformer magnetic cores to disperse power, which reduces an energy density of each of the hollow metal tubes and reduces occurrence of plasma entering a contraction mode from a diffusion mode, thereby further improving an operable gas flow rate.

A plasma generator comprises a radio frequency power source, a coaxial cavity resonator assembly, and a direct current power source. The radio frequency power source provides a voltage supply of radio frequency power having a first ratio of power over voltage. The resonator assembly includes a center conductor coupled to the radio frequency power source, and also includes a virtual short circuit. The direct current power source is connected to the center conductor at the virtual short circuit, and provides a voltage supply of direct current power having a second ratio of power over voltage that is less than the first ratio.

Sterilisation systems suitable for clinical use for generating a flow of hydroxyl radicals, comprising: a coaxial transmission line comprising an inner and outer conductor; an end cap mounted on a distal end of the coaxial transmission line, wherein the end cap comprises an outlet aperture; a fluid conduit extending from a fluid inlet to the outlet aperture; and a plasma generating region at a proximal end of the outlet aperture, wherein the plasma generating region contains a first electrode electrically connected to the inner conductor, and a second electrode electrically connected to the outer conductor, wherein the fluid conduit defines a fluid flow path through the device aligned with a feed direction in which fluid is receivable through the fluid inlet, and wherein the first electrode and second electrode oppose each other in a transverse direction across the longitudinal fluid flow path in the plasma generating region.

A plasma processing apparatus includes: a processing container which defines a processing space; a microwave generator; a dielectric having an opposing surface which faces the processing space; a slot plate formed with a plurality of slots; and a heating member provided within the slot plate. The slot plate is provided on a surface of the dielectric at an opposite side to the opposing surface to radiate microwaves for plasma excitation to the processing space through the dielectric based on the microwaves generated by the microwave generator.

In a microwave plasma source, a tubular magnet portion has a first opening end and a second opening end. The first opening end has a first polarity, and the second opening end has a second polarity. The tubular body is surrounded by the tubular magnet portion. A first magnetic circuit portion closes the first opening end. A second magnetic circuit portion is disposed opposite to the first magnetic circuit portion. The second magnetic circuit portion has a first opening part. An antenna penetrates the first magnetic circuit portion, is introduced to a space, and supplies microwave power to the space. The nozzle portion has a second opening part that has a smaller opening area than the first opening part and communicates with the first opening part. When an inner diameter of the tubular body is represented by a (mm), and a microwave cutoff wavelength of the microwave power being supplied to the space is represented by λ (mm), the microwave plasma source is configured to satisfy a relational expression λ>3.41×(a/2).

The disclosure includes a coaxial microwave applicator for plasma production, including a coaxial tube formed by a central core and an outer conductor separated from the central core by an annular space allowing propagation of microwaves. The applicator includes: a cylindrical permanent magnet disposed at the end of the central core; and at least one annular permanent magnet disposed at the end of the outer conductor, all of the magnets disposed at the end of the coaxial tube having the same direction of magnetization. The magnetization of the magnets forms a magnetic field suitable for generating, in a zone away from the end of the applicator, an electronic cyclotronic resonance coupling with the electric microwave field of the applicator. The external radius and the magnetization of the annular magnet are selected such that the magnetic field lines generated by the magnets pass through the coupling zone in a direction substantially parallel to the axis of the applicator.

A plasma reactor includes a chamber body having an interior space that provides a plasma chamber, a gas distribution port to deliver a processing gas to the plasma chamber, a workpiece support to hold a workpiece, an antenna array comprising a plurality of monopole antennas extending partially into the plasma chamber, and an AC power source to supply a first AC power to the plurality of monopole antennas.

An electric field sensor includes a probe, a cylindrical probe guide, an insulating member, a preload spring and a connector. The probe serves as an inner conductor of a coaxial transmission path and has a portion forming a monopole antenna at a tip end to be in constant contact with a microwave transmission window by a pressing force of a built-in spring thereof. The probe guide is disposed at an outer side of the probe and serves as an outer conductor of the coaxial transmission path. The insulating member is disposed between the probe and the probe guide. The preload spring preloads the probe guide downward and presses the probe guide so that the tip end of the probe guide comes in constant contact with the planar slot antenna. The connector is connected to the probe and the probe guide to connect coaxial signal cables for extracting signals.

A plasma generating device that improves plasma generating efficiency can further accommodate changes in plasma generating state because of changes in conditions of surroundings and the like. The plasma generating device is provided with an electromagnetic wave radiating device, which has an electromagnetic wave generating device that oscillates electromagnetic waves and a radiating antenna that radiates electromagnetic waves oscillated by the electromagnetic wave generating device, and a control device that controls the electromagnetic wave radiating device. The electromagnetic wave radiating device is provided with a power detector that detects traveling wave power output by the electromagnetic wave generating device and reflected wave power reflected from the radiating antenna, and the control device automatically controls the oscillation pattern for the electromagnetic waves on the basis of the proportion of the value for the reflected wave power to the value for the traveling wave power detected by the power detector.

A method and apparatus for determining a stability of plasma in a plasma processing apparatus for performing a plasma processing by converting into plasma a processing gas supplied into a processing container. The method includes: detecting a light emission intensity of the plasma in the processing container while the plasma is generated in the processing container; generating a first function representing a relationship between time and the light emission intensity from a detection result of the light emission intensity; differentiating the first function with time to calculate a differential value, and generating a second function from a relationship between an absolute value of the differential value and time; and integrating the second function with time to calculate an integral value, and determining a stability of the plasma based on the calculated integral value. A related apparatus is also provided.