The present invention comprises: a high-frequency power supply; an antenna group having a plurality of antennas connected to the high-frequency power supply; a plurality of reactance variable elements connected to the feeding sides and the grounding sides of the plurality of antennas; a current detection mechanism which detects the current flowing through the feeding sides and the ground sides of the plurality of antennas; a uniformity calculation unit which calculates the uniformity index value of the current flowing through the plurality of antennas, on the basis of the current value detected by the current detection mechanism; and a reactance changing unit which sequentially changes the reactance of the plurality of reactance variable elements such that the uniformity index value calculated by the uniformity calculation unit approaches a predetermined set value.

A plasma control system comprises: a high frequency power source; a first antenna connected at one end to the high frequency power source; a second antenna connected at one end to another end of the first antenna; a first variable reactance element provided between the first antenna and the second antenna; a first drive part for the first variable reactance element; a second variable reactance element connected to another end of the second antenna; a second drive part for the second variable reactance element; a first current detection part detecting the current in the one end of the first antenna; a second current detection part detecting the current between the first antenna and the second antenna; a third current detection part detecting the current in the other end of the second antenna; and a control device controlling the first drive part and the second drive part.

An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.

A system, device and method are provided for exposing a patient to therapeutic resonant frequency patterns (RFP) for therapy and treatment of a patient, for example, biological tissue such as muscle, tendon, ligament, and nerve tissue. The resonance frequencies originate from many bioactive substances, pharmaceuticals or other compounds, and key frequencies of the RFP of a compound can be replicated and then delivered to a patient using an electromagnetic catalyst to provide therapeutic benefits. RFPs can be imprinted in a separate device using a plasma imprinting device and method. This separate device can be actively excited by a delivery mechanism that uses electromagnetic or mechanical waves to interact with the device. The actively excited device transmits the RFPs or therapeutic resonant frequency patterns to the patient for similar enhancements and therapeutic benefits.

The present invention regards a device intrinsically designed to resonate, suitable for RF power transfer, particularly usable for the production of plasma and electrically connectable downstream of a radio frequency power supply with fixed or variable frequency, comprising at least one inductive element (Lp), which can be powered, during use, by such at least one power supply; at least one capacitive element (Cp) electrically connected at the terminals of such at least one inductive element (Lp); such at least one device having a resonance angular frequency equal to: o=1/LpCp. The capacitive element (Cp) and the inductive element (Lp) have values such that, at resonance state, they provide an equivalent impedance, measured at the terminals of such device, substantially of resistive type and much greater than the value of the parasitic impedance upstream of such terminals of such device, such that the effect of such parasitic impedance is, during use, substantially negligible.

A dielectric resonator is excited at its natural resonant frequency to produce a highly uniform electric field for the generation of plasma. The plasma may be used as a desolvator, atomizer excitation source and ionization source in an optical spectrometer or a mass spectrometer.

An atmospheric pressure linear RF plasma source having an enclosure enclosing a chamber in the form of an extended slot having a width W, a length L, and a thickness T, with W20T, the enclosure having a top opening for receiving a flow of a working gas in the direction of the length L and a bottom opening for delivering a flow of plasma, with the bottom opening being open to atmospheric pressure. Then walls of the enclosure comprise a dielectric material. Two mutually opposing pancake coils are positioned on opposite sides of the enclosure and are capable of being driven by an RF power source in an opposing phase relationship. Alternatively, an elongated solenoid coil may surround the enclosure.

Plasma reactors and methods are provided for reducing the volume of radioactive nuclear wastes or toxic wastes where the surface contamination is the main source of radioactivity or toxicity. The radioactive or toxic wastes are prepared in the form of small particles and fed into a pulsed plasma reactor operating in fluidized bed configuration. The repetitively pulsed radio-frequency (rf) powered plasma reactor generates high power plasma for pulse duration between 10 s-10 ms. During the pulse, the plasma deliver a short burst of intense heat flux to the surface of waste feed particles. Due to the short pulse duration, the heat flux is concentrated on the surface without propagating much to the core of the particles. The localized heat flux preferentially removes the surface contaminants via vaporization. The removed waste in the vapor phase will be transferred out of the reactor where it may undergo additional treatments or disposed accordingly in a reduced volume. The residual particles which are free from surface contaminants can then be recycled or disposed as non-toxic or non-radioactive waste. By controlling the treatment time inside the plasma reactor along with the pulse power, duration and repetition rate, and the plasma chemical composition, the thickness of removed surface layers can be controlled to provide the efficient surface decontamination.

A method for generating atmospheric pressure cold plasma inside a hand-held unit discharges cold plasma with simultaneously different rf wavelengths and their harmonics. The unit includes an rf tuning network that is powered by a low-voltage power supply connected to a series of high-voltage coils and capacitors. The rf energy signal is transferred to a primary containment chamber and dispersed through an electrode plate network of various sizes and thicknesses to create multiple frequencies. Helium gas is introduced into the first primary containment chamber, where electron separation is initiated. The energized gas flows into a secondary magnetic compression chamber, where a balanced frequency network grid with capacitance creates the final electron separation, which is inverted magnetically and exits through an orifice with a nozzle. The cold plasma thus generated has been shown to be capable of accelerating a healing process in flesh wounds on animal laboratory specimens.

A plasma reactor has an overhead inductively coupled plasma source with two coil antennas and symmetric and radial RF feeds and cylindrical RF shielding around the symmetric and radial RF feeds. The radial RF feeds are symmetrically fed to the plasma source.