An integrated circuit includes a signal pad, receiving an input signal during a normal mode, and receive an ESD signal during an ESD mode; an internal circuit, processing the input signal during the normal mode; a variable impedance circuit, comprising a first end coupled to the signal pad, a second end coupled to the internal circuit, wherein the variable impedance circuit provides a low or high impedance path between the signal pad and the internal circuit during the normal or ESD mode; and a switch circuit, comprising a first end coupled to a control end of the variable impedance circuit, a second end coupled to a reference voltage terminal, and a control end receiving a node voltage, wherein the switch circuit switches the control end of the variable impedance circuit to have a first specific voltage or be electrically floating during the normal or ESD mode.

A transistor unit and an array and an integrated circuit thereof are provided. The transistor unit includes: a substrate; N gates located on the substrate, a projection of the N gates on a surface of the substrate forming a closed shape; a first source region located in the substrate and a projection of the first source region on the surface of the substrate being located in the closed shape, the first source region being shared by the N gates; N drain regions located in the substrate, each drain region and the source region being located respectively on two sides of the corresponding gate; first source end conductive plugs located on the first source region; drain end conductive plugs disposed on each drain region; a first source end metal layer located on the first source end conductive plugs; a drain end metal layer located on the drain end conductive plugs.

An integrated circuit is provided with a protected circuit wherein a first FinFET operably coupled to a signal node is protected against electrostatic discharge voltage damage by a standard cell electrostatic discharge protection circuit which is connected between first and second voltage supplies and which includes a first FinFET diode connected between the signal node and the first voltage supply, and a second FinFET diode connected between the signal node and the second voltage supply, where the first and second FinFET diodes are each formed with a FinFET device comprising (1) a body well region forming a first diode terminal connected to one of the first or second voltage supplies, and (2) a shorted gate, source, and drain regions forming a second diode terminal connected to the signal node.

Provided is an electrostatic discharge protection circuit, including a first resistor, a first transistor, a second resistor, and a second transistor. The first resistor has a first end coupled to a first power rail. The first transistor has a first end coupled to the first power rail, and a control end of the first transistor is coupled to a second end of the first resistor. The second resistor is coupled between a second end of the first transistor and a second power rail. The second transistor has a first end coupled to the first power rail, a control end of the second transistor is coupled to the second end of the first transistor, and a second end of the second transistor is coupled to the second power rail.

An electronic device includes a first group III nitride transistor and an electrostatic discharge (ESD) protection circuit. The ESD protection circuit includes a diode and a second transistor. The diode has an anode electrically connected to a gate of the first group III nitride transistor. The second transistor has a drain electrically connected to the gate of the first group III nitride transistor, a gate electrically connected to a cathode of the diode and a source electrically connected to a source of the first group III nitride transistor.

An ESD protection circuit has a driver transistor with a drain that is coupled to an I/O pad of an IC device and a source that is coupled to a first rail of a power supply in the IC device, and a diode that couples the I/O pad to the first rail and that is configured to be reverse-biased when a rated voltage is applied to the I/O pad. The rated voltage lies within a nominal operating range for voltage levels defined for the input/output pad. The ESD protection circuit has a gate pull transistor that couples a gate of the driver transistor to the I/O pad or the first rail. The gate pull transistor may be configured to present a high impedance path between the gate of the driver transistor and the I/O pad or the first rail when the rated voltage is applied to the I/O pad. The gate pull transistor may be configured to provide a low impedance path between the gate of the driver transistor and the I/O pad or the first rail when an overvoltage signal applied to the I/O pad has a magnitude that exceeds the nominal operating range of voltage levels defined for the I/O pad.

An electrostatic protection circuit connected with an internal circuit is provided. The electrostatic protection circuit includes: a first circuit, a first diode connected in parallel with the first circuit, a second circuit, and a second diode connected in parallel with the second circuit. The first circuit is connected between a power supply pad and an internal circuit input terminal. The second circuit is connected between the internal circuit input terminal and a ground pad. The first circuit and the second circuit are diode-triggered silicon controlled rectifier circuits. The technical solution of the disclosure can improve electrostatic protection capability of a charged device model of a chip.

Disclosed is an electrostatic protection circuit, an array substrate and a display device. The electrostatic protection circuit includes a first electrostatic discharge end, a second electrostatic discharge end and a signal line connecting end; a first discharge sub-circuit coupled between the first electrostatic discharge end and the signal line connecting end; and a second discharge sub-circuit coupled between the second electrostatic discharge end and the signal line connecting end. Each of the first discharge sub-circuit and the second discharge sub-circuit comprises at least one MOSFET, and gates of all MOSFETs comprised in the first discharge sub-circuit and the second discharge sub-circuit are not coupled with any one of the first electrostatic discharge end, the second electrostatic discharge end and the signal line connecting end.

A device includes a diode that includes a first group III-nitride (III-N) material and a transistor adjacent to the diode, where the transistor includes the first III-N material. The diode includes a second III-N material, a third III-N material between the first III-N material and the second III-N material, a first terminal including a metal in contact with the third III-N material, a second terminal coupled to the first terminal through the first group III-N material. The device further includes a transistor structure, adjacent to the diode structure. The transistor structure includes the first, second, and third III-N materials, a source and drain, a gate electrode and a gate dielectric between the gate electrode and each of the first, second and third III-N materials.

An electrostatic discharge protection circuit includes a pull-down switch, a dummy pattern arranged parallel to the pull-down switch in a first direction, clamp switches arranged parallel to each other in the first direction between the dummy pattern and the pull-down switch, and a resistor configured to transfer a power supply voltage supplied through a power terminal to a gate pattern of the pull-down switch by being arranged parallel to the pull-down switch. Drains of the clamp switches are coupled in common to the power terminal, sources of the clamp switches are coupled in common to a ground terminal, and a first end of the pull-down switch and a second end of the resistor are coupled to each other through a first conductive line extending in the first direction, the pull-down switch, the resistor and the first conductive line are formed in a same layer.