A semiconductor device includes multiple reconfiguration blocks arranged in a first direction, logic of the multiple reconfiguration blocks being reconfigurable, multiple non-reconfiguration blocks disposed between the multiple reconfiguration blocks, each of the multiple non-reconfiguration blocks including multiple first arithmetic units, and logic of the multiple first arithmetic units being not reconfigurable, and multiple processing units implemented in the multiple reconfiguration blocks and the multiple non-reconfiguration blocks in a matrix form, the multiple processing units including second arithmetic units. For each of multiple processing rows, the second arithmetic units are implemented using either the first arithmetic units of a corresponding one of the non-reconfiguration blocks or a corresponding one of the reconfiguration blocks, each of the multiple processing rows being a row in which a predetermined number of processing units among the multiple processing units are arranged in a second direction crossing the first direction.

An IC that includes a contiguous standard cell area with a 4x3 e-beam pad that is compatible with advanced manufacturing processes and an associated e-beam testable structure.

A chip package includes an interposer comprising a silicon substrate, multiple metal vias passing through the silicon substrate, a first interconnection metal layer over the silicon substrate, a second interconnection metal layer over the silicon substrate, and an insulating dielectric layer over the silicon substrate and between the first and second interconnection metal layers; a field-programmable-gate-array (FPGA) integrated-circuit (IC) chip over the interposer; multiple first metal bumps between the interposer and the FPGA IC chip; a first underfill between the interposer and the FPGA IC chip, wherein the first underfill encloses the first metal bumps; a non-volatile memory (NVM) IC chip over the interposer; multiple second metal bumps between the interposer and the NVM IC chip; and a second underfill between the interposer and the NVM IC chip, wherein the second underfill encloses the second metal bumps.

A semiconductor device includes an external terminal, a switching output stage that performs switching drive of a terminal voltage at the external terminal, an output control unit arranged to generate a drive signal for the switching output stage according to an input pulse signal, a counter arranged to count the number of pulses of the input pulse signal so as to generate a mask signal, a logical gate arranged to mask the input pulse signal according to the mask signal, and a comparator arranged to compare the terminal voltage with a predetermined threshold value voltage so as to generate a reset signal of the counter.

An IC that includes a contiguous standard cell area with a 4×3 e-beam pad that is compatible with advanced manufacturing processes and an associated e-beam testable structure.

An IC that includes a contiguous standard cell area with a 43 e-beam pad that is compatible with advanced manufacturing processes and an associated e-beam testable structure.

A chip package includes an interposer comprising a silicon substrate, multiple metal vias passing through the silicon substrate, a first interconnection metal layer over the silicon substrate, a second interconnection metal layer over the silicon substrate, and an insulating dielectric layer over the silicon substrate and between the first and second interconnection metal layers; a field-programmable-gate-array (FPGA) integrated-circuit (IC) chip over the interposer; multiple first metal bumps between the interposer and the FPGA IC chip; a first underfill between the interposer and the FPGA IC chip, wherein the first underfill encloses the first metal bumps; a non-volatile memory (NVM) IC chip over the interposer; multiple second metal bumps between the interposer and the NVM IC chip; and a second underfill between the interposer and the NVM IC chip, wherein the second underfill encloses the second metal bumps.

In one embodiment, the standard cell includes first and second active regions defining an intermediate region between the first and second active regions; and first, second and third gate lines crossing the first and second active regions and crossing the intermediate region. The first gate line is divided into an upper first gate line and a lower first gate line by a first gap insulating layer in the intermediate region, the second gate line is undivided, and the third gate line is divided into an upper third gate line and a lower third gate line by a second gap insulating layer in the intermediate region.

A semiconductor integrated circuit device includes a standard cell having a plurality of height regions. A plurality of partial circuits having an identical function and each operating in response to common signals S and NS are arranged in any one of the height regions. A metal interconnect forming part of a supply path for the common signal S is arranged in the height region so as to be connected to the partial circuits, and a metal interconnect forming part of a supply path for the common signal S is arranged in the height region so as to be connected to the partial circuits.

A method for processing a semiconductor wafer uses non-contact electrical measurements indicative of at least one tip-to-side short or leakage, at least one corner short or leakage, and at least one via open or resistance, where such measurements are obtained from non-contact pads associated with respective tip-to-side short, corner short, and via open test areas.