Techniques are discloses regarding methods of manufacturing an imager as well as an imager device.

A semiconductor wafer has a plurality of non-rectangular semiconductor die with an image sensor region. The non-rectangular semiconductor die has a circular, elliptical, and shape with non-linear side edges form factor. The semiconductor wafer is singulated with plasma etching to separate the non-rectangular semiconductor die. A curved surface is formed in the image sensor region of the non-rectangular semiconductor die. The non-rectangular form factor effectively removes a portion of the base substrate material in a peripheral region of the semiconductor die to reduce stress concentration areas and neutralize buckling in the curved surface of the image sensor region. A plurality of openings or perforations can be formed in a peripheral region of a rectangular or non-rectangular semiconductor die to reduce stress concentration areas and neutralize buckling. A second semiconductor die can be formed in an area of the semiconductor wafer between the non-rectangular semiconductor die.

An image sensor is provided. The image sensor includes a pixel array including first and second pixels, the first and second pixels receiving the same transfer gate signal and outputting first and second signal voltages, respectively, a transfer gate driver receiving first and second voltages and generating the transfer gate signal, the transfer gate signal having the first voltage as its maximum voltage and having the second voltage as its minimum voltage and a compensation module detecting a variation in the second voltage, generating a compensation voltage based on the variation in the second voltage, and performing a compensation operation.

A three-dimensional wiring substrate includes: a front plate having an electrode pad electrically connected to a solid-state image sensing device; a rear plate protruding toward a rear side of the front plate from an outer peripheral portion of a rear surface of the front plate; an internal conductor connection pad which is disposed on the rear surface and to which an internal conductor of a coaxial cable is electrically connected; an external conductor connection pad which is disposed on a connection-side main surface which is a surface on an opening angle side of the rear plate with respect to the rear surface and to which an external conductor of the coaxial cable is electrically connected; and an inter-pad connection wiring that secures at least one of electrical continuity of the internal conductor connection pad and electrical continuity of the external conductor connection pad.

An object of the present invention is to prevent a sensitivity difference between pixels. There are disposed plural unit cells each including plural photodiodes, plural transfer MOSFETs arranged corresponding to the plural photodiodes, respectively, and a common MOSFET which amplifies and outputs signals read from the plural photodiodes. Each pair within the unit cell, composed of the photodiode and the transfer MOSFET provided corresponding to the photodiode, has translational symmetry with respect to one another. Within the unit cell, there are included a reset MOSFET and selecting MOSFET.

Techniques are discloses regarding methods of manufacturing an imager as well as an imager device.

An imaging device including a semiconductor substrate having a first surface, the semiconductor substrate including: a first layer containing an impurity of a first conductivity type; a second layer containing an impurity of a second conductivity type different from the first conductivity type, the second layer being closer to the first surface than the first layer is; and a pixel. The pixel includes a photoelectric converter configured to convert light into charge; and a first diffusion region containing an impurity of the first conductivity type, the first diffusion region facing the first layer via the second layer, configured to store at least a part of the charge. The first layer having a second surface adjacent to the second layer, the second surface including a convex portion toward the first surface, and the convex portion facing the first diffusion region.

An imaging device includes a semiconductor substrate, pixels, a charge detector, charge storage portions, an output gate portion and a shift gate portion. The pixels and the charge detector are provided in the semiconductor substrate. The charge storage portions are provided on the charge detector side of the pixels, and linked to the pixels. The output gate portion is positioned between the charge detector and the charge storage portions, and includes charge transfer channels extending in a radial configuration in directions from the charge detector toward the pixels. The shift gate portion is positioned between one charge storage portion and one charge transfer channel. The shift gate portion includes a gate electrode provided on the semiconductor substrate. A planar configuration of the gate electrode has a side orthogonal to the extending direction of the one charge transfer channels, the side being most proximal to the one charge transfer channel.

A solid-state imaging device includes a light detector provided inside a semiconductor body; a first insulating film provided on a front surface of the semiconductor body; a plurality of second insulating films provided between the light detector and the first insulating film, the plurality of second insulating films arranged in a first direction along the front surface of the semiconductor body; and a third insulating film provided between the semiconductor body and the second insulating films, the third insulating film having a refractive index lower than a refractive index of the second insulating films.

An image sensor is provided. The image sensor includes a pixel array including first and second pixels, the first and second pixels receiving the same transfer gate signal and outputting first and second signal voltages, respectively, a transfer gate driver receiving first and second voltages and generating the transfer gate signal, the transfer gate signal having the first voltage as its maximum voltage and having the second voltage as its minimum voltage and a compensation module detecting a variation in the second voltage, generating a compensation voltage based on the variation in the second voltage, and performing a compensation operation.