There is provided a pixel circuit including a first circuit and a second circuit. The first circuit is used to output a first voltage associated with exposure intensity. The second circuit is used to output a second voltage associated with exposure time interval. The processor multiples the first voltage to a ratio between a reference voltage and the second voltage to obtain an actual light intensity, wherein the reference voltage is a voltage value outputted by the second circuit of a dummy pixel.

An image sensor includes a first substrate. A photoelectric conversion region is in the first substrate. A first interlayer insulating layer is on the first substrate. A transistor includes a bonding insulating layer on the first interlayer insulating layer, a semiconductor layer on the bonding insulating layer, and a first gate on the semiconductor layer. A bias pad is spaced apart from the semiconductor layer by the bonding insulating layer. The bias pad overlaps the first gate in a planar view. A second interlayer insulating layer covers the transistor.

A CCD comprises: a primary device configured to capture visible light and comprising: a first layer comprising a first semiconductor material; and a second layer comprising a second semiconductor material; and a secondary device configured to capture near-IR light and comprising: a third layer comprising a third semiconductor material and positioned such that the second layer is between the first layer and the third layer; and a fourth layer comprising a fourth semiconductor material and positioned such that the third layer is between the second layer and the fourth layer.

A driving apparatus that outputs a drive signal for driving, per row, a plurality of pixels arranged to form a plurality of rows, the driving apparatus comprising a plurality of row driving units arranged to correspond to the respective rows, wherein each of the row driving units includes: a memory unit that holds a signal for controlling the pixels in a corresponding row to be set to a charge accumulation state or a reset state; and a selection unit that selects whether to cause a state of the signal held in the memory unit to transition when a signal for readout from the pixels is input.

A pixel sensor may include a vertically arranged (or vertically stacked) photodiode region and floating diffusion region. The vertical arrangement permits the photodiode region to occupy a larger area of a pixel sensor of a given size relative to a horizontal arrangement, which increases the area in which the photodiode region can collect photons. This increases performance of the pixel sensor and permits the overall size of the pixel sensor to be reduced. Moreover, the transfer gate may surround at least a portion of the floating diffusion region and the photodiode region, which provides a larger gate switching area relative to a horizontal arrangement. The increased gate switching area may provide greater control over the transfer of the photocurrent and/or may reduce switching delay for the pixel sensor.

Image sensors capable of dark current calibration and associated circuits are disclosed herein. The method for calibrating dark current includes acquiring at least one dark current frame of a first plurality of pixels of a pixel array of the image sensor. The dark current frame contains readings of individual dark currents for the corresponding pixels obtained during an exposure period when a transistor is turned on disabling the photodiode. The method also includes acquiring at least one normal frame of a second plurality of pixels of the pixel array of the image sensor. The normal frame contains readings of individual signals for the corresponding pixels obtained during the exposure period when the transistor is turned OFF. The method includes subtracting the at least one dark current frame from the at least one normal frame.

A solid-state imaging device includes: an imager including pixels arranged in rows and columns; vertical transfer portions in one-to-one correspondence with columns of the pixels, each of which includes a readout electrode that reads out signal charges generated in the pixels and a transfer electrode that transfers the read-out signal charges in the column direction; and a horizontal transfer portion which transfers, in the row direction, the signal charges transferred by the vertical transfer portions, and outputs the signal charges. The imager is formed by alternately disposing, in the column direction, a first row in which visible light pixels each including a first photoelectric converter that converts visible light into signal charges are arranged adjacent in the row direction and a second row in which infrared light pixels each including a second photoelectric converter that converts infrared light into signal charges are arranged adjacent in the row direction.

Photodetection elements within an integrated-circuit pixel array are dynamically configurable to any of at least three uniform-aspect-ratio, size-scaled pixel footprints through read-out-time control of in-pixel transfer gates associated with respective photodetection elements and binning transistors coupled between the transfer gates for respective clusters of the photodetection elements and a shared reset node.

An image sensor is provided. The image sensor includes a first pixel region and a second pixel region located within a semiconductor substrate, a first isolation layer surrounding the first pixel region and the second pixel region, a second isolation layer located between the first pixel region and the second pixel region, and a microlens arranged on the first pixel region and the second pixel region. Each of the first pixel region and the second pixel region include a photoelectric conversion device. The second isolation layer includes at least one first open region that exposes a portion of an area located between the first pixel region and the second pixel region.

An image sensor includes a substrate that has a first pixel region and a second pixel region and a microlens layer on a first surface of the substrate. The microlens layer includes a first lens pattern on the first pixel region of the substrate; and a second lens pattern on the second pixel region of the substrate. A width of the first pixel region is greater than a width of the second pixel region, and a height of the first lens pattern is greater than a height of the second lens pattern.