H01L29/102

Method for Producing a Doped Semiconductor Layer

A semiconductor device is produced by providing a semiconductor substrate, forming an epitaxial layer on the semiconductor substrate, and introducing dopant atoms of a first doping type and dopant atoms of a second doping type into the epitaxial layer.

TRIAC GATE DESIGN FOR COMMUTATION SENSITIVITY TRADE OFF IMPROVEMENT

A TRIAC features first and second main-terminal contacts, and a gate terminal contact, with multiple semiconductor regions stacked along a first-axis and extending laterally along an intersecting second-axis that defines first, second, and middle regions. The semiconductor regions include a third N-type region overlying the second main-terminal contact, a second P-type region overlying the second main-terminal contact, a second N-type region overlying the second P-type region, a first P-type region overlying the second N-type region, a first N-type region partially overlying the first P-type region, a fourth N-type region partially overlying the first P-type region, and a fifth N-type region partially overlying the first P-type region. The first main-terminal contact is partly on the first N-type region in the first region and on the first P-type region in the second region, while the gate terminal contact is partly on both the first P-type region and the fourth N-type region.