A bonded assembly includes a first semiconductor die that includes first metallic bonding structures embedded within a first bonding-level dielectric layer, and a second semiconductor die that includes second metallic bonding structures embedded within a second bonding-level dielectric layer and bonded to the first metallic bonding structures by metal-to-metal bonding. One of the first metallic bonding structures a pad portion, and a via portion located between the pad portion and the first semiconductor device, the via portion having second tapered sidewalls.

A structure including a substrate having a conductive pad and a connecting structure disposed on the conductive pad and electrically connected to the conductive pad. The connecting structure includes a first metallic layer disposed on the conductive pad, a first intermetallic compound layer disposed on the first metallic layer, a second intermetallic compound layer disposed on the first intermetallic compound layer and a second metallic layer disposed on the second intermetallic compound layer. The first metallic layer comprises copper. The first intermetallic compound layer comprises a first intermetallic compound. The second intermetallic compound layer comprises a second intermetallic compound different from the first intermetallic compound. The second metallic layer comprises tin. The first intermetallic compound contains copper, tin and one of nickel and cobalt.

A structure including a substrate having a conductive pad and a connecting structure disposed on the conductive pad and electrically connected to the conductive pad. The connecting structure includes a first metallic layer disposed on the conductive pad, a first intermetallic compound layer disposed on the first metallic layer, a second intermetallic compound layer disposed on the first intermetallic compound layer and a second metallic layer disposed on the second intermetallic compound layer. The first metallic layer comprises copper. The first intermetallic compound layer comprises a first intermetallic compound. The second intermetallic compound layer comprises a second intermetallic compound different from the first intermetallic compound. The second metallic layer comprises tin. The first intermetallic compound contains copper, tin and one of nickel and cobalt.

A semiconductor device of an embodiment includes a first chip having a memory cell array, and a second chip having a control circuit. The first chip includes a substrate, a pad, a first structural body, and a second structural body. The substrate is arranged on the side opposite to a joined face of the first chip joined to the second chip, and includes a first face, a second face, and an opening extending from the second face to the first face in a first region. The memory cell array is provided between the first face and the opposed joined face. The pad is provided in the opening. The first structural body is provided between the first face and the joined face, and is electrically connected to the pad. The second structural body is provided between the first face and the joined face in the first region.

A semiconductor memory device includes: a stack above a peripheral circuit on a first substrate, in which first conductive layers and first insulation layers are alternately stacked in a first direction each; a first pillar through the stack, in which a semiconductor layer and each first conductive layer form a memory cell at their intersection; a second substrate including a first region above the stack and the first pillar, being connected to a semiconductor layer, and a second region juxtaposed with the first region in a second direction; a second insulation layer through the second substrate, insulating the regions from each other; and a second conductive layer including a first portion through the second substrate, and a second portion extending in the second direction above the second substrate and including a part defining a bonding pad. The second portion overlaps with the second insulation layer in the first direction.

A semiconductor device includes: a semiconductor element that includes an element main body having an element main surface and an element back surface facing opposite sides to each other in a thickness direction, and a first electrode arranged on the element main surface; an insulator that has an annular shape overlapping an outer peripheral edge of the first electrode when viewed in the thickness direction and is arranged over the first electrode and the element main surface; a first metal layer arranged over the first electrode and the insulator; and a second metal layer laminated on the first metal layer and overlapping both the first electrode and the insulator when viewed in the thickness direction.

A discrete three-dimensional (3-D) processor a plurality of storage-processing units (SPU's), each of which comprises a non-memory circuit and more than one 3-D memory (3D-M) array. The preferred 3-D processor further comprises communicatively coupled first and second dice. The first die comprises the 3D-M arrays and the in-die peripheral-circuit components thereof; whereas, the second die comprises the non-memory circuits and off-die peripheral-circuit components of the 3D-M arrays.

A semiconductor device is provided. The semiconductor device includes a substrate, input and output (I/O) pads disposed at an upper portion of the semiconductor substrate, and first bump pillars disposed over the I/O pads. The first bump pillars are selectively arranged over some of the I/O pads in a first horizontal direction.

A discrete three-dimensional (3-D) processor comprises stacked first and second dice. The first die comprises 3-D memory (3D-M) arrays, whereas the second die comprises logic circuits and at least an off-die peripheral-circuit component of the 3D-M array(s). In one preferred embodiment, the first and second dice are vertically stacked. In another preferred embodiment, the first and second dice are face-to-face bonded.

A discrete three-dimensional (3-D) processor comprises stacked first and second dice. The first die comprises 3-D memory (3D-M) arrays, whereas the second die comprises logic circuits and at least an off-die peripheral-circuit component of the 3D-M array(s). In one preferred embodiment, the first and second dice are vertically stacked. In another preferred embodiment, the first and second dice are face-to-face bonded.