H01L2224/11013

Methods and Structures for Packaging Semiconductor Dies
20170301648 · 2017-10-19 ·

A method of packaging a semiconductor device, comprising: attaching a plurality of dies to a carrier wafer, wherein each of the dies includes a top surface; forming a molding compound layer over the dies, wherein the top surface of the dies are covered by the molding compound layer; removing a first portion of the molding compound layer; removing a second portion of the molding compound layer such that the top surface of the dies is not covered by the molding compound layer; forming a redistribution layer (RDL) over the top surface of the dies; forming a plurality of solder balls over at least a portion of the RDL; and singulating the dies.

Semiconductor package structure and method for forming the same
09786632 · 2017-10-10 · ·

A semiconductor package structure is provided. The semiconductor package structure includes a first electronic component on a substrate. The semiconductor package structure also includes a second electronic component stacked on the first electronic component. The active surface of the first electronic component faces the active surface of the second electronic component. The semiconductor package structure further includes a molding compound on the first electronic component and surrounding the second electronic component. In addition, the semiconductor package structure includes a third electronic component stacked on the second electronic component and the molding compound.

Barrier Structures Between External Electrical Connectors
20170256477 · 2017-09-07 ·

A structure includes a die substrate; a passivation layer on the die substrate; first and second interconnect structures on the passivation layer; and a barrier on the passivation layer, at least one of the first or second interconnect structures, or a combination thereof. The first and second interconnect structures comprise first and second via portions through the passivation layer to first and second conductive features of the die substrate, respectively. The first and second interconnect structures further comprise first and second pads, respectively, and first and second transition elements on a surface of the passivation layer between the first and second via portion and the first and second pad, respectively. The barrier is disposed between the first pad and the second pad. The barrier does not fully encircle at least one of the first pad or the second pad.

Packaging Devices and Methods of Manufacture Thereof
20170221845 · 2017-08-03 ·

Packaging devices and methods of manufacture thereof for semiconductor devices are disclosed. In some embodiments, a packaging device includes a contact pad disposed over a substrate, and a passivation layer disposed over the substrate and a first portion of the contact pad. A post passivation interconnect (PPI) line is disposed over the passivation layer and is coupled to a second portion of the contact pad. A PPI pad is disposed over the passivation layer. A transition element is disposed over the passivation layer and is coupled between the PPI line and the PPI pad. The transition element comprises a first side and a second side coupled to the first side. The first side and the second side of the transition element are non-tangential to the PPI pad.

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

To miniaturize metal columns. A semiconductor device includes a metal column (14) that extends in a stretching direction; a polymer layer (16) that surrounds the metal column from a direction crossing the stretching direction; and a guide (12) that surrounds the polymer layer in the crossing direction so as to be spaced from the metal column with the polymer layer interposed therebetween. A method for manufacturing semiconductor devices includes a step of filling a mixture (20) containing metal particles (22) and polymers (24) in a guide (12); and a step of subjecting the mixture to a heat treatment so that the polymers agglomerate to the guide to form a polymer layer (16) that makes contact with the guide and the metal particles agglomerate away from the guide with the polymer layer interposed therebetween to form a metal column (14) that stretches in a stretching direction of the guide from the metal particles.

Methods and structures for packaging semiconductor dies

A method of packaging a semiconductor device, comprising: attaching a plurality of dies to a carrier wafer, wherein each of the dies includes a top surface; forming a molding compound layer over the dies, wherein the top surface of the dies are covered by the molding compound layer; removing a first portion of the molding compound layer; removing a second portion of the molding compound layer such that the top surface of the dies is not covered by the molding compound layer; forming a redistribution layer (RDL) over the top surface of the dies; forming a plurality of solder balls over at least a portion of the RDL; and singulating the dies.

Barrier structures between external electrical connectors

A structure includes a die substrate; a passivation layer on the die substrate; first and second interconnect structures on the passivation layer; and a barrier on the passivation layer, at least one of the first or second interconnect structures, or a combination thereof. The first and second interconnect structures comprise first and second via portions through the passivation layer to first and second conductive features of the die substrate, respectively. The first and second interconnect structures further comprise first and second pads, respectively, and first and second transition elements on a surface of the passivation layer between the first and second via portion and the first and second pad, respectively. The barrier is disposed between the first pad and the second pad. The barrier does not fully encircle at least one of the first pad or the second pad.

Integrated Circuit Structure and Method for Reducing Polymer Layer Delamination
20170170161 · 2017-06-15 ·

An embodiment integrated circuit structure includes a substrate, a metal pad over the substrate, a post-passivation interconnect (PPI) structure over the substrate and electronically connected to the metal pad, a first polymer layer over the PPI structure, an under bump metallurgy (UBM) extending into an opening in the first polymer layer and electronically connected to the PPI structure, and a barrier layer on a top surface of the first polymer layer adjacent to the UBM.

Methods for solder for through-mold interconnect

Generally discussed herein are systems and apparatuses that include an extended TSBA ball and techniques for making the same. According to an example, a technique can include forming a circuit substrate including forming a circuit on a substrate, the circuit exposed along an upper surface of the substrate, wherein the substrate is for coupling the circuit with a die along a lower surface of the circuit substrate. A molding can be formed onto an upper surface of the circuit substrate, over the circuit of the circuit substrate. An opening can be defined in the molding so that the opening can extend to a top surface of the molding to at least a portion of the circuit. Solder can be formed into the opening, including conforming the solder to the opening and the circuit substrate.

OPTIMIZED SOLDER PADS FOR MICROELECTRONIC COMPONENTS
20170141072 · 2017-05-18 ·

A multi-chip system includes a top chip stack element comprising a top chip having two major surfaces and top solder pads arrayed along a plane of one of the major surfaces; a bottom chip stack element comprising a bottom substrate having two major surfaces and bottom solder pads arrayed along a plane of one of the major surfaces; one or more solder reservoir pads connected to one or more of the top solder pads or of the bottom solder pads; and solder material; and wherein at least one of the top solder pads is connected to one of the bottom solder pads by one of the solder material.