H01L2224/221

Semiconductor Devices and Methods of Manufacturing

Packaged devices and methods of manufacturing the devices are described herein. The packaged devices may be fabricated using heterogeneous devices and asymmetric dual-side molding on a multi-layered redistribution layer (RDL) structure. The packaged devices may be formed with a heterogeneous three-dimensional (3D) Fan-Out System-in-Package (SiP) structure having small profiles and can be formed using a single carrier substrate.

PACKAGE STRUCTURE AND MANUFACTURING METHOD THEREOF

A packaging structure including first, second, and third dies, an encapsulant, a circuit structure, and a filler is provided. The encapsulant covers the first die. The circuit structure is disposed on the encapsulant. The second die is disposed on the circuit structure and is electrically connected to the circuit structure. The third die is disposed on the circuit structure and is electrically connected to the circuit structure. The third die has an optical signal transmission area. The filler is disposed between the second die and the circuit structure and between the third die and the circuit structure. A groove is present on an upper surface of the circuit structure. The upper surface includes first and second areas located on opposite sides of the groove. The filler directly contacts the first area. The filler is away from the second area. A manufacturing method of a packaging structure is also provided.

Apparatus and method for a component package

A component package and a method of forming are provided. A first component package may include a first semiconductor device having a pair of interposers attached thereto on opposing sides of the first semiconductor device. Each interposer may include conductive traces formed therein to provide electrical coupling to conductive features formed on the surfaces of the respective interposers. A plurality of through vias may provide for electrically connecting the interposers to one another. A first interposer may provide for electrical connections to a printed circuit board or subsequent semiconductor device. A second interposer may provide for electrical connections to a second semiconductor device and a second component package. The first and second component packages may be combined to form a Package-on-Package (“PoP”) structure.

Semiconductor device and method of forming ultra thin multi-die face-to-face WLCSP
09735113 · 2017-08-15 · ·

A semiconductor device has a first semiconductor die stacked over a second semiconductor die which is mounted to a temporary carrier. A plurality of bumps is formed over an active surface of the first semiconductor die around a perimeter of the second semiconductor die. An encapsulant is deposited over the first and second semiconductor die and carrier. A plurality of conductive vias is formed through the encapsulant around the first and second semiconductor die. A portion of the encapsulant and a portion of a back surface of the first and second semiconductor die is removed. An interconnect structure is formed over the encapsulant and the back surface of the first or second semiconductor die. The interconnect structure is electrically connected to the conductive vias. The carrier is removed. A heat sink or shielding layer can be formed over the encapsulant and first semiconductor die.

SEMICONDUCTOR PACKAGE AND METHOD OF FORMING SAME
20220310467 · 2022-09-29 ·

A package and a method forming the same are provided. The package includes an integrated circuit die. A sidewall of the integrated circuit die has a first facet and a second facet. The first facet and the second facet have different slopes. The package includes an encapsulant surrounding the integrated circuit die and in physical contact with the first facet and the second facet and an insulating layer over the integrated circuit die and the encapsulant. An upper surface of the integrated circuit die is lower than an upper surface of the encapsulant. A sidewall of the insulating layer is substantially coplanar with the first facet.

Semiconductor devices and methods of manufacturing

Packaged devices and methods of manufacturing the devices are described herein. The packaged devices may be fabricated using heterogeneous devices and asymmetric dual-side molding on a multi-layered redistribution layer (RDL) structure. The packaged devices may be formed with a heterogeneous three-dimensional (3D) Fan-Out System-in-Package (SiP) structure having small profiles and can be formed using a single carrier substrate.

FAN-OUT BACK-TO-BACK CHIP STACKED PACKAGES AND THE METHOD FOR MANUFACTURING THE SAME
20170229426 · 2017-08-10 ·

Disclosed is a fan-out back-to-back chip stacked package, comprising a back-to-back stack of a first chip and a second chip, an encapsulant, a plurality of vias disposed in the encapsulant, a first redistribution layer and a second redistribution layer. The encapsulant encapsulates the sides of the first chip and the sides of the second chip simultaneously and has a thickness not greater than the chip stacked height to expose a first active surface of the first chip and a second active surface of the second chip. The encapsulant has a first peripheral surface expanding from the first active surface and a second peripheral surface expanding from the second active surface. The first redistribution layer is formed on the first active surface and extended onto the first peripheral surface to electrically connect the first chip to the vias in the encapsulant. The second RDL is formed on the second active surface and extended onto the second peripheral surface to electrically connect the second chip to the vias in the encapsulant. Accordingly, the structure realizes a thin package configuration of multi-chip back-to-back stacking to reduce package warpage.

SEMICONDUCTOR PACKAGE INCLUDING STACKED SEMICONDUCTOR CHIPS
20220037304 · 2022-02-03 · ·

A semiconductor package includes a substrate and a sub semiconductor package disposed over the substrate. The sub semiconductor package includes a sub semiconductor chip which has chip pads on its active surface facing the substrate, a sub molding layer which surrounds side surfaces of the sub semiconductor chip and has one surface facing the substrate, and redistribution conductive layers which are connected to the chip pads and extend over the one surface of the sub molding layer. The redistribution conductive layers include a signal redistribution conductive layer, which extends onto an edge of the sub molding layer and has a signal redistribution pad on its end portion, and a power redistribution conductive layer, which has a length shorter than a length of the signal redistribution conductive layer and has a power redistribution pad on its end portion.

FAN-OUT SEMICONDUCTOR PACKAGE
20170278766 · 2017-09-28 ·

A fan-out semiconductor package includes: a fan-out semiconductor package may include: a first interconnection member having a through-hole; a semiconductor chip disposed in the through-hole of the first interconnection member and having an active surface having connection pads disposed thereon and an inactive surface opposing the active surface; an encapsulant encapsulating at least portions of the first interconnection member and the inactive surface of the semiconductor chip; a second interconnection member disposed on the first interconnection member and the active surface of the semiconductor chip; and a reinforcing layer disposed on the encapsulant. The first interconnection member and the second interconnection member respectively include redistribution layers electrically connected to the connection pads of the semiconductor chip.

FAN-OUT SEMICONDUCTOR PACKAGE
20170278812 · 2017-09-28 ·

A fan-out semiconductor package includes: a first interconnection member having a through-hole; a semiconductor chip disposed in the through-hole and having an active surface and an inactive surface; an encapsulant encapsulating at least portions of the first interconnection member and the inactive surface of the semiconductor chip; a second interconnection member disposed on the first interconnection member and the active surface of the semiconductor chip and including a redistribution layer electrically connected to the connection pads of the semiconductor chip; a passivation layer disposed on the second interconnection member; and an under-bump metal layer including an external connection pad formed on the passivation layer and a plurality of vias connecting the external connection pad and the redistribution layer of the second interconnection member to each other, wherein the first interconnection member includes a redistribution layer electrically connected to the connection pads of the semiconductor chip.