Patent classifications
H01L2224/80209
Apparatuses of bonding substrates and methods of bonding substrates
A substrate bonding apparatus includes a lower chuck, an upper chuck, an electric actuator on a central portion of the upper chuck, a pressure sensor, and a controller. The lower chuck may support a lower substrate, the upper chuck may face the lower chuck such that a lower surface of the upper chuck faces the upper surface of the lower chuck, and the upper chuck may support an upper substrate. The electric actuator may lower a bonding pin through the upper chuck to apply a pressure to the upper substrate supported on the upper chuck. The pressure sensor may be below the lower substrate supported on the lower chuck. The pressure sensor may sense a lowering pressure applied by the bonding pin to the pressure sensor in real time. The controller may control the lowering pressure applied by the bonding pin.
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND BONDING METHOD
A substrate processing apparatus includes a chuck configured to attract and hold a substrate; an observer configured to observe multiple positions within a second surface of the substrate attracted to and held by the chuck, the second surface being opposite to a first surface thereof which is in contact with the chuck; and an analyzer configured to analyze observation results of the multiple positions. When a singularity regarding a height from a surface of the chuck attracting and holding the substrate exists on the second surface, the analyzer specifies a position of the singularity on the chuck.
APPARATUSES OF BONDING SUBSTRATES AND METHODS OF BONDING SUBSTRATES
A substrate bonding apparatus includes a lower chuck, an upper chuck, an electric actuator on a central portion of the upper chuck, a pressure sensor, and a controller. The lower chuck may support a lower substrate, the upper chuck may face the lower chuck such that a lower surface of the upper chuck faces the upper surface of the lower chuck, and the upper chuck may support an upper substrate. The electric actuator may lower a bonding pin through the upper chuck to apply a pressure to the upper substrate supported on the upper chuck. The pressure sensor may be below the lower substrate supported on the lower chuck. The pressure sensor may sense a lowering pressure applied by the bonding pin to the pressure sensor in real time. The controller may control the lowering pressure applied by the bonding pin.
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
A device includes a first semiconductor substrate and a second semiconductor substrate. A first insulating film is provided on a first face of the first semiconductor substrate. A first metal layer covers an inner surface of a first grove provided on the first insulating film. A first electrode is provided on the first metal layer and embedded in the first groove. The second semiconductor substrate has a second face facing the first face of the first semiconductor substrate. A second insulating film is provided on the second face of the second semiconductor substrate and is attached to the first insulating film. A second electrode is embedded in a second groove provided on the second insulating film and is connected to the first electrode. An end part of the first metal layer is recessed toward the first semiconductor substrate relative to a surface of the first insulating film.
SUBSTRATE ATTACHMENT FOR ATTACHING A SUBSTRATE THERETO
A method for bonding a first substrate with a second substrate, characterized in that the first substrate and/or the second substrate is/are thinned before the bonding.
Method for bonding substrates
A method for bonding a first substrate with a second substrate, characterized in that the first substrate and/or the second substrate is/are thinned before the bonding.