Patent classifications
H
ELECTRICITY
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H01
ELECTRIC ELEMENTS
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H01L
SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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2224/00
Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
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H01L2224/80
Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
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H01L2224/80001
by connecting a bonding area directly to another bonding area, i.e. connectorless bonding, e.g. bumpless bonding
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H01L2224/8085
using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester
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H01L2224/80885
Combinations of two or more hardening methods provided for in at least two different groups from H01L2224/80855 - H01L2224/8088, e.g. for hybrid thermoplastic-thermosetting adhesives
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H01L2224/80885

BONDING STRUCTURE AND MANUFACTURING METHOD THEREFOR
20230053721 · 2023-02-23 · ·

A bonding structure and a manufacturing method therefor. A first hybrid bonding structure is formed on a first wafer; an interconnection structure and a second hybrid bonding structure are formed on the front surface of a second wafer. The first wafer and the second wafer are bonded by means of the first hybrid bonding structure and the second hybrid bonding structure, a gasket electrically connected to the interconnection structure is formed on the back surface of the second wafer, and the interconnection structure below the gasket and a second conductive bonding pad in the second hybrid bonding structure are provided in a staggered manner in the horizontal direction. According to the solution, the interconnection structure and the second conductive bonding pad are arranged in a staggered manner, so that recesses generated by structural stacking are avoided, and device failure caused by the recesses is further avoided.

Bonding structure and manufacturing method therefor
12463165 · 2025-11-04 · ·

A bonding structure and a manufacturing method therefor. A first hybrid bonding structure is formed on a first wafer; an interconnection structure and a second hybrid bonding structure are formed on the front surface of a second wafer. The first wafer and the second wafer are bonded by means of the first hybrid bonding structure and the second hybrid bonding structure, a gasket electrically connected to the interconnection structure is formed on the back surface of the second wafer, and the interconnection structure below the gasket and a second conductive bonding pad in the second hybrid bonding structure are provided in a staggered manner in the horizontal direction. According to the solution, the interconnection structure and the second conductive bonding pad are arranged in a staggered manner, so that recesses generated by structural stacking are avoided, and device failure caused by the recesses is further avoided.