Patent classifications
H
H01
H01L
29/00
H01L29/66
H01L29/66007
H01L29/66075
H01L29/66227
H01L29/66234
H01L29/6631
H01L29/6631
Trenched and implanted bipolar junction transistor
The present invention concerns a monolithically merged trenched-and-implanted Bipolar Junction Transistor (TI-BJT) with antiparallel diode and a method of manufacturing the same. Trenches are made in a collector, base, emitter stack downto the collector. The base electrode is formed on an implanted base contact region at the bottom surface of the trench. The present invention also provides for products produced by the methods of the present invention and for apparatuses used to perform the methods of the present invention.