A communication interface protection device includes a first electrical overstress (EOS) protection switch electrically connected to a first terminal and a second EOS protection switch electrically connected to a second terminal. Each of the first and second EOS protection switches includes a first semiconductor-controlled rectifier (SCR) and a second SCR and a first diode having a cathode electrically connected to an anode of the first SCR and a second diode having a cathode electrically connected to an anode of the second SCR. The first EOS protection device is configured to be activated in response to an EOS condition that causes a first bias between the first and second terminals, and wherein the second EOS protection device is configured to be activated in response to an EOS condition that causes a second bias between the first and second terminals.

A well-less Transient Voltage Suppressor (TVS) Silicon-Controlled Rectifier (SCR) has a P+ anode region that is not in an N-well. The P+ anode region 20 is surrounded by N+ isolation regions near the surface, and a deep N+ region underneath that is formed in a p-substrate. A N+ cathode region is formed in the p-substrate. The deep N+ region has a doping of 510.sup.18 to 510.sup.19/cm.sup.3, compared to a doping of 110.sup.16/cm.sup.3 for a typical N-well, or a doping of 110.sup.13 to 110.sup.15/cm.sup.3 for the p-substrate. The high doping in the deep N+ region causes a recombination current that can shunt half of the anode current. Since the deep N+ region is much shallower than an N-well, the sidewall capacitance is greatly reduced, allowing for higher speed applications.

A semiconductor structure is provided. The semiconductor structure includes a substrate, a metal layer, a gate, a drain, a source and a first doping region. The substrate has a first doping type. The metal layer is adjacent to the surface of the substrate. The gate is formed on the substrate. The drain is formed in the substrate and located at one side of the gate. The drain is adjacent to the metal layer. The source is formed in the substrate and located at another side of the gate. The first doping region is formed in the substrate and surrounds the metal layer and the drain. The first doping region has a second doping type. The second doping type is different from the first doping type.

An ESD Protection Device includes a semiconductor body including a substrate, conductivity regions, and emitter and collector portions. Laterally adjacent first and second conductivity regions are arranged at least partially within the semiconductor body. The emitter and collector portions are disposed in contact with and arranged over the first and second conductivity regions respectively. The third conductivity region is disposed between the second conductivity region and the collector portion. The first and third conductivity regions have a first conductivity type. The second conductivity region, and the emitter and collector portions have a second conductivity type different from the first conductivity type. When an electrostatic discharge level exceeds a predetermined level, a first discharge current passes between the emitter portion and the collector portion through the first and second conductivity regions. A second discharge current subsequently occurs and passes between the first and third conductivity regions through the second conductivity region.

A communication interface protection device includes a first electrical overstress (EOS) protection switch electrically connected to a first terminal and a second EOS protection switch electrically connected to a second terminal. Each of the first and second EOS protection switches includes a first semiconductor-controlled rectifier (SCR) and a second SCR and a first diode having a cathode electrically connected to an anode of the first SCR and a second diode having a cathode electrically connected to an anode of the second SCR. The first EOS protection device is configured to be activated in response to an EOS condition that causes a first bias between the first and second terminals, and wherein the second EOS protection device is configured to be activated in response to an EOS condition that causes a second bias between the first and second terminals.

A semiconductor structure is provided. The semiconductor structure includes a substrate, a metal layer, a gate, a drain, a source and a first doping region. The substrate has a first doping type. The metal layer is adjacent to the surface of the substrate. The gate is formed on the substrate. The drain is formed in the substrate and located at one side of the gate. The drain is adjacent to the metal layer. The source is formed in the substrate and located at another side of the gate. The first doping region is formed in the substrate and surrounds the metal layer and the drain. The first doping region has a second doping type. The second doping type is different from the first doping type.

A power electronic arrangement includes a semiconductor switch structure configured to assume a forward conducting state. A steady-state current carrying capability of the semiconductor switch structure in the forward conducting state is characterized by a nominal current. The semiconductor switch structure is configured to conduct, in the forward conducting state, at least a part of a forward current in a forward current mode of the power electronic arrangement. A diode structure electrically connected in antiparallel to the semiconductor switch structure is configured to conduct at least a part of a reverse current in a reverse mode of the power electronic arrangement. A thyristor structure electrically connected in antiparallel to the semiconductor switch structure has a forward breakover voltage than a diode on-state voltage of the diode structure at a critical diode current value, the critical diode current value amounting to at most five times the nominal current.

A light-emitting device includes one or more light-emitting units each including a light-emitting element including a function of a thyristor; an electrode for light emission to which a first voltage is applied for light emission of the light-emitting unit; and one or more light emission permission thyristors that permit the light-emitting element to emit light by a second voltage that is lower than the first voltage and set irrespective of the first voltage.

An integrated circuit includes a T-coil circuit, a silicon-controlled rectifier (SCR), and a signal-loss prevention circuit. The T-coil circuit is coupled to an input/output (I/O) pad and an internal circuit. The SCR is coupled to the T-coil circuit and the internal circuit. The signal-loss prevention circuit is coupled to the T-coil circuit and the SCR. The signal-loss prevention circuit includes a resistor coupled to the T-coil circuit and the SCR. An electrostatic current flows through the resistor and turns on the SCR. The signal-loss prevention circuit may also include a diode circuit coupled to the T-coil circuit and the SCR. The diode circuit is configured to prevent signal loss.

A transient voltage suppressor (TVS) circuit includes a first finger and a second finger of semiconductor regions arranged laterally along a first direction on a major surface of a semiconductor layer, the first finger and second finger extending in a second direction orthogonal to the first direction on the major surface of the semiconductor layer. The semiconductor regions in a first portion of the first and second fingers form a silicon controlled rectifier and the semiconductor regions in a second portion of the first and second fingers form a P-N junction diode.