The present application discloses a semiconductor device with two stress-relieving structures and a method for fabricating the semiconductor device. The semiconductor device includes a semiconductor substrate, a first stress-relieving structure including a first conductive frame positioned above the semiconductor substrate and a plurality of first insulating pillars positioned within the conductive frame, a second stress-relieving structure including a plurality of second conductive pillars positioned above the first stress-relieving structure and a second insulating frame, the plurality of second conductive pillars is positioned within the second insulating frame, and a conductive structure including a supporting portion positioned above the second stress-relieving structure, a conductive portion positioned adjacent to the supporting portion, and a plurality of spacers attached to two sides of the conductive portion. The plurality of second conductive pillars is disposed correspondingly above the plurality of first insulating pillars, and the second insulating frame is disposed correspondingly above the first conductive frame.

A semiconductor package includes: a package substrate; a first semiconductor chip disposed over the package substrate and having a center region and an edge region; and a package redistribution layer disposed over the first semiconductor chip, wherein the first semiconductor chip comprises: a lower structure; a redistribution conductive layer disposed over the lower structure and electrically connected to the lower structure, the redistribution conductive layer including a redistribution pad disposed in the center region; and a protective layer covering the lower structure and the redistribution conductive layer, and having an opening exposing the redistribution pad, wherein the package redistribution layer comprises: a package redistribution conductive layer connected to the redistribution pad and extending to the edge region, the package redistribution conductive layer including a package redistribution pad disposed in the edge region, and, wherein, in the edge region, the redistribution conductive layer is omitted.

A semiconductor package includes: a package substrate; a first semiconductor chip disposed over the package substrate and having a center region and an edge region; and a package redistribution layer disposed over the first semiconductor chip, wherein the first semiconductor chip comprises: a lower structure; a redistribution conductive layer disposed over the lower structure and electrically connected to the lower structure, the redistribution conductive layer including a redistribution pad disposed in the center region; and a protective layer covering the lower structure and the redistribution conductive layer, and having an opening exposing the redistribution pad, wherein the package redistribution layer comprises: a package redistribution conductive layer connected to the redistribution pad and extending to the edge region, the package redistribution conductive layer including a package redistribution pad disposed in the edge region, and, wherein, in the edge region, the redistribution conductive layer is omitted.

The present technology relates to a semiconductor device including semiconductor dies formed with vertical die bond pads on an edge of the dies. During wafer fabrication, vertical bond pad blocks are formed in scribe lines of the wafer and electrically coupled to the die bond pads of the semiconductor dies. The vertical bond pad blocks are cut through during wafer dicing, thereby leaving large, vertically oriented pads exposed on a vertical edge of each semiconductor die.

The present technology relates to a semiconductor device including semiconductor dies formed with vertical die bond pads on an edge of the dies. During wafer fabrication, vertical bond pad blocks are formed in scribe lines of the wafer and electrically coupled to the die bond pads of the semiconductor dies. The vertical bond pad blocks are cut through during wafer dicing, thereby leaving large, vertically oriented pads exposed on a vertical edge of each semiconductor die.

In a semiconductor device, a semiconductor element includes a semiconductor substrate, a surface electrode and a protective film. The semiconductor substrate has an active region and an outer peripheral region. The surface electrode includes a base electrode disposed on a front surface of the semiconductor substrate and a connection electrode disposed on the base electrode. The protective film covers a peripheral end portion of the base electrode and an outer peripheral edge of the connection electrode. The protective film has an opening to expose the connection electrode so as to enable a solder connection. A boundary between the outer peripheral edge of the connection electrode and the protective film is located at a position corresponding to the outer peripheral region in a plan view.

In a semiconductor device, a semiconductor element includes a semiconductor substrate, a surface electrode and a protective film. The semiconductor substrate has an active region and an outer peripheral region. The surface electrode includes a base electrode disposed on a front surface of the semiconductor substrate and a connection electrode disposed on the base electrode. The protective film covers a peripheral end portion of the base electrode and an outer peripheral edge of the connection electrode. The protective film has an opening to expose the connection electrode so as to enable a solder connection. A boundary between the outer peripheral edge of the connection electrode and the protective film is located at a position corresponding to the outer peripheral region in a plan view.

A semiconductor wafer includes a first chip region and a second chip region spaced apart from each other by a scribe lane region. The semiconductor wafer also includes a test pad disposed in the scribe lane region. The semiconductor wafer additionally includes a protective layer partially covering the first chip region, the second chip region, and the scribe lane region, wherein the protective layer covers a portion of the test pad adjacent to the first chip region and leaves a remaining portion of the first test pad exposed.

A semiconductor wafer includes a first chip region and a second chip region spaced apart from each other by a scribe lane region. The semiconductor wafer also includes a test pad disposed in the scribe lane region. The semiconductor wafer additionally includes a protective layer partially covering the first chip region, the second chip region, and the scribe lane region, wherein the protective layer covers a portion of the test pad adjacent to the first chip region and leaves a remaining portion of the first test pad exposed.

A groove is formed between an inner peripheral edge of an opening of a pad electrode and an outer peripheral edge of a bonding region located inside the pad electrode in plan view.