The present disclosure relates to the technical field of semiconductors, and provides a semiconductor structure and a manufacturing method thereof. The semiconductor structure includes a first chip and a second chip. A first conductive connection wire of the first chip is connected to a first conductive contact pad, and a second conductive connection wire of the second chip is connected to a second conductive contact pad. In addition, the first conductive contact pad includes a first conductor group and a second conductor group, and the second conductive contact pad includes a third conductor group and a fourth conductor group.

A method of forming a metal-insulator-metal (MIM) capacitor with copper top and bottom plates may begin with a copper interconnect layer (e.g., Cu MTOP) including a copper structure defining the capacitor bottom plate. A passivation region is formed over the bottom plate, and a wide top plate opening is etched in the passivation region, to expose the bottom plate. A dielectric layer is deposited into the top plate opening and onto the exposed bottom plate. Narrow via opening(s) are then etched in the passivation region. The wide top plate opening and narrow via opening(s) are concurrently filled with copper to define a copper top plate and copper via(s) in contact with the bottom plate. A first aluminum bond pad is formed on the copper top plate, and a second aluminum bond pad is formed in contact with the copper via(s) to provide a conductive coupling to the bottom plate.

In one embodiment, a semiconductor device includes a first insulator, a first pad provided in the first insulator, a second insulator provided on the first insulator, and a second pad provided on the first pad in the second insulator. Furthermore, the first insulator includes a first film that is in contact with the first pad and the second insulator, and a second film provided at an interval from the first pad and the second insulator, and including a portion provided at a same height as at least a portion of the first pad.

A copper paste for pressureless bonding is a copper paste for pressureless bonding, containing: metal particles; and a dispersion medium, in which the metal particles include sub-micro copper particles having a volume average particle diameter of greater than or equal to 0.01 μm and less than or equal to 0.8 μm, and micro copper particles having a volume average particle diameter of greater than or equal to 2.0 μm and less than or equal to 50 μm, and the dispersion medium contains a solvent having a boiling point of higher than or equal to 300° C., and a content of the solvent having a boiling point of higher than or equal to 300° C. is greater than or equal to 2 mass % on the basis of a total mass of the copper paste for pressureless bonding.

A copper paste for pressureless bonding is a copper paste for pressureless bonding, containing: metal particles; and a dispersion medium, in which the metal particles include sub-micro copper particles having a volume average particle diameter of greater than or equal to 0.01 μm and less than or equal to 0.8 μm, and micro copper particles having a volume average particle diameter of greater than or equal to 2.0 μm and less than or equal to 50 μm, and the dispersion medium contains a solvent having a boiling point of higher than or equal to 300° C., and a content of the solvent having a boiling point of higher than or equal to 300° C. is greater than or equal to 2 mass % on the basis of a total mass of the copper paste for pressureless bonding.

A high frequency module includes a power amplifier and a substrate on which the power amplifier is mounted. The power amplifier includes a first external terminal and a second external terminal formed on a mounting surface. The substrate includes a first land electrode and a second land electrode formed on one principal surface. The first external terminal is connected to the first land electrode, and the second external terminal is connected to the second land electrode. A distance from the mounting surface to a connection surface of the first external terminal is shorter than a distance from the mounting surface to a connection surface of the second external terminal, and a distance from a connection surface of the first land electrode to the one principal surface is longer than a distance from a connection surface of the second land electrode to the one principal surface.

A high frequency module includes a power amplifier and a substrate on which the power amplifier is mounted. The power amplifier includes a first external terminal and a second external terminal formed on a mounting surface. The substrate includes a first land electrode and a second land electrode formed on one principal surface. The first external terminal is connected to the first land electrode, and the second external terminal is connected to the second land electrode. A distance from the mounting surface to a connection surface of the first external terminal is shorter than a distance from the mounting surface to a connection surface of the second external terminal, and a distance from a connection surface of the first land electrode to the one principal surface is longer than a distance from a connection surface of the second land electrode to the one principal surface.

Provided are a Sn—Bi—In-based low melting-point joining member used in a Pb-free electroconductive joining method in mounting a semiconductor component, and is usable for low-temperature joining, and a manufacturing method therefor.

A Sn—Bi—In-based low melting-point joining member, including a Sn—Bi—In alloy that has a composition within a range represented by a quadrangle in a Sn—Bi—In ternary phase diagram, a first quadrangle having four vertices including: Point 1 (1, 69, 30), Point 2 (26, 52, 22), Point 3 (40, 10, 50), and Point 4 (1, 25, 74), where Point (x, y, z) is defined as a point of x mass % Sn, y mass % Bi and z mass % In, and that also has a melting point of 60 to 110° C. As well as a method for producing a Sn—Bi—In-based low melting-point joining member, including a plating step of forming a plated laminate on an object to be plated, the plated laminate including a laminated plating layer obtained by performing Sn plating, Bi plating, and In plating respectively such that the laminated plating layer has a composition within the range represented by the first quadrangle.

A display device includes a plate-like substrate having a first surface and a second surface, pixel units on the first surface, and a power supply voltage feeder on the second surface. The power supply voltage feeder outputs first and second power supply voltages applicable to the pixel units. The second power supply voltage is lower in potential than the first power supply voltage. The display device includes a first wiring conductor electrically connecting the power supply voltage feeder and the pixel units and a second wiring conductor electrically connecting the power supply voltage feeder and the pixel units. At least one of the first or second wiring conductor includes a planar conductive portion covering the first surface. The planar conductive portion includes connectors connected to the power supply voltage feeder on at least two sides of the substrate.

A display device includes an array substrate, a plurality of mounting electrodes provided to the array substrate, a columnar conductor for coupling provided to each of the mounting electrodes, a plurality of light-emitting elements provided to the array substrate, a first electrode and a second electrode provided to a surface of each of the light-emitting elements facing the array substrate, the first electrode being coupled to one of an anode and a cathode of the light-emitting element, the second electrode being coupled to the other of the anode and the cathode of the light-emitting element, and a coupling member covering each of the first electrode and the second electrode. The columnar conductor is made of material harder than the coupling member, and an end of the columnar conductor on the light-emitting element side is electrically coupled to the coupling member.