The present application discloses a semiconductor device and a method for fabricating the semiconductor device. The semiconductor device includes a first substrate including a center region and an edge region distal from the center region, a first circuit layer positioned on the first substrate, a center power pad positioned in the first circuit layer and above the center region, an edge power pad positioned in the first circuit layer, above the edge region, and electrically coupled to the center power pad, a redistribution power pattern positioned above the first circuit layer and electrically coupled to the center power pad, and an edge power via positioned between the edge power pad and the redistribution power pattern, and electrically connecting the edge power pad and the redistribution power pattern. The first substrate, the center power pad, the edge power pad, the redistribution power pattern, and the edge power via together configure a first semiconductor die.

A semiconductor package may include first and second substrates, which are vertically stacked, a semiconductor device layer on a bottom surface of the second substrate to face a top surface of the first substrate, upper chip pads and an upper dummy pad on the top surface of the first substrate, penetration electrodes, which each penetrate the first substrate and are connected to separate, respective upper chip pads, lower chip pads on a bottom surface of the semiconductor device layer and electrically connected to separate, respective upper chip pads, and a lower dummy pad on the bottom surface of the semiconductor device layer and electrically isolated from the upper dummy pad. A distance between the upper and lower dummy pads in a horizontal direction that is parallel to the first substrate may be smaller than a diameter of the lower dummy pad.

A semiconductor chip includes a chip body including a signal input/output circuit unit, a chip pad unit disposed on one surface of the chip body and including first and second chip pads having different surface areas from each other, and a chip pad selection circuit unit disposed in the chip body and electrically connected to the signal input/output circuit unit and the chip pad unit. The chip pad selection circuit unit is configured to select one chip pad of the first and second chip pads and electrically connect the selected one chip pad to the signal input/output circuit unit.

A semiconductor chip may include: a body portion including a front surface and a back surface; penetrating electrodes penetrating the body portion; and back connection electrodes disposed over the back surface of the body portion and connected to the penetrating electrodes, wherein the penetrating electrodes include a power penetrating electrode for transmitting a power voltage and a ground penetrating electrode for transmitting a ground voltage, the back connection electrodes include a power back connection electrode connected to the power penetrating electrode and a ground back connection electrode connected to the ground penetrating electrode, and one power back connection electrode is connected with two or more power penetrating electrodes, and one ground back connection electrode is connected with two or more ground penetrating electrodes.

A semiconductor device includes a substrate including a surface, a plurality of pads disposing on the surface of the substrate, the plurality of pads includes a non-solder mask defined (NSMD) pad and a solder mask defined (SMD) pad, and the NSMD pad is arranged at a predetermined location. Further, a method of manufacturing a semiconductor device includes providing a substrate, disposing a plurality of pads on a surface of the substrate, disposing a solder mask over the surface of the substrate and the plurality of pads, forming a first recess in the solder mask to surround one of the plurality of pads, and forming a second recess in the solder mask and above one of the plurality of pads.

A semiconductor device includes a die body having a frontside and a transistor having an active area formed in the die body, the active area being bounded by an outer periphery. An interconnect structure is formed over the frontside of the die body and contains patterned electrically conductive material defining first, second, and third contacts electrically coupled to first, second, and third subregions, respectively, within the active area of the transistor. A frontside input/output (I/O) interface is formed in an outer portion of the interconnect structure. The frontside I/O interface contains first, second, and third contact pads, the first contact pad being electrically connected to the first contact, the second contact pad being electrically connected to the second contact, and the third contact pad being electrically connected the third contact, wherein the third contact pad is positioned at a location overlying the active area of the transistor.

An integrated circuit component includes a semiconductor substrate, conductive pads, a passivation layer and conductive vias. The semiconductor substrate has an active surface. The conductive pads are located on the active surface of the semiconductor substrate and electrically connected to the semiconductor substrate, and the conductive pads each have a contact region and a testing region, where in each of the conductive pads, an edge of the contact region is in contact with an edge of the testing region. The passivation layer is located on the semiconductor substrate, where the conductive pads are located between the semiconductor substrate and the passivation layer, and the testing regions and the contact regions of the conductive pads are exposed by the passivation layer. The conductive vias are respectively located on the contact regions of the conductive pads.

A semiconductor package and a fabrication method of the semiconductor package are disclosed. First and second redistribution layer patterns are formed on a semiconductor substrate including a chip region and a scribe lane region to provide a bonding pad portion and an edge pad portion, respectively. A polymer pattern is formed to reveal the bonding pad portion and a portion of the edge pad portion. A dicing line is set on the scribe lane region. A stealth dicing process is performed along the dicing line to separate a semiconductor chip including the bonding pad portion from the semiconductor substrate. The semiconductor chip is disposed on a package substrate. A bonding wire is formed to connect the bonding pad portion to the package substrate. The bonding wire is supported by an edge of the polymer pattern to be spaced apart from the revealed portion of the edge pad portion.

An electronic package structure and a chip thereof are provided. The electronic package structure includes a substrate, a chip, a plurality of signal wires, and a core ground wire. The chip disposed on and electrically connected to the substrate has a core wiring region and an input and output pad region located at a top surface thereof. The input and output pad region is located between the core wiring region and an edge of the chip. The chip includes a plurality of signal pads in the input and output region and a core ground pad adjacent to one of the signal pads. The core ground pad located in the core wiring region. The signal wires are respectively connected to the signal pads. The core ground wire connected to the core ground pad is adjacent to and shields one of the signal wires.

A semiconductor device includes a first semiconductor substrate, a second semiconductor substrate, a bonding electrode, and a dummy electrode. The first semiconductor substrate has a first surface and a first wiring, and contains a first semiconductor material. The second semiconductor substrate has a second surface and a second wiring, and contains a second semiconductor material, and the first surface and the second surface face each other. The bonding electrode is arranged between the first surface and the second surface, and is electrically connected to the first wiring and the second wiring. The dummy electrode is arranged between the first surface and the second surface, and is electrically insulated from at least one of the first wiring and the second wiring. The bonding electrode has a bonding bump and a first bonding pad. The dummy electrode has a dummy bump and a first dummy pad.