A cooling bond layer for a power electronics assembly is provided. The cooling bond layer includes a first end, a second end spaced apart from the first end, a metal matrix extending between the first end and the second end, and a plurality of micro-channels extending through the metal matrix from the first end to the second end. The plurality of micro-channels are configured for a cooling fluid to flow through and remove heat from the cooling bond layer. In some embodiments, the plurality of micro-channels are cylindrical shaped micro-channels. In such embodiments, the plurality of micro-channels may have a generally constant average inner diameter along a thickness of the cooling bond layer. In the alternative, the plurality of micro-channels may have a graded average inner diameter along a thickness of the cooling bond layer. In other embodiments, the plurality of micro-channels may have a wire mesh layered structure.

A power electronics assembly includes a substrate, a semiconductor device and a metal inverse opal (MIO) bonding layer positioned between and bonded to the substrate and the semiconductor device. A first electrode is disposed on a first surface, a second electrode is disposed on a second surface, and a third electrode is disposed on a third surface. The first surface may be a top surface of the semiconductor device, the second surface may be a bottom surface of the semiconductor device, the third surface may be spaced apart from the bottom surface of the semiconductor device, and the second electrode is in electrical communication with the third electrode through the MIO bonding layer. A cooling fluid circuit with a cooling fluid inlet, a cooling fluid outlet and a cooling fluid path through the MIO bonding layer may be included.

A power electronics assembly includes a substrate, a semiconductor device and a metal inverse opal (MIO) bonding layer positioned between and bonded to the substrate and the semiconductor device. A first electrode is disposed on a first surface, a second electrode is disposed on a second surface, and a third electrode is disposed on a third surface. The first surface may be a top surface of the semiconductor device, the second surface may be a bottom surface of the semiconductor device, the third surface may be spaced apart from the bottom surface of the semiconductor device, and the second electrode is in electrical communication with the third electrode through the MIO bonding layer. A cooling fluid circuit with a cooling fluid inlet, a cooling fluid outlet and a cooling fluid path through the MIO bonding layer may be included.

A cooling bond layer for a power electronics assembly is provided. The cooling bond layer includes a first end, a second end spaced apart from the first end, a metal matrix extending between the first end and the second end, and a plurality of micro-channels extending through the metal matrix from the first end to the second end. The plurality of micro-channels are configured for a cooling fluid to flow through and remove heat from the cooling bond layer. In some embodiments, the plurality of micro-channels are cylindrical shaped micro-channels. In such embodiments, the plurality of micro-channels may have a generally constant average inner diameter along a thickness of the cooling bond layer. In the alternative, the plurality of micro-channels may have a graded average inner diameter along a thickness of the cooling bond layer. In other embodiments, the plurality of micro-channels may have a wire mesh layered structure.

A power electronics assembly includes a substrate, a semiconductor device and a metal inverse opal (MIO) bonding layer positioned between and bonded to the substrate and the semiconductor device. A first electrode is disposed on a first surface, a second electrode is disposed on a second surface, and a third electrode is disposed on a third surface. The first surface may be a top surface of the semiconductor device, the second surface may be a bottom surface of the semiconductor device, the third surface may be spaced apart from the bottom surface of the semiconductor device, and the second electrode is in electrical communication with the third electrode through the MIO bonding layer. A cooling fluid circuit with a cooling fluid inlet, a cooling fluid outlet and a cooling fluid path through the MIO bonding layer may be included.

A power electronics assembly includes a substrate, a semiconductor device and a metal inverse opal (MIO) bonding layer positioned between and bonded to the substrate and the semiconductor device. A first electrode is disposed on a first surface, a second electrode is disposed on a second surface, and a third electrode is disposed on a third surface. The first surface may be a top surface of the semiconductor device, the second surface may be a bottom surface of the semiconductor device, the third surface may be spaced apart from the bottom surface of the semiconductor device, and the second electrode is in electrical communication with the third electrode through the MIO bonding layer. A cooling fluid circuit with a cooling fluid inlet, a cooling fluid outlet and a cooling fluid path through the MIO bonding layer may be included.

A microelectronic assembly includes a first substrate having a surface and a first conductive element and a second substrate having a surface and a second conductive element. The assembly further includes an electrically conductive alloy mass joined to the first and second conductive elements. First and second materials of the alloy mass each have a melting point lower than a melting point of the alloy. A concentration of the first material varies in concentration from a relatively higher amount at a location disposed toward the first conductive element to a relatively lower amount toward the second conductive element, and a concentration of the second material varies in concentration from a relatively higher amount at a location disposed toward the second conductive element to a relatively lower amount toward the first conductive element.

A microelectronic assembly includes a first substrate having a surface and a first conductive element and a second substrate having a surface and a second conductive element. The assembly further includes an electrically conductive alloy mass joined to the first and second conductive elements. First and second materials of the alloy mass each have a melting point lower than a melting point of the alloy. A concentration of the first material varies in concentration from a relatively higher amount at a location disposed toward the first conductive element to a relatively lower amount toward the second conductive element, and a concentration of the second material varies in concentration from a relatively higher amount at a location disposed toward the second conductive element to a relatively lower amount toward the first conductive element.

A three-dimensional stacking technique performed in a wafer-to-wafer fashion reducing the machine movement in production. The Wafers are processed with metallic traces and stacked before dicing into separate die stacks. The traces of each layer of the stacks are interconnected via electroless plating.

A method of making a semiconductor including soldering a conductor to an aluminum metallization is disclosed. In one example, the method includes substituting an aluminum oxide layer on the aluminum metallization by a substitute metal oxide layer or a substitute metal alloy oxide layer. Then, substitute metal oxides in the substitute metal oxide layer or the substitute metal alloy oxide layer are at least partly reduced. The conductor is soldered to the aluminum metallization using a solder material.