A semiconductor device includes a first insulating layer, wire contacts spaced apart from each other by the first insulating layer, and a bonding wire connected to the wire contacts. Each of the wire contacts includes a base part in the first insulating layer and a protrusion part protruding from inside to outside the first insulating layer. The protrusion parts of the wire contacts are in contact with the bonding wire.

A method of forming an aluminum oxide layer is provided. The method includes providing a metal surface including at least one metal of a group of metals, the group of metals consisting of copper, aluminum, palladium, nickel, silver, and alloys thereof. The method further includes depositing an aluminum oxide layer on the metal surface by atomic layer deposition, wherein a maximum processing temperature during the depositing is 280° C., such that the aluminum oxide layer is formed with a surface having a liquid solder contact angle of less than 40°.

A semiconductor device includes: a first semiconductor chip having a first pad and a second pad, a depression being formed in the second pad; an organic insulating film provided on the first semiconductor chip, the organic insulating film covering the depression and not covering at least a portion of the first pad; and a redistribution layer having a lower portion connected to the first pad and an upper portion disposed on the organic insulating film.

A semiconductor device of an embodiment includes: a semiconductor substrate; a first insulating layer provided on or above the semiconductor substrate; an aluminum layer provided on the first insulating layer; a second insulating layer provided on the first insulating layer, the second insulating layer covering a first region of a surface of the aluminum layer; and an aluminum oxide film provided on a second region other than the first region of the surface of the aluminum layer, the aluminum oxide film including -alumina as a main component, and a film thickness of the aluminum oxide film being equal to or larger than 0.5 nm and equal to or smaller than 3 nm.

This semiconductor device is provided with: a semiconductor layer; a cell that is provided on the semiconductor layer; an insulating film that covers the cell; a main electrode part that is superposed on the insulating film; a temperature-sensitive diode for sensing temperatures, the diode having a first electrode and a second electrode; and a connection electrode for diode, the connection electrode being used for the purpose of connecting the first electrode to the outside. The main electrode part has: a first bonding region to which a first conductive member is bonded; and a second bonding region to which a second conductive member is bonded. When viewed from the thickness direction of the semiconductor layer, the cell is provided on both a first semiconductor region in the semiconductor layer, and a second semiconductor region in the semiconductor layer.

A memory device includes a circuit having an element on a substrate, an interconnection layer above the circuit and that includes a pad electrode having a region for metal wiring bonding, a plurality of electrode layers between the circuit and the interconnection layer and that are stacked in a first direction from the circuit to the interconnection layer, a semiconductor pillar that extends in the first direction, and a storage film between the electrode layers and the semiconductor pillar. The pad electrode overlaps the circuit element as viewed in the first direction.

In a method of manufacturing a semiconductor device, a semiconductor chip has first and second pads, a passivation film formed such that respective parts of the first and second pads are exposed, a first surface-metal-layer provided on the part of the first pad and a part of the passivation film, and a second surface-metal-layer provided on the part of the second pad and another part of the passivation film. Respective wires are electrically connected to the first and second surface-metal-layers. The semiconductor chip and the respective wires are then sealed with a resin.

A microelectronic device includes a metal layer on a first dielectric layer. An etch stop layer is disposed over the metal layer and on the dielectric layer directly adjacent to the metal layer. The etch stop layer includes a metal oxide, and is less than 10 nanometers thick. A second dielectric layer is disposed over the etch stop layer. The second dielectric layer is removed from an etched region which extends down to the etch stop layer. The etched region extends at least partially over the metal layer. In one version of the microelectronic device, the etch stop layer may extend over the metal layer in the etched region. In another version, the etch stop layer may be removed in the etched region. The microelectronic device is formed by etching the second dielectric layer using a plasma etch process, stopping on the etch stop layer.

A memory device includes a circuit having an element on a substrate, an interconnection layer above the circuit and that includes a pad electrode having a region for metal wiring bonding, a plurality of electrode layers between the circuit and the interconnection layer and that are stacked in a first direction from the circuit to the interconnection layer, a semiconductor pillar that extends in the first direction, and a storage film between the electrode layers and the semiconductor pillar. The pad electrode overlaps the circuit element as viewed in the first direction.

A semiconductor device is presented. The semiconductor device comprises a semiconductor body coupled to a first load terminal and to a second load terminal and configured to carry a load current between the first load terminal and the second load terminal. The first load terminal comprises a contiguous metal layer coupled to the semiconductor body; and at least one metal island arranged on top of and in contact with the contiguous metal layer and configured to be contacted by an end of a bond wire and to receive at least a part of the load current by means of the bond wire, wherein the contiguous metal layer and the metal island are composed of the same metal.