H01L2224/4813

SEMICONDUCTOR PACKAGE HAVING A SIDEWALL CONNECTION
20220051998 · 2022-02-17 · ·

A fan-out wafer level package includes a semiconductor die with a redistribution layer on a sidewall of the semiconductor die. A redistribution layer positioned over the die includes an extended portion that extends along the sidewall. The semiconductor die is encapsulated in a molding compound layer. The molding compound layer is positioned between the extended portion of the redistribution layer and the sidewall of the semiconductor die. Solder contacts, for electrically connecting the semiconductor device to an electronic circuit board, are positioned on the redistribution layer. The solder contacts and the sidewall of the redistribution layer can provide electrical contact on two different locations. Accordingly, the package can be used to improve interconnectivity by providing vertical and horizontal connections.

INTEGRATED CIRCUIT DEVICE
20170236791 · 2017-08-17 ·

The instant disclosure provides an integrated circuit device including a transmission line which includes a first ground line and a signal line. The first ground line includes a first pad, a second pad and a first bonding wire that is a bond wire structure connecting the first pad and the second pad. The first signal line includes a third pad, a fourth pad and a second bonding wire that is a bond wire structure connecting the third pad and the fourth pad.

SEMICONDUCTOR DEVICE
20220310788 · 2022-09-29 ·

A semiconductor device includes a gate interconnect, extending in a first direction, and configured to transmit an input signal, and a transistor including gate electrodes extending in a second direction perpendicular to the first direction, and spaced apart from one another, and connected to the gate interconnect, and source and drain regions alternately arranged along the first direction, so that each gate electrode is sandwiched between the source and drain region which are adjacent to each other. The semiconductor device also includes drain interconnects, arranged above the drain regions, and connected to the drain regions, respectively, an output interconnect, connected to the drain interconnects, and configured to transmit an output signal output from the drain regions, and stubs connected to the drain interconnects, respectively. At least one of the stubs is connected to one of the drain interconnects at an end opposite from the gate interconnect.

SEMICONDUCTOR DEVICE MANUFACTURING METHOD
20170221803 · 2017-08-03 ·

A semiconductor device manufacturing method which enhances the reliability of a semiconductor device. The method includes a step in which a source wire is connected with a semiconductor chip while jigs are pressed against a die pad. The jigs each have a first support portion with a first projection and a second support portion with a second projection. Using the jigs thus structured, the first projection is made to contact with a first point on the front surface of the die pad and then the second projection is made to contact with a second point on the front surface of the die pad located closer to a suspension lead than the first point.

High-frequency amplifier
09774298 · 2017-09-26 · ·

According to one embodiment, a high-frequency amplifier includes an active element and an output matching circuit. The active element is provided on a substrate. The active element is configured to amplify a signal having a frequency band. The active element includes a cell region. The output matching circuit is connected to the active element. The output matching circuit includes a wire, a transmission line and an output terminal. The wire includes an input end and an output end. The input end of the wire is connected to an output part of the cell region of the active element. The transmission line is provided on the substrate. The transmission line includes an input part and an output part. The input part of the transmission line is connected to the output end of the wire. The output terminal is provided on the substrate.

BONDING WIRE-TYPE HEAT SINK STRUCTURE FOR SEMICONDUCTOR DEVICES
20170271234 · 2017-09-21 ·

The present invention discloses a bonding-wire-type heat sink structure for semiconductor devices. An embodiment of the said bonding-wire-type heat sink structure comprises: a semiconductor substrate; a heat source formed on or included in the semiconductor substrate, said heat source including at least one hot spot; at least one heat conduction layer; at least one heat conductor connecting the at least one hot spot with the at least one heat conduction layer; at least one heat dissipation component in an electrically floating state; and at least one bonding wire connecting the at least one heat conduction layer with the at least one heat dissipation component, so as to transmit the heat of the heat source to the heat dissipation component.

Amplifier
11251762 · 2022-02-15 · ·

Examples of an amplifier includes an input divider section having a first path and a second path for branching of an input signal, wherein a passing phase at the first path and a passing phase at the second path are different; a first amplifying element that amplifies a signal input to the first path; a second amplifying element that amplifies a signal input to the second path; an output synthesizing section that performs synthesis of an output of the first amplifying element and an output of the second amplifying element with a third path for transmitting the output of the first amplifying element and a fourth path for transmitting the output of the second amplifying element, wherein a passing phase at the third path and a passing phase at the fourth path are different; and an electromagnetic coupling section that establishes electromagnetic coupling of two signals.

Semiconductor device with tunable antenna using wire bonds
11251516 · 2022-02-15 · ·

A semiconductor device, or semiconductor device package, that includes a substrate having an antenna structure on a surface of the substrate and a wire bond that electrically connects the antenna structure to the substrate to form an antenna or a first antenna configuration. The substrate may include a second antenna structure with the wire bond connected to the second antenna structure forming a second antenna or antenna configuration. The semiconductor device may include a radio communication device electrically connected to the substrate. The antenna or antenna configuration may be tuned to the requirements of the radio communication device. The antenna configuration may be tuned by connected to different antenna structures on the surface of the substrate. The antenna configuration may be tuned by changing a length of the wire bond, changing a diameter of the wire bond, and/or changing the material of the wire bond.

Bipolar transistor on high-resistivity substrate
09761700 · 2017-09-12 · ·

Systems and methods are disclosed for processing radio frequency (RF) signals using one or more bipolar transistors disposed on or above a high-resistivity region of a substrate. The substrate may include, for example, bulk silicon, at least a portion of which has high-resistivity characteristics. For example, the bulk substrate may have a resistivity greater than 500 Ohm*cm, such as around 1 kOhm*cm. In certain embodiments, one or more of the bipolar devices are surrounded by a low-resistivity implant configured to reduce effects of harmonic and other interference.

Semiconductor device

A semiconductor device that includes a plurality of trench gate structures each having a gate electrode extending in a depth direction of an element, the plurality of trench gate structures including first trench gate structures respectively contributing to control of the element and second trench gate structures respectively not contributing to the control of the element, the semiconductor device including an electrode portion having a potential other than a gate potential, and an electrode pad that is disposed on a front face of a semiconductor substrate, wherein the electrode pad is used as a terminal to apply a predetermined voltage to gate insulator films, in screening that is executed by applying the predetermined voltage to the gate insulator films respectively in contact with the gate electrode connected to the electrode pad and that is executed before the electrode pad is short-circuited to the electrode portion.