In a non-insulated DC-DC converter having a circuit in which a power MOSFET high-side switch and a power MOSFET low-side switch are connected in series, the power MOSFET low-side switch and a Schottky barrier diode to be connected in parallel with the power MOSFET low-side switch are formed within one semiconductor chip. The formation region SDR of the Schottky barrier diode is disposed in the center in the shorter direction of the semiconductor chip, and on both sides thereof, the formation regions of the power MOSFET low-side switch are disposed. From the gate finger in the vicinity of both long sides on the main surface of the semiconductor chip toward the formation region SDR of the Schottky barrier diode, a plurality of gate fingers are disposed so as to interpose the formation region SDR between them.

A method of forming a microelectronic device structure comprises coiling a portion of a wire up and around at least one sidewall of a structure protruding from a substrate. At least one interface between an upper region of the structure and an upper region of the coiled portion of the wire is welded to form a fused region between the structure and the wire.

A method of forming a microelectronic device structure comprises coiling a portion of a wire up and around at least one sidewall of a structure protruding from a substrate. At least one interface between an upper region of the structure and an upper region of the coiled portion of the wire is welded to form a fused region between the structure and the wire.

In a non-insulated DC-DC converter having a circuit in which a power MOSFET high-side switch and a power MOSFET low-side switch are connected in series, the power MOSFET low-side switch and a Schottky barrier diode to be connected in parallel with the power MOSFET low-side switch are formed within one semiconductor chip. The formation region SDR of the Schottky barrier diode is disposed in the center in the shorter direction of the semiconductor chip, and on both sides thereof, the formation regions of the power MOSFET low-side switch are disposed. From the gate finger in the vicinity of both long sides on the main surface of the semiconductor chip toward the formation region SDR of the Schottky barrier diode, a plurality of gate fingers are disposed so as to interpose the formation region SDR between them.

A semiconductor device includes a semiconductor chip having a source electrode on the front surface thereof, a diode that has an anode electrode on the front surface thereof, and a first conductive member through which output signals from the source electrode pass. The semiconductor device further includes a first wiring member that electrically connects the source electrode and the first conductive member, and a second wiring member that electrically connects the anode electrode and the first conductive member and that has a wider surface area than the first wiring member. The semiconductor device includes a second conductive member where the semiconductor chip and the diode are arranged.

A method of forming a microelectronic device structure comprises coiling a portion of a wire up and around at least one sidewall of a structure protruding from a substrate. At least one interface between an upper region of the structure and an upper region of the coiled portion of the wire is welded to form a fused region between the structure and the wire.

A method of forming a microelectronic device structure comprises coiling a portion of a wire up and around at least one sidewall of a structure protruding from a substrate. At least one interface between an upper region of the structure and an upper region of the coiled portion of the wire is welded to form a fused region between the structure and the wire.

Stacked microelectronic packages comprise microelectronic elements each having a contact-bearing front surface and edge surfaces extending away therefrom, and a dielectric encapsulation region contacting an edge surface. The encapsulation defines first and second major surfaces of the package and a remote surface between the major surfaces. Package contacts at the remote surface include a first set of contacts at positions closer to the first major surface than a second set of contacts, which instead are at positions closer to the second major surface. The packages are configured such that major surfaces of each package can be oriented in a nonparallel direction with the major surface of a substrate, the package contacts electrically coupled to corresponding contacts at the substrate surface. The package stacking and orientation can provide increased packing density.

Stacked microelectronic packages comprise microelectronic elements each having a contact-bearing front surface and edge surfaces extending away therefrom, and a dielectric encapsulation region contacting an edge surface. The encapsulation defines first and second major surfaces of the package and a remote surface between the major surfaces. Package contacts at the remote surface include a first set of contacts at positions closer to the first major surface than a second set of contacts, which instead are at positions closer to the second major surface. The packages are configured such that major surfaces of each package can be oriented in a nonparallel direction with the major surface of a substrate, the package contacts electrically coupled to corresponding contacts at the substrate surface. The package stacking and orientation can provide increased packing density.

A semiconductor device includes a substrate, a semiconductor chip having a first surface bonded to the substrate and a second surface that is opposite to the first surface and includes a first electrode pad and a second electrode pad thereon, the first electrode pad being electrically connected to a circuit of the semiconductor chip that is operated during operation of the semiconductor device and the second electrode pad being electrically separated from the circuit, a first wire extending between the first electrode pad and a terminal of the substrate that is electrically connected with an external device during operation of the semiconductor device, a second wire extending between the second electrode pad and the substrate, and a resin layer formed over the second surface of the semiconductor chip and covering the first and second wires.