Disclosed is a semiconductor package. The semiconductor package includes a substrate including an opening, a first semiconductor chip, disposed on the substrate, including a plurality of first chip pads exposed through the opening, a second semiconductor chip, disposed on the first semiconductor chip to partially overlap with the first semiconductor chip, including a plurality of second chip pads, aligned with the opening, and a redistribution layer formed on a surface on which the second chip pads of the second semiconductor chip are disposed. One or more of the second chip pads overlaps with the first semiconductor chip and is covered by the first semiconductor chip and with the remaining pads of the second chip pads being exposed through the opening. The redistribution layer includes redistribution pads, exposed through the opening, and includes redistribution lines, configured to connect the one or more of the second chip pads to the redistribution pads.

Disclosed is a semiconductor package. The semiconductor package includes a substrate including an opening, a first semiconductor chip, disposed on the substrate, including a plurality of first chip pads exposed through the opening, a second semiconductor chip, disposed on the first semiconductor chip to partially overlap with the first semiconductor chip, including a plurality of second chip pads, aligned with the opening, and a redistribution layer formed on a surface on which the second chip pads of the second semiconductor chip are disposed. One or more of the second chip pads overlaps with the first semiconductor chip and is covered by the first semiconductor chip and with the remaining pads of the second chip pads being exposed through the opening. The redistribution layer includes redistribution pads, exposed through the opening, and includes redistribution lines, configured to connect the one or more of the second chip pads to the redistribution pads.

A method for manufacturing a semiconductor device includes (i) a step of preparing a first semiconductor chip having a first electrode pad thereon and a second semiconductor chip having a second electrode pad thereon and larger in thickness than the first semiconductor chip, the second electrode pad being larger in size than the first electrode pad, (ii) a step of mounting the first semiconductor chip and the second semiconductor chip on the same planarized surface of a substrate having a uniform thickness, (iii) a step of bonding a ball formed by heating and melting a bonding wire to the second electrode pad, (iv) a step of first-bonding the bonding wire to the first electrode pad, and (v) a step of second-bonding the bonding wire to the ball.

A floating die package including a cavity formed through sublimation of a sacrificial die encapsulant and sublimation or separation of die attach materials after molding assembly. A pinhole vent in the molding structure is provided as a sublimation path to allow gases to escape, whereby the die or die stack is released from the substrate and suspended in the cavity by the bond wires only.

A floating die package including a cavity formed through sublimation of a sacrificial die encapsulant and sublimation or separation of die attach materials after molding assembly. A pinhole vent in the molding structure is provided as a sublimation path to allow gases to escape, whereby the die or die stack is released from the substrate and suspended in the cavity by the bond wires only.

A semiconductor device, a drain electrode terminal supporting the semiconductor device and connected directly to a drain electrode pad, a source electrode terminal connected to a source electrode pad, and a gate electrode terminal are provided, wherein the source electrode terminal includes a wire post, a first lead extending from one end of the wire post, and a second lead extending from another end of the wire post, wherein the source electrode pad and the wire post of the source electrode terminal are connected to each other through a plurality of bonding wires, and wherein the semiconductor device, a surface, supporting the semiconductor device thereon, of the drain electrode terminal, the wire post of the source electrode terminal, the bonding wires, and part of the gate electrode terminal are covered with a mold resin.

A semiconductor device, a drain electrode terminal supporting the semiconductor device and connected directly to a drain electrode pad, a source electrode terminal connected to a source electrode pad, and a gate electrode terminal are provided, wherein the source electrode terminal includes a wire post, a first lead extending from one end of the wire post, and a second lead extending from another end of the wire post, wherein the source electrode pad and the wire post of the source electrode terminal are connected to each other through a plurality of bonding wires, and wherein the semiconductor device, a surface, supporting the semiconductor device thereon, of the drain electrode terminal, the wire post of the source electrode terminal, the bonding wires, and part of the gate electrode terminal are covered with a mold resin.

A gold-coated silver bonding wire includes: a core material containing silver as a main component; and a coating layer provided on a surface of the core material and containing gold as a main component. The gold-coated silver bonding wire contains gold in a range of not less than 2 mass % nor more than 7 mass %, and at least one sulfur group element selected from the group consisting of sulfur, selenium, and tellurium in a range of not less than 1 mass ppm nor more than 80 mass ppm, with respect to a total content of the bonding wire.

A wire bonding structure and a method of manufacturing the same are provided. The wire bonding structure includes a bonding pad structure, a protection layer and a bonding wire. The bonding pad structure includes a bonding pad and a conductive layer. The bonding pad has an opening. The conductive layer is electrically connected to the bonding pad. At least a portion of the conductive layer is located in the opening of the bonding pad and laterally surrounded by the bonding pad. The protection layer at least covers a portion of a surface of the bonding pad structure. The bonding wire is bonded to the conductive layer of the bonding pad structure.

A wire bonding structure and a method of manufacturing the same are provided. The wire bonding structure includes a bonding pad structure, a protection layer and a bonding wire. The bonding pad structure includes a bonding pad and a conductive layer. The bonding pad has an opening. The conductive layer is electrically connected to the bonding pad. At least a portion of the conductive layer is located in the opening of the bonding pad and laterally surrounded by the bonding pad. The protection layer at least covers a portion of a surface of the bonding pad structure. The bonding wire is bonded to the conductive layer of the bonding pad structure.