A semiconductor device includes a semiconductor substrate of a first conductivity type, a first semiconductor layer of the first conductivity type formed on the semiconductor substrate and having a first conductivity type impurity concentration higher than that of the semiconductor substrate, a second semiconductor layer of a second conductivity type formed above the first semiconductor layer, a first device region formed in the second semiconductor layer and configured to operate based on a first reference voltage, a second device region formed in the second semiconductor layer and configured to operate based on a second reference voltage, the second device region being spaced apart from the first device region, and a region isolation structure interposed between the first and second device regions and formed in a region extending from a front surface of the second semiconductor layer to the first semiconductor layer so as to electrically isolate the first and second device regions from each other.

A semiconductor device includes a semiconductor substrate, a gate dielectric, a gate electrode, and a pair of source/drain regions. The gate dielectric is disposed in the semiconductor substrate having an upper boundary lower than an upper surface of the semiconductor substrate, and an upper surface flush with the upper surface of the semiconductor substrate. The gate electrode is disposed over the gate dielectric having a first section over the upper boundary of the gate dielectric and a second section over the upper surface of the gate dielectric. The second section partially covers and partially exposes the upper surface of the gate dielectric. The pair of source/drain regions are disposed on opposing sides of the gate dielectric.

A power device and a guard ring structure surrounding the power device are provided. The power device includes: a buried layer of a first conductivity type and a buried layer of a second conductivity type disposed within a substrate; a body region of the first conductivity type and a drift region of the second conductivity type disposed on the buried layer of the first conductivity type; and a gate electrode, a source electrode, and a drain electrode disposed on the body region of the first conductivity type and the drift region of the second conductivity type. The guard ring structure includes: a first guard ring of the second conductivity type adjacent to the power device; a second guard ring of the first conductivity type adjacent to the first guard ring; and a third guard ring of the second conductivity type adjacent to the second guard ring.

Structures with altered crystallinity beneath semiconductor devices and methods associated with forming such structures. Trench isolation regions surround an active device region composed of a single-crystal semiconductor material. A first non-single-crystal layer is arranged beneath the trench isolation regions and the active device region. A second non-single-crystal layer is arranged beneath the trench isolation regions and the active device region. The first non-single-crystal layer is arranged between the second non-single-crystal layer and the active device region.

A switching LDMOS device is formed first well in a semiconductor substrate that includes an LDD region and a first body doped region; a first heavily doped region serving as a source region is provided in the LDD region, and a second heavily doped region serving as a drain region is provided in the first body doped region; a channel of the switching LDMOS device is formed at a surface layer of the semiconductor substrate between the LDD region and the body doped region and below the gate structure; and one side of the LDD region and one side of the body doped region which are away from the gate structure both are provided with a field oxide or STI, and one side of the field oxide or STI is in contact with the first heavily doped region or the second heavily doped region.

The present disclosure relates to semiconductor power devices, and in particular, to a high-electron-mobility transistor (HEMT) with high voltage endurance capability and a preparation method thereof. The high-electron-mobility transistor with high voltage endurance capability includes a gate electrode, a source electrode, a drain electrode, a barrier layer, a P-type nitride semiconductor layer and a substrate, wherein the P-type nitride semiconductor layer is between the barrier layer and the substrate, which is insufficient to significantly deplete a two-dimensional electron gas in a channel except a gate stack, the source electrode is in electrical contact with the P-type nitride semiconductor layer, and the source electrode and the drain electrode are both in electrical contact with the two-dimensional electron gas.

A High Electron Mobility Transistor (HEMT) having a reduced surface field (RESURF) junction is provided. The HEMT includes a source electrode at a first end and a drain electrode at a second end. A gate electrode is provided between the source electrode and the drain electrode. A reduced surface field (RESURF) junction extends from the first end to the second end. The gate electrode is provided above the RESURF junction. A buried channel layer is formed in the RESURF junction on application of a positive voltage at the gate electrode. The RESURF junction includes an n-type Gallium nitride (GaN) layer and a p-type GaN layer. The n-type GaN layer is provided between the p-type GaN layer and the gate electrode.

A level shifter circuit for translating input signal to output signal is disclosed. The level shifter includes an input stage and a latch stage. The latch stage comprises at least a transistor characterized in a substantially matched transconductance with the input stage for preventing a discrete realization of a voltage clamp circuit. The transistor is a semiconductor device including a source region having a source doping region and a drain region having a first doping region and a second doping region. The first doping region is doped with a first conductivity impurity. The second doping region is disposed around the first doping region so as to surround the first doping region, and is doped with a second conductivity impurity. The second doping region has a higher on-resistance than the first doping region, thereby a high resistive series path is created by the second doping region to mimic an embedded resistor.

The present disclosure provides a nitride-based bidirectional switching device with substrate potential management capability. The device has a control node, a first power/load node, a second power/load node and a main substrate, and comprises: a nitride-based bilateral transistor and a substrate potential management circuit configured for managing a potential of the main substrate. By implementing the substrate potential management circuit, the substrate potential can be stabilized to a lower one of the potentials of the first source/drain and the second source/drain of the bilateral transistor no matter in which directions the bidirectional switching device is operated. Therefore, the bilateral transistor can be operated with a stable substrate potential for conducting current in both directions.

A semiconductor device includes a semiconductor layer, a source region and a drain region that are formed in the semiconductor layer and at an interval in a first direction, a gate insulating film that is formed such as to cover a channel region between the source region and the drain region, and a gate electrode that is formed on the gate insulating film and opposes the channel region across the gate insulating film. The gate insulating film has a major portion on which the gate electrode is formed and extension portions projecting outward from each of both sides of the major portion in a second direction orthogonal to the first direction and leak current suppressing electrodes are formed on the extension portions.