A CMOS integrated circuit containing an isolated n-channel DEMOS transistor and an isolated vertical PNP transistor has deep n-type wells and surrounding shallow n-type wells providing isolation from the p-type substrate. The isolated n-channel DEMOS transistor has an upper n-type layer providing an extended drain, and a lower p-type layer isolating the extended drain from the underlying deep n-type well. The isolated vertical PNP transistor has an upper n-type layer providing a base and a lower p-type layer providing a collector. A CMOS integrated circuit having opposite polarities of the transistors may be formed by appropriate reversals in dopant types.

The present application discloses new approaches to providing “passive-off” protection for a B-TRAN-like device. Even if the control circuitry is inactive, AC coupling uses transient voltage on the external terminals to prevent forward biasing an emitter junction. Preferably the same switches which implement diode-mode and pre-turnoff operation are used as part of the passive-off circuit operation.

Disclosed herein are systems and method for voltage clamping in semiconductor circuits using through-silicon via (TSV) positioning. A semiconductor die is disclosed that includes a silicon substrate, a bipolar transistor having collector, emitter, base and sub-collector regions disposed on the substrate, and a through-silicon via (TSV) positioned within 35 μm of the sub-collector region in order to clamp a peak voltage of the bipolar transistor at a voltage limit level.

A power element includes a substrate structure, an insulation layer, a dielectric layer, a transistor, and a plurality of zener diodes. The transistor is located in a transistor formation region of the substrate structure. The plurality of zener diodes are located in a circuit element formation region of the substrate structure and connected in series with each other. Each of the zener diodes includes a zener diode doping structure and a zener diode metal structure. The zener diode doping structure is formed on the insulation layer and is covered by the dielectric layer. The zener diode doping structure includes a P-type doped region and an N-type doped region that are in contact with each other. The zener diode metal structure is formed on the dielectric layer and partially passes through the dielectric layer to be electrically connected to the P-type doped region and the N-type doped region.

A transistor is produced by forming a first part of a first region of the transistor in a semiconductor substrate by implanting dopants through an opening in an isolating trench formed at an upper surface of the semiconductor substrate. A second region of the transistor in the opening by epitaxy.

A device including a transistor is fabricated by forming a first part of a first region of the transistor through the implantation of dopants through a first opening. The second region of the transistor is then formed in the first opening by epitaxy.

A semiconductor device includes a substrate layer having a floating base region of a first conductivity type. A first well of a second conductivity type and the floating base region form a first pn junction. A first conductive structure is electrically connected to the first well. A barrier region of the second conductivity type and the floating base region form an auxiliary pn junction. A second conductive structure is electrically connected to the floating base region through a rectifying structure. A pull-down structure is configured to produce a voltage drop between the barrier region and the second conductive structure, when charge carriers cross the auxiliary pn junction.

Example implementations include a bandgap voltage device with a first current source operatively coupled to a bandgap input node and a bandgap output node and operable to output a first proportional-to-absolute-temperature (PTAT) current, a current mirror including a first bandgap transistor and a second bandgap transistor, and operatively coupled to the bandgap output node, and a second current source operatively coupled to the current mirror and operable to output a second PTAT current. Example implementations also include a bandgap transistor device with a first P+ layer proximate to a center of a planar surface of a transistor device, a first N+ layer at least partially surrounding the first P+ layer along the planar surface, a second P+ layer at least partially surrounding the first N+ layer along the planar surface, a second N+ layer at least partially surrounding the second P+ layer along the planar surface, and a third P+ layer at least partially surrounding the second N+ layer along the planar surface.

A power element includes a substrate structure, an insulation layer, a dielectric layer, a transistor, and a plurality of zener diodes. The transistor is located in a transistor formation region of the substrate structure. The plurality of zener diodes are located in a circuit element formation region of the substrate structure and connected in series with each other. Each of the zener diodes includes a zener diode doping structure and a zener diode metal structure. The zener diode doping structure is formed on the insulation layer and is covered by the dielectric layer. The zener diode doping structure includes a P-type doped region and an N-type doped region that are in contact with each other. The zener diode metal structure is formed on the dielectric layer and partially passes through the dielectric layer to be electrically connected to the P-type doped region and the N-type doped region.

A characteristic of a semiconductor device having a back electrode including an Au—Sb alloy is improved. The semiconductor device has a semiconductor substrate and the back electrode including the Au—Sb alloy layer. The back electrode is formed on the semiconductor substrate. The Sb concentration in the Au—Sb alloy layer is equal to or greater than 15 wt %, and equal to or less than 37 wt %. The thickness of the Au—Sb alloy layer is equal to or larger than 20 nm, and equal to or less than 45 nm.