Gate fingers (2-1 to 2-6) are arranged in one direction and each of the gate fingers is disposed so as to be adjacent to a corresponding one of drain electrodes (3-1 to 3-3) and a corresponding one of source electrodes (4-1 to 4-4) alternately, and have non-uniform gate head lengths.

Gate fingers (2-1 to 2-6) are arranged in one direction and each of the gate fingers is disposed so as to be adjacent to a corresponding one of drain electrodes (3-1 to 3-3) and a corresponding one of source electrodes (4-1 to 4-4) alternately, and have non-uniform gate head lengths.

A junction field-effect transistor (JFET) with a gate region that includes two separate sub-regions having material of different conductivity types and/or a Schottky junction that substantially suppresses gate current when the gate junction is forward-biased, as well as complementary circuits that incorporate such JFET devices.

A display device includes: a substrate including a display area and a non-display area; a gate driver disposed on the substrate in the non-display area and including a plurality of stages that generate a gate signal and output the gate signal to the display area; a switching transistor and a driving transistor disposed on the substrate in the display area; and a light emitting diode connected to the driving transistor, wherein each of the plurality of stages may include a plurality of transistors, wherein a channel layer of the driving transistor includes a first oxide semiconductor material, and a channel layer of the plurality of transistors included in each of the plurality of stages includes a second oxide semiconductor material, wherein the first oxide semiconductor material is different from the second oxide semiconductor material, and wherein the second oxide semiconductor material may include tin.

A high-frequency transistor includes a source electrode, a drain electrode, a gate electrode, and a gate drive line that applies a voltage to the gate electrode. An impedance adjustment circuit is connected between the gate electrode and the gate drive line. A characteristic impedance of the gate electrode is Z1, when a connecting point between the impedance adjustment circuit and the gate electrode is viewed from the impedance adjustment circuit. A characteristic impedance of the gate drive line is Z2, when a connecting point between the impedance adjustment circuit and the gate drive line is viewed from the impedance adjustment circuit. X that denotes a characteristic impedance of the impedance adjustment circuit is a value between Z1 and Z2.

A MESFET transistor on a horizontal substrate surface with at least one wiring layer on the substrate surface. The transistor comprises source, drain and gate electrodes which are at least partly covered by a semiconducting channel layer. The source, drain and gate electrodes optionally comprise interface contact materials for changing the junction type between each electrode and the channel. The interface between the source electrode and the channel is an ohmic junction, the interface between the drain electrode and the channel is an ohmic junction, and the interface between the gate electrode and the channel is a Schottky junction. The substrate is a CMOS substrate.

Provided is an enhancement mode HEMT device including a substrate, a channel layer, a first barrier layer, a gate, a source and a drain. The channel layer is disposed on the substrate. The first barrier layer is disposed on the channel layer. At least one trench penetrates through the first barrier layer and extends into the channel layer. The gate is disposed on the first barrier layer, fills in the at least one trench and is in contact with the channel layer. The source and the drain are disposed in the first barrier layer and the channel layer and located at two sides of the gate.

Apparatus and methods for compound semiconductor protection clamps are provided herein. In certain configurations, a compound semiconductor protection clamp includes a resistor-capacitor (RC) trigger network and a metal-semiconductor field effect transistor (MESFET) clamp. The RC trigger network detects when an ESD/EOS event is present between a first node and a second node, and activates the MESFET clamp in response to detecting the ESD/EOS event. When the MESFET clamp is activated, the MESFET clamp provides a low impedance path between the first and second nodes, thereby providing ESD/EOS protection. When deactivated, the MESFET clamp provides high impedance between the first and second nodes, and thus operates with low leakage current and small static power dissipation.

A multi-gate transistor includes a semiconductor fin over a substrate. The semiconductor fin includes a central fin formed of a first semiconductor material; and a semiconductor layer having a first portion and a second portion on opposite sidewalls of the central fin. The semiconductor layer includes a second semiconductor material different from the first semiconductor material. The multi-gate transistor further includes a gate electrode wrapping around sidewalls of the semiconductor fin; and a source region and a drain region on opposite ends of the semiconductor fin. Each of the central fin and the semiconductor layer extends from the source region to the drain region.

A junction field-effect transistor (JFET) with a gate region that includes two separate sub-regions having material of different conductivity types and/or a Schottky junction that substantially suppresses gate current when the gate junction is forward-biased, as well as complementary circuits that incorporate such JFET devices.