An electronic part includes a substrate, an insulating film formed over the substrate, a first pillar electrode, a first solder formed over the first pillar electrode, a second pillar electrode, and a second solder formed over the second pillar electrode. The first pillar electrode over which the first solder is formed is formed over a first region of an insulating film including a level difference between a first opening portion and a peripheral portion of the first opening portion. The second pillar electrode over which the second solder is formed is formed over a second region of the insulating film including a second opening portion whose opening area is larger than that of the first opening portion. For example, the second pillar electrode over which the second solder is formed is formed over the second opening portion of the insulating film.

A semiconductor device is provided that includes a dielectric layer, a bond pad, a passivation layer and a planar barrier. The bond pad is positioned in the dielectric layer. The passivation layer is positioned over the dielectric layer and has an opening over the bond pad. The planar barrier is positioned on the bond pad.

Various embodiments provide a semiconductor device, including a final metal layer having a top side and at least one sidewall; and a passivation layer disposed over at least part of at least one of the top side and the at least one sidewall of the final metal layer; wherein the passivation layer has a substantially uniform thickness.

A semiconductor device (4a-4d) and a wiring device (5) are provided on a main surface of a base plate (1). A first wire (11a-11e) connects an external electrode (7a-7e) and a first relay pad (8a-8e) of the wiring device (5). A second wire (12a-12e) connects a pad (13a-13e) of the semiconductor device (4a-4d) and the second relay pad (9a-9e) of the wiring device (5). Resin (15) seals the semiconductor device (4a-4d), the wiring device (5) and the first and second wires (11a-11e,12a-12e). The second wire (12a-12e) is thinner than the first wire (11a-11e). The pad (13a-13e) is smaller than the first relay pad (8a-8e).

The present invention provides a semiconductor structure and a method of fabricating the same. The method includes: providing a chip having conductive pads, forming a metal layer on the conductive pads, forming a passivation layer on a portion of the metal layer, and forming conductive pillars on the metal layer. Since the metal layer is protected by the passivation layer, the undercut problem is solved, the supporting strength of the conductive pillars is increased, and the product reliability is improved.

The present invention provides a semiconductor structure and a method of fabricating the same. The method includes: providing a chip having conductive pads, forming a metal layer on the conductive pads, forming a passivation layer on a portion of the metal layer, and forming conductive pillars on the metal layer. Since the metal layer is protected by the passivation layer, the undercut problem is solved, the supporting strength of the conductive pillars is increased, and the product reliability is improved.

A package that includes a substrate, an integrated device, a plurality of first wire bonds, at least one second wire bond, and an encapsulation layer. The integrated device is coupled to the substrate. The plurality of first wire bonds is coupled to the integrated device and the substrate. The plurality of first wire bonds is configured to provide at least one electrical path between the integrated device and the substrate. The at least one second wire bond is coupled to the integrated device. The at least one second wire bond is configured to be free of an electrical connection with a circuit of the integrated device. The encapsulation layer is located over the substrate and the integrated device. The encapsulation layer encapsulates the integrated device, the plurality of first wire bonds and the at least one second wire bond.

Disclosed is a fan-out back-to-back chip stacked package, comprising a back-to-back stack of a first chip and a second chip, an encapsulant, a plurality of vias disposed in the encapsulant, a first redistribution layer and a second redistribution layer. The encapsulant encapsulates the sides of the first chip and the sides of the second chip simultaneously and has a thickness not greater than the chip stacked height to expose a first active surface of the first chip and a second active surface of the second chip. The encapsulant has a first peripheral surface expanding from the first active surface and a second peripheral surface expanding from the second active surface. The first redistribution layer is formed on the first active surface and extended onto the first peripheral surface to electrically connect the first chip to the vias in the encapsulant. The second RDL is formed on the second active surface and extended onto the second peripheral surface to electrically connect the second chip to the vias in the encapsulant. Accordingly, the structure realizes a thin package configuration of multi-chip back-to-back stacking to reduce package warpage.

The present disclosure provides a semiconductor device. The semiconductor device includes a semiconductor chip having a first main surface including an active region and a peripheral region surrounding the active region; a first trench formed in the active region; a first insulating film formed on an inner surface of the first trench; a first electrode formed in the first trench interfacing the first insulating film, and forming a channel in a portion of the semiconductor chip facing the first insulating film; a second trench formed in the peripheral region and having a width greater a width of the first trench; a second insulating film formed on an inner surface of the second trench; and a second electrode formed in the second trench interfacing the second insulating film and electrically coupled to the first electrode.

An integrated fan-out package includes a die, an encapsulant, a seed layer, a conductive pillar, a redistribution structure, and a buffer layer. The encapsulant encapsulates the die. The seed layer and the conductive pillar are sequentially stacked over the die and the encapsulant. The redistribution structure is over the die and the encapsulant. The redistribution structure includes a conductive pattern and a dielectric layer. The conductive pattern is directly in contact with the seed layer and the dielectric layer covers the conductive pattern and surrounds the seed layer and the conductive pillar. The buffer layer is disposed over the redistribution structure. The seed layer is separate from the dielectric layer by the buffer layer, and a Young's modulus of the buffer layer is higher than a Young's modulus of the dielectric layer of the redistribution structure.