A semiconductor device includes: a first semiconductor chip having a first electrode and a second electrode on a first surface and having a third electrode on a second surface that is opposite to the first surface; a second semiconductor chip having a first electrode and a second electrode on a first surface and having a third electrode on a second surface that is opposite to the first surface; a first electrode plate bonded to the second electrode of the first semiconductor chip by a bonding material; a second electrode plate bonded to the third electrode of the second semiconductor chip by a bonding material; and a third electrode plate placed between the first semiconductor chip and the second semiconductor chip and having a first area sandwiched between the first semiconductor chip and the second semiconductor chip and a second area not sandwiched between the first semiconductor chip and the second semiconductor chip, wherein one surface of the first area of the third electrode plate is bonded to the second electrode of the second semiconductor chip by a bonding material, and another surface of the first area of the third electrode plate is bonded to the third electrode of the first semiconductor chip by a bonding material, and wherein in the third electrode plate, the first area is thinner than the second area.

A semiconductor device includes: a first semiconductor chip having a first electrode and a second electrode on a first surface and having a third electrode on a second surface that is opposite to the first surface; a second semiconductor chip having a first electrode and a second electrode on a first surface and having a third electrode on a second surface that is opposite to the first surface; a first electrode plate bonded to the second electrode of the first semiconductor chip by a bonding material; a second electrode plate bonded to the third electrode of the second semiconductor chip by a bonding material; and a third electrode plate placed between the first semiconductor chip and the second semiconductor chip and having a first area sandwiched between the first semiconductor chip and the second semiconductor chip and a second area not sandwiched between the first semiconductor chip and the second semiconductor chip, wherein one surface of the first area of the third electrode plate is bonded to the second electrode of the second semiconductor chip by a bonding material, and another surface of the first area of the third electrode plate is bonded to the third electrode of the first semiconductor chip by a bonding material, and wherein in the third electrode plate, the first area is thinner than the second area.

The present application discloses a semiconductor device with a heat dissipation unit and a method for fabricating the semiconductor device. The semiconductor device includes a die stack, an intervening bonding layer positioned on the die stack, and a carrier structure including a carrier substrate positioned on the intervening bonding layer, and through semiconductor vias positioned in the carrier substrate and on the intervening bonding layer for thermally conducting heat.

The present application discloses a semiconductor device with a heat dissipation unit and a method for fabricating the semiconductor device. The semiconductor device includes a die stack, an intervening bonding layer positioned on the die stack, and a carrier structure including a carrier substrate positioned on the intervening bonding layer, and through semiconductor vias positioned in the carrier substrate and on the intervening bonding layer for thermally conducting heat.

A bonded body according to an embodiment includes a substrate, a metal member, and a bonding layer. The bonding layer is provided between the substrate and the metal member. The bonding layer includes a first particle including carbon, a first region including a metal, and a second region including titanium. The second region is provided between the first particle and the first region. A concentration of titanium in the second region is greater than a concentration of titanium in the first region.

A bonded body according to an embodiment includes a substrate, a metal member, and a bonding layer. The bonding layer is provided between the substrate and the metal member. The bonding layer includes a first particle including carbon, a first region including a metal, and a second region including titanium. The second region is provided between the first particle and the first region. A concentration of titanium in the second region is greater than a concentration of titanium in the first region.

A package structure is provided. The package structure includes a die, a lead frame, and a conductive glue. The lead frame includes a die pad and a retaining wall structure. The die pad is configured to support the die, and the retaining wall structure surrounds the die. The conductive glue is disposed between the die and the lead frame.

A package structure is provided. The package structure includes a die, a lead frame, and a conductive glue. The lead frame includes a die pad and a retaining wall structure. The die pad is configured to support the die, and the retaining wall structure surrounds the die. The conductive glue is disposed between the die and the lead frame.

A structure including a wiring substrate, an interposer disposed on and electrically connected to the wiring substrate, a semiconductor die disposed on and electrically connected to the interposer, a first insulating encapsulation disposed on the interposer, a second insulating encapsulation disposed on the wiring substrate, and a lid is provided. The semiconductor die is laterally encapsulated by the first insulating encapsulation. The semiconductor die and the first insulating encapsulation are laterally encapsulated by the second insulating encapsulation. A top surface of the first insulating encapsulation is substantially leveled with a top surface of the second insulating encapsulation and a surface of the semiconductor die. The lid is disposed on the semiconductor die, the first insulating encapsulation and the second insulating encapsulation.

A structure including a wiring substrate, an interposer disposed on and electrically connected to the wiring substrate, a semiconductor die disposed on and electrically connected to the interposer, a first insulating encapsulation disposed on the interposer, a second insulating encapsulation disposed on the wiring substrate, and a lid is provided. The semiconductor die is laterally encapsulated by the first insulating encapsulation. The semiconductor die and the first insulating encapsulation are laterally encapsulated by the second insulating encapsulation. A top surface of the first insulating encapsulation is substantially leveled with a top surface of the second insulating encapsulation and a surface of the semiconductor die. The lid is disposed on the semiconductor die, the first insulating encapsulation and the second insulating encapsulation.