H01L2027/11827

Semiconductor device, operation method of semiconductor device, and manufacturing method of semiconductor device

The present disclosure relates to a semiconductor device, an operation method of a semiconductor device, and a manufacturing method of a semiconductor device which are capable of minimizing influence of a gate length variation on a circuit characteristic and increasing a good product ratio (yield) in a product sorting test. A ring oscillator configured such that the plurality of inverters is connected in a ring-like form, and gate capacitors of the transistors are connected to respective output terminals of the plurality of inverters as a load capacitor outputs an oscillating signal, the ring oscillator is configured with a plurality of transistors having the same gate length, and at least two or more ring oscillators including a plurality of transistors having different gate lengths are configured. At the time of product test, the gate length is calculated on the basis of frequencies of oscillating signals of a plurality of ring oscillators, and a back bias is applied in accordance with a correction value corresponding to the calculated gate length, and an operation is performed. The present disclosure can be applied to semiconductor devices.

SEMICONDUCTOR DEVICE, OPERATION METHOD OF SEMICONDUCTOR DEVICE, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
20190214408 · 2019-07-11 ·

The present disclosure relates to a semiconductor device, an operation method of a semiconductor device, and a manufacturing method of a semiconductor device which are capable of minimizing influence of a gate length variation on a circuit characteristic and increasing a good product ratio (yield) in a product sorting test. A ring oscillator configured such that the plurality of inverters is connected in a ring-like form, and gate capacitors of the transistors are connected to respective output terminals of the plurality of inverters as a load capacitor outputs an oscillating signal, the ring oscillator is configured with a plurality of transistors having the same gate length, and at least two or more ring oscillators including a plurality of transistors having different gate lengths are configured. At the time of product test, the gate length is calculated on the basis of frequencies of oscillating signals of a plurality of ring oscillators, and a back bias is applied in accordance with a correction value corresponding to the calculated gate length, and an operation is performed. The present disclosure can be applied to semiconductor devices.

Cell architecture with intrinsic decoupling capacitor

An IC includes an array of cells and a first set of endcap cells. The array of cells includes a first set of M.sub.x layer power interconnects coupled to a first voltage, a first set of M.sub.x layer interconnects, a second set of M.sub.x layer power interconnects coupled to a second voltage source, and a second set of M.sub.x layer interconnects. The first set of endcap cells includes first and second sets of M.sub.x+1 layer interconnects. The first set of M.sub.x+1 layer interconnects is coupled to the first set of M.sub.x layer power interconnects and to the second set of M.sub.x layer interconnects to provide a first set of decoupling capacitors. The second set of M.sub.x+1 layer interconnects is coupled to the second set of M.sub.x layer power interconnects and to the first set of M.sub.x layer interconnects to provide a second set of decoupling capacitors.