A composite power element includes a substrate structure, an insulation layer, a dielectric layer, a MOSFET, and a Zener diode. The MOSFET is formed in a transistor formation region of the substrate structure. The Zener diode is formed in a circuit element formation region of the substrate structure, and includes a Zener diode doping structure that is formed in the substrate structure and is covered by the insulation layer. The Zener diode doping structure includes a first P-type doped region and a first N-type doped region that is formed on an inner side of the first P-type doped region. The Zener diode further includes a Zener diode metal structure that is formed on the dielectric layer and sequentially passes through the dielectric layer and the insulation layer to be electrically connected to the first P-type doped region and the first N-type doped region.

A semiconductor device includes a first semiconductor structure. The first semiconductor structure includes a first semiconductor material having a band-gap. The first semiconductor structure has a first surface. An insulating layer has first and second opposing surfaces. The first surface of the insulating layer is on the first surface of the first semiconductor structure. A second semiconductor structure is on the second surface of the insulating layer and includes a second semiconductor material having a band-gap that is smaller than the band-gap of the first semiconductor material. A floating electrode couples the first semiconductor structure to the second semiconductor structure.

A semiconductor device includes a semiconductor layer having a first surface and a second surface, a first region of a first conductivity type formed on the first surface side of the semiconductor layer, a second region of a second conductivity type in contact with the first region, a third region of the first conductivity type that is in contact with the second region and exposed from the first surface side of the semiconductor layer, a gate electrode facing the second region through a gate insulating film, a first electrode that is physically separated from the gate electrode and faces the second region and the third region through an insulating film, a second electrode formed on the semiconductor layer and electrically connected to the first region, the second region, and the first electrode, and a third electrode electrically connected to the third region.

A power semiconductor device includes a termination region having a corner and an element region inside the termination region. An SiC substrate spans the element region and the termination region. An interlayer insulating film has an outer edge in the termination region. A source electrode is in contact with the SiC substrate in the element region, and has an outer edge on the interlayer insulating film in the termination region. An insulating protective film covers the outer edge of the interlayer insulating film and the outer edge of the source electrode, and has an inner edge on the source electrode. At the corner of the termination region, the outer edge of the interlayer insulating film has a radius of curvature R1, and the inner edge of the insulating protective film has a radius of curvature R2. The radius of curvature R2 is greater than the radius of curvature R1.

A semiconductor device according to the present invention includes a semiconductor layer, a gate trench defined in the semiconductor layer, a first insulating film arranged on the inner surface of the gate trench, a gate electrode arranged in the gate trench via the first insulating film, and a source layer, a body layer, and a drain layer arranged laterally to the gate trench, in which the first insulating film includes, at least at the bottom of the gate trench, a first portion and a second portion with a film elaborateness lower than that of the first portion from the inner surface of the gate trench in the film thickness direction.

Provided is a semiconductor device, wherein: in a semiconductor substrate, a lifetime control region is provided from at least a part of a transistor portion to a diode portion; the transistor portion includes a main region, a boundary region located between the main region and the diode portion and overlapped with the lifetime control region, and a plurality of gate trench portions; the plurality of gate trench portions include a first gate trench portion provided in the main region and a second gate trench portion provided in the boundary region; and a gate resistance component of the first gate trench portion is different from a gate resistance component of the second gate trench portion.

A semiconductor device has a plurality of transistors, which have first electrodes in first trenches, and includes: two second trenches, which are formed side by side between the first trenches. A second electrode is formed in each of the two second trenches. A first impurity region is formed between the first trench and the second trench; a second impurity region is formed to abut on the first trench; a third impurity region is formed to abut on the second trench; a fourth impurity region, which is formed between two of the second trenches and has a higher impurity concentration than the first impurity region; and a fifth impurity region is formed below the first impurity region and the fourth impurity region. A third electrode is formed to be electrically connected to the first impurity region, the second impurity region, the third impurity region, and the fourth impurity region.

A semiconductor device includes a semiconductor layer, having a drain region, a body region, and a source region, a gate electrode, facing the body region via a gate insulating film, a first pillar layer disposed inside the semiconductor layer so as to be continuous to the body region, and a trap level region, disposed inside the semiconductor layer and containing charged particles that form a trap level, and an electric field concentration portion, where an electric field concentrates in an off state in which a channel is not formed in the body region, and the trap level region are disposed at mutually different depth positions in a depth direction of the first pillar layer.

According to various embodiments, a transistor model for a computer based simulation of a field effect transistor may include: a first electrical network coupled between a drain node, a source node and a gate node, wherein the first electrical network is configured to represent an electrical characteristic of the field effect transistor in a forward operation; a second electrical network coupled parallel to the first electrical network and between the source node and the drain node, wherein the second electrical network is configured to represent an electrical characteristic of the field effect transistor in at least one of a commutation operation and a reverse operation; wherein the second electrical network includes: a controlled first source representing a parasitic junction of the field effect transistor; at least one controlled second source representing a charge injection dependent parasitic impedance of the field effect transistor; wherein the controlled first source and the at least one controlled second source are coupled in parallel; and wherein the controlled first source and the at least one controlled second source are coupled via at least one parameter such that a charge injection from the parasitic junction into the parasitic impedance is considered.

A region of a portion directly beneath an OC pad is a sensing effective region in which unit cells of a current sensing portion are disposed. A p-type low-dose region is provided on a front surface of a semiconductor substrate and surrounds a periphery of the sensing effective region. The p-type low-dose region is fixed at an electric potential of a source pad of a main semiconductor element. The p-type low-dose region is disposed to be separated from a p-type base region of the sensing effective region by an n.sup.−-type region between the p-type low-dose region and the sensing effective region. A total dose of impurities in the p-type low-dose region is lower than a total dose of impurities in a p-type region of a front side of a semiconductor substrate in a main effective region in which unit cells of the main semiconductor element are disposed.