A semiconductor device of embodiments includes: a first electrode; a second electrode; a gate electrode extending in a first direction; and a SiC layer. The SiC layer includes: a first conductive type first SiC region having a first region, a second region facing the gate electrode, and a third region in contact with the first electrode; a second conductive type second SiC region between the second region and the third region; a second conductive type third SiC region, the second region interposed between the second SiC region and the third SiC region; a second conductive type fourth SiC region, the third region interposed between the second SiC region and the fourth SiC region; a first conductive type fifth SiC region; a second conductive type sixth SiC region between the first region and the second SiC region; and a second conductive type seventh SiC region between the first region and the second SiC region and distant from the sixth SiC region in the first direction.

A semiconductor device of embodiments includes: an element region including a transistor, a first diode, and a first contact portion; a termination region surrounding the element region and including a second contact portion; and an intermediate region provided between the element region and the termination region and not including the transistor, the first diode, the first contact portion, and the second contact portion. The element region includes a first electrode, a second electrode, a gate electrode, a silicon carbide layer, and a gate insulating layer. The termination region includes a first wiring layer electrically connected to the first electrode, the second electrode, and the silicon carbide layer. The intermediate region includes the silicon carbide layer. The width of the intermediate region in a direction from the element region to the termination region is equal to or more than twice the thickness of the silicon carbide layer.

A semiconductor device of embodiments includes: an element region including a transistor and a first diode; a termination region surrounding the element region and including a second diode; and an intermediate region between the element region and the termination region. The element region includes a first electrode, a second electrode, a gate electrode, a silicon carbide layer, and a gate insulating layer. The termination region includes a first wiring layer electrically connected to the first electrode, the second electrode, and the silicon carbide layer. The intermediate region includes a gate electrode pad, a first connection layer electrically connecting the first electrode and a part of the first wiring layer, a second connection layer electrically connecting the first electrode and another part of the first wiring layer, a second wiring layer electrically connected to the gate electrode pad and the gate electrode, and the silicon carbide layer.

An insulated-gate semiconductor device, which has trenches arranged in a chip structure, the trenches defining both sidewalls in a first and second sidewall surface facing each other, includes: a first unit cell including a main-electrode region in contact with a first sidewall surface of a first trench, a base region in contact with a bottom surface of the main-electrode region and the first sidewall surface, a drift layer in contact with a bottom surface of the base region and the first sidewall surface, and a gate protection-region in contact with the second sidewall surface and a bottom surface of the first trench; and a second unit cell including an operation suppression region in contact with a first sidewall surface and a second sidewall surface of a second trench, wherein the second unit cell includes the second trench located at one end of an array of the trenches.

This application is directed to integrating a field-effect transistor (FinFET) and a Schottky barrier diode on a substrate. A first fin structure and a second fin structure are formed on the substrate. The first fin structure includes a channel portion extending to two stressor portions on two opposite sides of the channel portion, and the second fin structure includes a junction portion. A source structure and a drain structure of the FinFET are formed on the two stressor portions of the first fin structure, respectively. A source metallic material, a drain metallic material, a first metallic material are formed to electrically couple to the source structure, the drain structure, and the junction portion of the second fin structure, respectively, thereby providing a Schottky junction between the junction portion of the second fin structure and the first metallic material.

According to an embodiment, provided is a semiconductor device including: a first electrode; a second electrode; and a silicon carbide layer disposed between the first electrode and the second electrode, the silicon carbide layer including: a first silicon carbide region of an n-type; and a second silicon carbide region disposed between the first silicon carbide region and the first electrode, the second silicon carbide being in contact with the first electrode, and the second silicon carbide containing one oxygen atom bonding with four silicon atoms.

A semiconductor device comprises a semiconductor die having a first region and a second region, wherein an operating temperature of the second region is lower than an operating temperature of the first region. A plurality of first tubs are respectively disposed in the first region, the second region, or both. The semiconductor device further comprises a power device comprising a plurality of power device cells, and a diode having a plurality of diode cells. The power devices cells are disposed within tubs or portions of tubs that are in the first region, and the diode cells are disposed within tubs or portions of tubs that are in the second region. The power device may comprise a vertical metal oxide semiconductor field effect transistor (MOSFET), and the diode may comprise a vertical Schottky barrier diode (SBD).

A semiconductor device includes a semiconductor layer of a first conductivity type having a first main surface at one side and a second main surface at another side, a trench gate structure including a gate trench formed in the first main surface of the semiconductor layer, and a gate electrode embedded in the gate trench via a gate insulating layer, a trench source structure including a source trench formed deeper than the gate trench and across an interval from the gate trench in the first main surface of the semiconductor layer, a source electrode embedded in the source trench, and a deep well region of a second conductivity type formed in a region of the semiconductor layer along the source trench, a ratio of a depth of the trench source structure with respect to a depth of the trench gate structure being not less than 1.5 and not more than 4.0, a body region of the second conductivity type formed in a region of a surface layer portion of the first main surface of the semiconductor layer between the gate trench and the source trench, a source region of the first conductivity type formed in a surface layer portion of the body region, and a drain electrode connected to the second main surface of the semiconductor layer.

A transistor device is disclosed. The transistor device includes: a semiconductor body (100); a drift region (11) in the semiconductor body (100); a plurality of transistor cells (10); and a gate node (G) and a source node (S), wherein each of the plurality of transistor cells (10) includes: a first trench electrode (21) insulated from the semiconductor body (100) by a first dielectric layer (22); a second trench electrode (23) insulated from the semiconductor body (100) by a second dielectric layer (24); a source region (13) and a body region (14) in a first mesa region (111) between the first trench electrode (21) and the second trench electrode (23); and a compensation region (12), wherein the compensation region (12) adjoins the body region (14), the first dielectric (22), the second dielectric (24), and forms a pn-junction with the drift region (11), and wherein from the first trench electrode (21) and the second trench electrode (23) at least the first trench electrode (21) is connected to the gate node (G).

A semiconductor device includes a transistor array and a sense pad. The transistor array includes a plurality of transistor cells electrically connected in parallel between a source electrode and a drain structure. The drain structure is formed in a semiconductor portion based on a single-crystalline wide bandgap material. A sense element formed from the wide bandgap material includes at least one rectifying junction electrically connected between the sense pad and the source electrode.