Patent classifications
H01L2224/08168
Vertical chip interposer and method of making a chip assembly containing the vertical chip interposer
A multi-grooved interposer includes an interposer substrate containing multiple parallel grooves laterally extending along a first direction and laterally spaced among one another along a second direction, and multiple conductive strips. The multiple parallel grooves are recessed from front side surfaces of the multi-grooved interposer in a third direction toward a back side surface of the multi-grooved interposer. The multiple conductive strips continuously extend across recessed surfaces in the multiple parallel grooves and the front side surfaces along the second direction with an undulating surface profile to provide electrically conductive paths across the multiple parallel grooves. Each of the multiple parallel grooves is configured to receive an edge of a respective semiconductor chip.
VERTICAL CHIP INTERPOSER AND METHOD OF MAKING A CHIP ASSEMBLY CONTAINING THE VERTICAL CHIP INTERPOSER
A multi-grooved interposer includes an interposer substrate containing multiple parallel grooves laterally extending along a first direction and laterally spaced among one another along a second direction, and multiple conductive strips. The multiple parallel grooves are recessed from front side surfaces of the multi-grooved interposer in a third direction toward a back side surface of the multi-grooved interposer. The multiple conductive strips continuously extend across recessed surfaces in the multiple parallel grooves and the front side surfaces along the second direction with an undulating surface profile to provide electrically conductive paths across the multiple parallel grooves. Each of the multiple parallel grooves is configured to receive an edge of a respective semiconductor chip.
Vertical semiconductor device having a stacked die block
A semiconductor device vertically mounted on a medium such as a printed circuit board, and a method of its manufacture, are disclosed. The semiconductor device includes a stack of semiconductor die having contact pads which extend to an active edge of the die aligned on one side of the stack. The active edges of the die are affixed to the PCB and the contact pads at the active edge are electrically coupled to the PCB. This configuration provides an optimal, high density arrangement of semiconductor die in the device, where a large number of semiconductor die can be mounted and electrically coupled directly to the PCT, without a substrate, without staggering the semiconductor die, and without using wire bonds.
SEMICONDUCTOR PACKAGE INCLUDING SEMICONDUCTOR CHIP HAVING THROUGH-ELECTRODE
A semiconductor package includes a first semiconductor chip including a first bonding layer, the first bonding layer including a first chip pad and a first insulating layer covering a side surface of the first chip pad, a second semiconductor chip disposed below the first semiconductor chip and including a substrate having front and rear surfaces, the front surface forming a second bonding layer, and through-electrodes passing through the substrate and having protrusions protruding from the rear surface, the second bonding layer including a second chip pad contacting the first chip pad and a second insulating layer covering a side surface of the second chip pad, a redistribution layer disposed below the second semiconductor chip and electrically connected to the second semiconductor chip, vias disposed between the redistribution layer and the first semiconductor chip and disposed around the second semiconductor chip, and an encapsulant surrounding the second semiconductor chip, the redistribution layer, and the vias. The encapsulant may be in contact with the protrusions of the through-electrodes.
Microelectronic assemblies formed using metal silicide, and methods of fabrication
Two microelectronic components (110, 120), e.g. a die and an interposer, are bonded to each other. One of the components' contact pads (110C) include metal, and the other component has silicon (410) which reacts with the metal to form metal silicide (504). Then a hole (510) is made through one of the components to reach the metal silicide and possibly even the unreacted metal (110C) of the other component. The hole is filled with a conductor (130), possibly metal, to provide a conductive via that can be electrically coupled to contact pads (120C.B) attachable to other circuit elements or microelectronic components, e.g. to a printed circuit board.
VERTICAL SEMICONDUCTOR DEVICE
A semiconductor device vertically mounted on a medium such as a printed circuit board, and a method of its manufacture, are disclosed. The semiconductor device includes a stack of semiconductor die having contact pads which extend to an active edge of the die aligned on one side of the stack. The active edges of the die are affixed to the PCB and the contact pads at the active edge are electrically coupled to the PCB. This configuration provides an optimal, high density arrangement of semiconductor die in the device, where a large number of semiconductor die can be mounted and electrically coupled directly to the PCT, without a substrate, without staggering the semiconductor die, and without using wire bonds.
CHIP PACKAGE STRUCTURE AND MANUFACTURING METHOD THEREOF
A chip package structure and a manufacturing method are provided. The chip package structure includes a substrate, a first chip, an insulating layer and a plurality of routing layers. The substrate has a first metal pad and a second metal pad. The first chip is disposed on the first metal pad. The insulating layer is disposed on the substrate and partially covers the first metal pad, the second metal pad and the first chip. The plurality of routing layers are disposed on the substrate and electrically connected to the first metal pad, the second metal pad and the first chip.
MICROELECTRONIC ASSEMBLIES FORMED USING METAL SILICIDE, AND METHODS OF FABRICATION
Two microelectronic components (110, 120), e.g. a die and an interposer, are bonded to each other. One of the components' contact pads (110C) include metal, and the other component has silicon (410) which reacts with the metal to form metal silicide (504). Then a hole (510) is made through one of the components to reach the metal silicide and possibly even the unreacted metal (110C) of the other component. The hole is filled with a conductor (130), possibly metal, to provide a conductive via that can be electrically coupled to contact pads (120C.B) attachable to other circuit elements or microelectronic components, e.g. to a printed circuit board.