A method includes forming a plurality of metal posts. The plurality of metal posts is interconnected to form a metal-post row by weak portions between neighboring ones of the plurality of metal posts. The weak portions include a same metal as the plurality of metal posts. A majority of each of the plurality of metal posts is separated from respective neighboring ones of the plurality of metal posts. An end portion of each of the plurality of metal posts is plated with a metal. The plurality of metal posts is disposed into a metal post-storage. The method further includes retrieving one of the metal posts from a metal-post storage, and bonding the one of the metal posts on a metal pad.

A semiconductor device (100) comprising a leadframe (120) having an assembly pad (121) in a first horizontal plane (180), the pad's first surface (121a) with a semiconductor chip (110) attached; further a plurality of leads (122) in a parallel second horizontal plane (190) offset from the first plane in the direction of the attached chip, the leads having a third surface (122a) with bonding wires, and an opposite fourth surface (122b); a package (140) encapsulating leadframe, chip, and wires, the package having a fifth surface (140a) parallel to the first and second planes; a plurality of recess holes (150) in the package, each hole stretching from the fifth surface to the fourth surface of respective leads; and solder (160) filling the recess holes, the solder attached to the fourth lead surface and extending to the fifth package surface.

A semiconductor device (100) comprising a leadframe (120) having an assembly pad (121) in a first horizontal plane (180), the pad's first surface (121a) with a semiconductor chip (110) attached; further a plurality of leads (122) in a parallel second horizontal plane (190) offset from the first plane in the direction of the attached chip, the leads having a third surface (122a) with bonding wires, and an opposite fourth surface (122b); a package (140) encapsulating leadframe, chip, and wires, the package having a fifth surface (140a) parallel to the first and second planes; a plurality of recess holes (150) in the package, each hole stretching from the fifth surface to the fourth surface of respective leads; and solder (160) filling the recess holes, the solder attached to the fourth lead surface and extending to the fifth package surface.

A semiconductor package includes a pad and leads, the pad and leads including a base metal predominantly including copper, a first plated metal layer predominantly including nickel in contact with the base metal, and a second plated metal layer predominantly including silver in contact with the first plated metal layer. The first plated metal layer has a first plated metal layer thickness of 0.1 to 5 microns, and the second plated metal layer has a second plated metal layer thickness of 0.2 to 5 microns. The semiconductor package further includes an adhesion promotion coating predominantly including silver oxide in contact with the second plated metal layer opposite the first plated metal layer, a semiconductor die mounted on the pad, a wire bond extending between the semiconductor die and a lead of the leads, and a mold compound covering the semiconductor die and the wire bond.

The invention relates to a chip arrangement (10) and to a method for forming a contact connection (11) between a chip (18), in particular a power transistor or the like, and a conductor material track (14), the conductor material track being formed on a non-conductive substrate (12), the chip being arranged on the substrate or on a conductor material track (15), a silver paste (29) or a copper paste being applied to each of a chip contact surface (25) of the chip and the conductor material track (28), a contact conductor (30) being immersed into the silver paste or the copper paste on the chip contact surface and into the silver paste or the copper paste on the conductor material track, a solvent contained in the silver paste or the copper paste being at least partially vaporized by heating and the contact connection being formed by sintering the silver paste or the copper paste by means of laser energy.

In the manufacturing method of a semiconductor device according to an embodiment, a suspension lead is connected to a chip mounting section on which a semiconductor chip is mounted. Also, the suspension lead includes: a first tab connection section connected to the chip mounting section and extending in a first direction; a first branch section provided at a position higher than the first tab connection section with respect to a chip mounting surface and branching in a plurality of directions intersecting the first direction; and a plurality of first exposed-surface connection sections provided at positions higher than the first branch section and each having one end connected to a portion exposed from a sealing body. In addition, the suspension lead includes: a first offset section connected to the first tab connection section and the first branch section; and a plurality of second offset sections each having one end connected to the first branch section and the other end connected to each of the plurality of first exposed-surface connection sections.

A semiconductor device has an interposer and a surface mount technology (SMT) component disposed on the interposer. The interposer is disposed on an active surface of a semiconductor die. The semiconductor die is disposed on a substrate. A first wire bond connection is formed between the interposer and semiconductor die. A second wire bond connection is formed between the interposer and substrate. A third wire bond connection is formed between the substrate and semiconductor die. An encapsulant is deposited over the substrate, semiconductor die, interposer, and SMT component. In one embodiment, the substrate is a quad flat non-leaded substrate. In another embodiment, the substrate is a land-grid array substrate, ball-grid array substrate, or leadframe.

An electronic device includes: a semiconductor body; a front metallization region; a top buffer region, arranged between the front metallization region and the semiconductor body; and a conductive wire, electrically connected to the front metallization region. The top buffer region is at least partially sintered.

A method for manufacturing a semiconductor device includes preparing a semiconductor chip having a back surface made of a Cu layer. The semiconductor chip is bonded to a die pad having a front surface made of Cu via a bonding material containing a dissimilar metal not containing Cu and Pb and a Bi-based material so that the Cu layer and the bonding material come into contact with each other. After the bonding, the die pad is then heat-treated.

A method for manufacturing a semiconductor device includes preparing a semiconductor chip having a back surface made of a Cu layer. The semiconductor chip is bonded to a die pad having a front surface made of Cu via a bonding material containing a dissimilar metal not containing Cu and Pb and a Bi-based material so that the Cu layer and the bonding material come into contact with each other. After the bonding, the die pad is then heat-treated.