Patent classifications
B01D53/005
PROCESS AND APPARATUS FOR REMOVAL OF IMPURITIES FROM CHLOROSILANES
A process for removal of impurities, in particular of dopants, from chlorosilanes which includes the following steps: (a) heating a deposition surface (3); (b) contacting the heated deposition surface (3) with at least one gaseous chlorosilane mixture, the gaseous chlorosilane mixture including at least one chlorosilane and at least one impurity, in particular at least one dopant; (c) at least partially removing the impurity, in particular the dopant, by forming polycrystalline silicon depositions on the deposition surface (3), the polycrystalline silicon depositions being enriched with the impurity, in particular with the dopant; (d) discharging the purified gaseous chlorosilane mixture; (e) contacting the heated deposition surface (3) with an etching gas to return the polycrystalline silicon depositions and the impurity, in particular the dopant, into the gas phase to form a gaseous etching gas mixture; and (f) discharging the gaseous etching gas mixture.
Apparatus for treating mercury-containing waste and method for recovering high purity elemental mercury using same apparatus
The present invention relates to an apparatus for treating waste containing mercury and a method for recovering high purity elemental mercury using the apparatus. More specifically, the present invention may provide a method that can more economically and stably recover high purity elemental mercury from waste containing mercury using an apparatus for recovering mercury from waste containing mercury, the apparatus comprising: a thermal desorption unit; a dust control unit; and a condensation and recovery unit, which are connected in series. The present invention has an advantage in that, compared to a conventional simple heat treatment-condensation method, a high recovery rate of mercury is achieved and high purity mercury can be obtained.
CONCENTRATED CATALYST COMBUSTION SYSTEM HAVING ACTIVE CONCENTRATION RATIO CONTROL MEANS
Provided is a concentrated catalyst combustion system including an active concentration rate control means. The concentrated catalyst combustion system including an active concentration rate control means includes an absorption blower fan absorbing exhaust gas containing volatile organic compounds (VOCs), a VOC concentrator into which the exhaust gas passing through the absorption blower fan is introduced, and in which adsorption and desorption of the VOCs are carried out, a flow rate regulating blower fan absorbing a portion of the exhaust gas flowing into the VOC concentrator in a direction in which the VOCs are desorbed, a concentration measurer, arranged between the VOC concentrator and the flow rate regulating blower fan, measuring the concentration of the VOCs after desorption, a catalyst combustor burning concentrated VOCs provided by the flow rate regulating blower fan, and a controller controlling the flow rate regulating blower fan to regulate the flow rate absorbed from the VOC concentrator to maintain within a certain range the concentration of the VOCs measured by the concentration measurer.
Systems and methods for improved waste gas abatement
The present disclosure generally relates to systems and methods for the combustive abatement of waste gas formed during the manufacture of semiconductor wafers. In particular, the systems described herein are capable of combusting air-polluting perfluorocarbons, including those having high greenhouse gas indexes such as hexafluoroethane (C.sub.2F.sub.6) and tetrafluoromethane (CF.sub.4), as well as particulate-forming silicon dioxide precursors, such as silane (SiH.sub.4) and tetraethoxysilane (Si(OC.sub.2H.sub.5).sub.4, abbreviated TEOS), with greater efficiency and lower energy usage than prior abatement systems. More particularly, and in one preferred embodiment, the present disclosure is directed to a waste gas abatement system that utilizes a combination of non-combustible and combustible gases (or gas mixtures) for thermal combustion, which are directed through multiple permeable interior surfaces of a reaction chamber, efficiently combusting waste gas and preventing undesirable accumulation of solid particulate matter on the chamber surfaces.
Wash hood for abatement equipment and method of washing
Wash hood for washing contaminants from heat exchange media, and a method of washing media. The wash hood may include a housing containing a flow distributor such as a perforated member that facilitates uniform dispersing of fluid from the wash hood. The wash hood may include a fluid inlet for connection to a fluid source, such as water under pressure, and an outlet for dispersing or spraying the water towards the media to be cleaned.
Abatement apparatus
The abatement apparatus includes a porous element at least partially defining a treatment chamber and through which treatment materials pass for introduction into the treatment chamber for treatment of an effluent gas stream; and an infra-red heating device operable to emit infra-red energy to heat the porous element which heats the treatment materials as they pass through the porous element into the treatment chamber. In this way, infra-red energy, rather than combustion, can be used to raise the temperature within the treatment chamber in order to treat the effluent gas stream. This allows the apparatus to be used in environments where no fuel gas exists or where the provision of fuel gas is considered undesirable. Also, heating the treatment materials as they pass through the porous sleeve, rather than simply using radiant heat to heat the treatment chamber enables significantly more energy to be imparted into the treatment materials.
INTEGRATED TREATMENT SYSTEM FOR COMPOSITE WASTE GAS INCLUDING NITROGEN OXIDES, CHLOROFLUOROCARBONS, HYDROCHLOROFLUOROCARBONS, HYDROFLUOROCARBONS, AND PERFLUORINATED COMPOUNDS
Disclosed is a system for integrally treating a composite waste gas including nitrogen oxides (NO.sub.x and N.sub.2O), chlorofluorocarbons (CFCs), hydrochlorofluorocarbons (HCFCs), hydrofluorocarbons (HFCs), and perfluorinated compounds (PFCs). The system includes a first wet processor configured to wash and adsorb dust including gases, SO.sub.x, and ash dissolved in water, a decomposing reactor configured to receive waste gas processed in the first wet processor and process nitrogen oxides (NO.sub.x and N.sub.2O), fluorocarbons (CFCs), hydrochlorofluorocarbons (HCFCs), hydrofluorocarbons (HFCs), and perfluorinated compounds (PFCs) in the waste gas, and a second wet processor configured to receive the waste gas processed in the decomposing reactor and wash and adsorb the received waste gas. The system can efficiently treat a large amount of composite waste gas.
Vacuum pump with abatement function
A vacuum pump with abatement function which can prevent contamination of a process chamber without allowing products generated by exhaust gas treatment to flow back to the process chamber, and can reduce the amount of gas to be treated without allowing a purge gas and a diluent gas to be contained in an exhaust gas, and thus can achieve energy saving by reducing the amount of energy required for the exhaust gas treatment in an abatement part is disclosed. The vacuum pump with abatement function includes a vacuum pump to which at least one abatement part for treating an exhaust gas is attached. The vacuum pump comprises a dry vacuum pump having a pair of multistage pump rotors each of which comprises a plurality of rotors arranged on a rotating shaft, and the at least one abatement part is connected to an interstage of the multistage pump rotors.
Vacuum pump with abatement function
A vacuum pump with abatement function which can prevent contamination of a process chamber without allowing products generated by exhaust gas treatment to flow back to the process chamber, and can reduce the amount of gas to be treated without allowing a purge gas and a diluent gas to be contained in an exhaust gas, and thus can achieve energy saving by reducing the amount of energy required for the exhaust gas treatment in an abatement part is disclosed. The vacuum pump with abatement function includes a vacuum pump to which at least one abatement part for treating an exhaust gas is attached. The vacuum pump comprises a dry vacuum pump having a main pump capable of evacuating gas from an atmospheric pressure and a booster pump for increasing an evacuation speed of the main pump, and the at least one abatement part for treating the exhaust gas is connected between the main pump and the booster pump.
Vacuum pump with abatement function
A vacuum pump with abatement function is used for evacuating a chamber of a manufacturing apparatus. The vacuum pump with abatement function includes a vacuum pump having a discharge port to which one or more abatement parts for treating an exhaust gas discharged from the vacuum pump to make the exhaust gas harmless are attached. The one or more abatement parts are selected, depending on the amount and kind of the exhaust gas discharged from the vacuum pump, from plural kinds of abatement parts which have different treatment types of exhaust gas and/or different treatment amounts of exhaust gas.