A resistivity regulating apparatus includes: a gas dissolving device that causes a regulating gas to dissolve in a liquid targeted for resistivity regulation to generate a treated liquid in which the regulating gas is dissolved in the liquid, the regulating gas being used to regulate a resistivity of the liquid; and a buffer tank to which the treated liquid discharged from the gas dissolving device is fed.

The invention relates to a granular product discharge flap system which is employed in dosing systems, enables discharging very fine doses of the relevant materials without any losses of time and labor, and reduces assembly and disassembly times in cases of repair and maintenance requiring intervention in the system.

An mixing device includes at least one mixing chamber, a memory, a processor coupled to the memory, and a set of instructions stored on the memory and configured to be executed by the processor. The processor is configured to determine a custom mixing recipe comprising a plurality of ingredient types and corresponding amounts for each of the plurality of ingredient types. The processor is further configured to insert the plurality of ingredient types into a first mixing chamber. A first amount of a first ingredient type and a second amount of a second ingredient type are inserted according to the custom mixing recipe. The processor is further configured to mix the plurality of ingredient types in the first mixing chamber. The processor is further configured to dispense a mixture of the plurality of ingredient types as at least one of a vapor, a fine powder, a mist, and a liquid.

An mixing device includes at least one mixing chamber, a memory, a processor coupled to the memory, and a set of instructions stored on the memory and configured to be executed by the processor. The processor is configured to determine a custom mixing recipe comprising a plurality of ingredient types and corresponding amounts for each of the plurality of ingredient types. The processor is further configured to insert the plurality of ingredient types into a first mixing chamber. A first amount of a first ingredient type and a second amount of a second ingredient type are inserted according to the custom mixing recipe. The processor is further configured to mix the plurality of ingredient types in the first mixing chamber. The processor is further configured to dispense a mixture of the plurality of ingredient types as at least one of a vapor, a fine powder, a mist, and a liquid.

A method for inline resin mixing includes establishing a flow of a mixed resin, initially directing the mixed resin to a first intermediate volume and subsequently directing the mixed resin to a second intermediate volume after a predetermined triggering event relating to a continuing flow of the mixed resin. A mixed resin retention assembly for inline resin mixing includes an inlet spout and an intermediate vessel. The inlet spout receives a flow of the mixed resin. The intermediate vessel includes the first and second intermediate volumes. A valve assembly for inline resin mixing includes an exterior body, an interior body and a cover. The exterior body includes three input ports and an output port. The interior body is disposed within an interior cavity of the exterior body and defines five flow paths extending from a periphery and intersecting at a central portion of the interior body.

An mixing device includes at least one mixing chamber, a memory, a processor coupled to the memory, and a set of instructions stored on the memory and configured to be executed by the processor. The processor is configured to determine a custom mixing recipe comprising a plurality of ingredient types and corresponding amounts for each of the plurality of ingredient types. The processor is further configured to insert the plurality of ingredient types into a first mixing chamber. A first amount of a first ingredient type and a second amount of a second ingredient type are inserted according to the custom mixing recipe. The processor is further configured to mix the plurality of ingredient types in the first mixing chamber. The processor is further configured to dispense a mixture of the plurality of ingredient types as at least one of a vapor, a fine powder, a mist, and a liquid.

An mixing device includes at least one mixing chamber, a memory, a processor coupled to the memory, and a set of instructions stored on the memory and configured to be executed by the processor. The processor is configured to determine a custom mixing recipe comprising a plurality of ingredient types and corresponding amounts for each of the plurality of ingredient types. The processor is further configured to insert the plurality of ingredient types into a first mixing chamber. A first amount of a first ingredient type and a second amount of a second ingredient type are inserted according to the custom mixing recipe. The processor is further configured to mix the plurality of ingredient types in the first mixing chamber. The processor is further configured to dispense a mixture of the plurality of ingredient types as at least one of a vapor, a fine powder, a mist, and a liquid.

A method of preparing a liquid mixture for use in a liquid chromatography system is provided. The mixture comprises one or more acids, one or more bases, one or more salts, and one or more solvents, and the method comprises the steps of: i) calculating pH and/or salt concentration at a particular time t from a user-determined gradient function; and ii) based on the values obtained in step (i), calculating percent acid, percent base, percent salt and percent solvent in the liquid mixture at time t. A liquid chromatography system incorporating such method is also provided.

A cement production apparatus having: a duct 21 in which exhaust gas drained from a lower cyclone flows upward, distributes and introduces the exhaust gas to upper cyclones; material-supplying pipes 22 for supplying cement raw material connected to both side parts of one side surface of the duct 21 below a distribution part 23 among the upper cyclones; and a supply-amount controller 26 provided on an upstream position above the material-supplying pipes 22 for controlling supply-amounts of the cement raw material to the material-supplying pipes 22: and when H is a vertical distance between a horizontal surface P1 passing through centers of distribution outlets 21a of the upper cyclones and a horizontal surface P2 passing through centers of connecting ports 22a of the material-supplying pipes 22, and D is a diameter of the duct 21, a ratio H/D is set to 1.4 to 2.5.

Provided herein are systems, apparatuses, and methods for localized, on-demand diesel exhaust fluid (DEF) production. The systems can comprise a loading station for securing a container comprising a pre-measured quantity of urea and releasing the urea from the container. The released urea and water can then be fed into a mixing tank to produce the DEF product. The water can be pre-treated, for example, in a reverse osmosis and/or deionization process before being fed to the mixing tank. The DEF product can be immediately dispensed into a diesel vehicle or stored in a nearby intermediate storage tank. The systems and processes advantageously reduce or eliminate the need for over-the-road shipments and retail packaging of DEF.