The present invention relates to a dry cleaning technology for a cleaning a surface of an object to be cleaned by adiabatically expanding liquid carbon dioxide to generate sublimable dry ice particles and carrying the dry ice particles on high-speed carrier gas to be sprayed onto the surface of the object to be cleaned, wherein an end of a liquid carbon dioxide nozzle further protrudes to the outside relative to an end of a carrier gas nozzle to prevent a growth of dry ice particles in the carrier gas nozzle, a hydrophobic coating is formed on a surface of the liquid carbon dioxide nozzle to prevent a formation of water droplets and to prevent an occurrence of irregular dry ice particles, thereby effectively preventing damage to a surface of an object to be cleaned and being advantageous in an economical aspect by significantly reducing consumption of liquid carbon dioxide.

An apparatus for processing a substrate may include an upper chamber, a lower chamber being combined with the upper chamber and separated from the upper chamber, and at least one driving member for moving the lower chamber in an upward direction and a downward direction. The least one driving member may include a supporting element for supporting the lower chamber, a first driving element for moving the lower chamber and the supporting element, a second driving element for moving the lower chamber, the supporting element and the first driving element, the second driving element being disposed adjacent to the first driving element, and a connecting element for connecting the first driving element to the second driving element. A processing space may be provided between the upper chamber and the lower chamber when the lower chamber is combined with the upper chamber.

Provided is a method for directed fouling of a substance onto a selected surface. Also provided is an apparatus suitable for directed fouling of a substance onto a selected surface.

Disclosed is a supercritical-state cleaning system, comprising a cleaning chamber, a gas booster apparatus, a first heating apparatus, and a carbon dioxide supply apparatus. The cleaning chamber is separately connected to the first heating apparatus and the carbon dioxide supply apparatus. A vacuum pump set is connected to the cleaning chamber. Compared with the prior art, in the Invention, air introduced when a workpiece enters a cleaning chamber is completely removed, so as to prevent mixing of CO.sub.2 and air, thereby improving a cleaning effect.

A method and apparatus for removing microscopic contaminant particulates by high pressure liquid nitrogen jet cleaning from the inner surface of a superconducting radio frequency cavity or a string of multiple cavities and transporting the removed particulates out of the inner space enclosed by the cleaned surfaces. The cleaning method of the invention suppresses field emission, resulting in an increase of the usable accelerating gradient of the cavities and a reduction of the activated radioactivity in accelerator components around cavities.

A system for processing objects to be cleaned that includes a processing vessel, and a storage vessel that includes an upper section for storing clean liquid and a lower section for storing dirty liquid. The upper section and lower section are in flow communication.

The present disclosure relates to a soot blower including: a lance tube which includes one end that reciprocally moves in one direction on a surface of an inlet port of a flow path of the tubular heat exchanger; a drive unit which is connected to the lance tube and reciprocally moves and rotates the lance tube in the one direction; a first nozzle which is connected to the one end of the lance tube and discharges steam to the inlet port; and a second nozzle which is disposed adjacent to the first nozzle and connected to the one end of the lance tube and discharges solid particles to the inlet port, and the present disclosure relates to a method of cleaning a tubular heat exchanger by using the soot blower.

A method and associated apparatus for cleaning a secure instrument including a substrate, visual data and a security feature, including exposing the secure instrument to ozone sufficient to clean the substrate and not compromise the security feature and the visual data, where to clean the substrate includes to remove one or more substances from the substrate into the ozone or to chemically alter the one or more substances in or on the substrate such that exposing the secure instrument to a supercritical fluid removes the one or more substances.

Embodiments of the present disclosure generally relate to a method of cleaning a substrate. More specifically, embodiments of the present disclosure relate to a method of cleaning a substrate in a manner that reduces or eliminates the negative effects of line stiction between semiconductor device features. In an embodiment, a method of cleaning a substrate includes exposing a substrate having high aspect ratio features formed thereon to a first solvent to remove an amount of a residual cleaning solution disposed on a surface of the substrate, exposing the surface of the substrate to a second solvent to remove the first solvent disposed on the surface of the substrate, exposing the surface of the substrate to a supercritical fluid to remove the second solvent disposed on the surface of the substrate, and exposing the surface of the substrate to electromagnetic energy.

A process for cleaning a reactor, the reactor comprising a shell including catalyst for selectively converting hydrocarbons. The process includes removing catalyst from the reactor and deploying a robot into the reactor. A cleaner from the robot is applied onto a surface within the shell of the reactor that includes a foulant. The cleaner is adapted to remove the foulant from the surface within the shell of the reactor. The cleaner may be one of light radiation, heat radiation, ultra-high pressure fluid, and liquid nitrogen.