The present invention provides an apparatus of charged-particle beam e.g. an electron microscope comprising a plasma generator for selectively cleaning BSE detector. In various embodiments, the plasma generator is located between a sample stage and a sample table having one or more openings or holes. The plasma generator generates plasma and distributes or dissipates the plasma through the openings of the sample table toward and onto surface of the BSE detector. Cleaning contaminants on the surface of the BSE detector frequently and selectively with in-situ generated plasma can prevent the detectors from performance deterioration such as losing resolution and contrast in imaging at high levels of magnification.

A substrate cleaning system includes a cleaner module to clean a substrate after polishing of the substrate, a drier module to dry the substrate after cleaning by the cleaner module, a substrate support movable along a first axis from a first position in the drier module to a second position outside the drier module, and an in-line metrology station including a line-scan camera positioned to scan the substrate as the substrate is held by the substrate support and the substrate support is between the first position to the second position. The first axis is substantially parallel to a face of the substrate as held in by the substrate support.

A semiconductor manufacturing apparatus includes a transfer device that includes a transfer blade whose mounting area on which a wafer is mounted is defined on a front surface and a transfer arm adjusting a position of the transfer blade, and a processing chamber that accommodates the transfer blade and is for removing foreign matter adhering to the mounting area.

Described herein are architectures, platforms and methods for acquiring optical emission spectra from an optical emission spectroscopy system by flowing a dry cleaning gas into a plasma processing chamber of the plasma processing system and igniting a plasma in the plasma processing chamber to initiate the waferless dry cleaning process.

The present utility model discloses an automatic disinfection device for a VR self-service machine, which is composed of two parts, a head display disinfection device and a joy stick disinfection device. The head display disinfection device comprises a light tube fixing base, a disinfecting light tube, a fixing bolt and a power line. The disinfection light tube installed on two sides of an inner wall of a VR self-service head display storage device. The joy stick disinfection device comprises a disinfecting light bulb installed under the back plate of a VR self-service machine through a back plate attachment, the and a protective cover is installed in front of the disinfecting light bulb.

The present utility model discloses an automatic disinfection device for a VR self-service machine, which is composed of two parts, a head display disinfection device and a joy stick disinfection device. The head display disinfection device comprises a light tube fixing base, a disinfecting light tube, a fixing bolt and a power line. The disinfection light tube installed on two sides of an inner wall of a VR self-service head display storage device. The joy stick disinfection device comprises a disinfecting light bulb installed under the back plate of a VR self-service machine through a back plate attachment, the and a protective cover is installed in front of the disinfecting light bulb.

A method for controlling an electrostatic attractor, which attracts an electrode to a gas plate provided in an upper portion of a plasma processing apparatus, includes, among a plasma generation period in which plasma is generated by the plasma processing apparatus and an idle period in which no plasma is generated by the plasma processing apparatus, applying voltages having polarities different from each other to first and second electrodes of the electrostatic attractor in at least the idle period.

A changing table includes a wall assembly and a tray assembly. The wall assembly includes a transparent panel, a reflector, and a UV light source disposed in between. The tray assembly is pivotally attached to the wall assembly, forming a changeable angle α in between. The tray assembly includes a front panel and a cushion layer. The cushion layer forms a concaved surface that receives an infant. The concaved surface receives UV light generated by the UV light source.

A method for cleaning a substrate processing apparatus includes mounting a substrate on a mounting portion of an electrostatic chuck of the substrate processing apparatus to process the substrate; mounting a protector including a small diameter portion that covers the mounting portion and a large diameter portion that is disposed apart from an edge ring disposed on an outer periphery of the mounting portion and has a diameter larger than that of the small diameter portion, on the mounting portion; and supplying a cleaning gas, thereby removing by-products deposited between the mounting portion and the edge ring.

The present invention provides an apparatus of charged-particle beam e.g. an electron microscope comprising an in-column plasma generator for selectively cleaning BSE detector and BF/DF detector. In various embodiments, the plasma generator is located between a lower pole piece of objective lens and the BF/DF detectors, but outside trajectory area of the charged-particles from the sample stage to the BF/DF detector. Cleaning decomposed biological samples or contaminants on the surface of the detectors frequently and selectively with in-situ generated plasma can prevent the detectors from performance deterioration such as losing resolution and contrast in imaging at high levels of magnification.