Patent classifications
B08B2220/01
Compositions for Engine Carbon Removal and Methods and Apparatus for Removing Carbon
This invention relates to cleaning the induction systems, the combustion chambers and exhaust systems of internal combustion engines. And, more particularly, to chemicals and mixtures of chemicals for removing the different types of carbon deposits encountered in internal combustion engines used in road vehicles. Carbon deposits were taken from the induction systems of these road vehicles for the purpose of bench testing such carbon and product development. More specifically, chemicals (i.e., solvents) and chemical mixes (i.e., solutions) have been accurately tested on such harvested carbon deposits for their ability to remove the various types of carbon deposits that accumulate within road vehicle internal combustion engines. Additionally this invention also relates to apparatus for delivering chemicals and chemical mixes. Which includes those developed by applicant, as well as those prior art products marketed for carbon removal, to the induction system of vehicles to maximize the effectiveness of the chemical delivery.
ABRASIVE PAINT REMOVER COMPOSITIONS AND METHODS FOR MAKING AND USING SAME
Abrasive paint remover compositions including a solvent system or composition and an abrasive system or composition and methods for making and using same, where the compositions may be formulated with no methylene chloride (MC).
FLUID CLEAN APPARATUS
A fluid clean apparatus includes a container that has an opening for loading metal parts therein, and an internal loading platform system that includes a platform that is positioned inside the container, and a lift cylinder that is coupled to the platform and raises up and down the platform.
Dispelling pen
A dispelling pen including a pen case and a pen head connected with the pen case, wherein at least one accommodation cavity for storing a dispelling solution is disposed in the pen case. The accommodation cavity is connected with the pen head via a pipeline. A switch control valve is disposed on the pipeline. The dispelling pen need not frequently dip in the dispelling solution, thereby avoiding fragmentation and circuit scratch due to the dispelling pen's repeated contact with the substrate while increasing convenience significantly, and increasing the security of the substrate at the time of dispelling.
APPARATUS AND METHOD FOR DISPENSING ADHESIVE LIQUID FOR DUST TRAP
Provided are apparatus and method of dispensing an adhesive liquid for a dust trap, in which the adhesive liquid is dispensed to a camera module while effectively cleaning the adhesive liquid that may be smeared on a nozzle, thereby enhancing productivity and quality of a process of forming a dust trap.
Cleaning solution for temporary adhesive for substrates, substrate cleaning method, and cleaning method for support or substrate
A cleaning solution for temporary adhesive for substrates contains: tetrabutylammonium fluoride; dimethyl sulfoxide; and a liquid compound having a solubility parameter of 8.0 or more and 10.0 or less and having a heteroatom. The tetrabutylammonium fluoride is preferably contained at a content of 1 mass % or more and 15 mass % or less in 100 mass % of a total of the tetrabutylammonium fluoride, the dimethyl sulfoxide, and the liquid compound. The dimethyl sulfoxide is preferably contained at a content of 5 mass % or more and 30 mass % or less in 100 mass % of a total of the tetrabutylammonium fluoride, the dimethyl sulfoxide, and the liquid compound.
Label peeling device and label peeling method
According to an embodiment, a label peeling device includes a container holding portion configured to hold a specimen container, and a cutter holder configured to detachably hold a cutter, to apply a blade of the cutter to a side surface of the specimen container held by the container holding portion with a label being attached to the side surface, and to move along an axial direction of the specimen container, thereby peeling the label attached to the side surface of the specimen container.
Decomposing/cleaning composition, method for cleaning adhesive polymer, and method for producing device wafer
Provided is a decomposing/cleaning composition for an adhesive polymer having a high etching rate and suppressed infiltration into a contact interface between a substrate such as a device wafer and an adhesive layer such as a fixing tape. The decomposing/cleaning composition of one embodiment is a decomposing/cleaning composition for an adhesive polymer containing a quaternary alkylammonium fluoride or a quaternary alkylammonium fluoride hydrate and an aprotic solvent, wherein the aprotic solvent contains (A) an N-substituted amide compound having no active hydrogens on the nitrogen atoms and (B) at least one organic sulfur oxide selected from the group consisting of sulfoxide compounds and sulfone compounds.
ADHESIVE ACRYLATE-OLEFIN COPOLYMERS, METHODS FOR PRODUCING SAME AND COMPOSITIONS UTILIZING SAME
The present invention relates to an adhesive compositions, facestocks and/or packaging labels containing same, where such compositions, facestocks and/or labels are designed to facilitate the recyclability of a plastic article formed from any suitable polymer or mixture of polymers (e.g., a polyethylene terephthalate (PET), high density polyethylene (HDPE), polyvinyl chloride (PVC), low density polyethylene (LDPE), polypropylene (PP), polystyrene (PS), or others of all plastic types), or even glass bottles. In another embodiment, the present invention relates to a method for removing an adhesive composition, facestock and/or packaging label containing same, from a plastic article that is to be recycled.
PHOTOMASK CLEANING APPARATUS, METHOD OF CLEANING A PHOTOMASK, AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
Disclosed is a method. The method includes placing a photomask on a receiver of a cleaning apparatus, removing adhesive residue from the photomask by irradiating laser on the adhesive residue, attaching a pellicle to the photomask, and exposing a semiconductor substrate to a light using the photomask, wherein the irradiating laser repeatedly pauses and restarts during the removing of the adhesive residue.