An abrading apparatus (1) including a drum (2), a movable abrasive surface (4) about at least part of the circumferential surface of the drum (2) and a plurality of treatment chambers (5) mounted about the drum (2). Each treatment chamber (5) has upstream and downstream faces (53, 54), which describe an open side facing the drum (2), such that the abrasive surface (4) forms a wall of the chamber (5). The downstream face (53) of each chamber (5) is substantially aligned with a radial plane (R) of the drum (2).

Wheel back cavity groove processing equipment is disclosed in the present application, which includes a lower lifting system, a central brush system, groove brush systems, a synchronous clamping and rotating system, a left brush system, a right brush system, an upper lifting system and the like. The wheel back cavity groove processing equipment not only may be used for removing burrs from wheel back cavity grooves, but also may be used for removing burrs from bolt holes, a center hole, spoke edges and transverse corners, and simultaneously has the characteristics of high automation degree, high removal efficiency, advanced process, strong generality, and high safety and stability.

A wheel grinding device consists of a lower lifting rotary system, spoke grinding units, a center hole grinding system and an upper lifting and clamping rotary system. The wheel grinding device not only can be used for grinding the center hole of a wheel of any size via brush units of the center hole grinding system, but also can be used for grinding the back of wheel spokes of different sizes and shapes via the actions of brush belts of the spoke grinding units.

Examples are disclosed that relate to planarizing substrates without use of an abrasive. One example provides a method of chemically planarizing a substrate, the method comprising introducing an abrasive-free planarization solution onto a porous pad, contacting the substrate with the porous pad while moving the porous pad and substrate relative to one another such that higher portions of the substrate contact the porous pad and lower portions of the substrate do not contact the porous pad, and removing material from the higher portions of the substrate via contact with the porous pad to reduce a height of the higher portions of the substrate relative to the lower portions of the substrate.

A polishing apparatus which can efficiently polish an entirety of a back surface of a substrate, with the back surface facing downward, is disclosed. The polishing apparatus includes: a substrate holder configured to rotate the substrate; a polishing head configured to polish the back surface of the substrate; a tape advancing device; and a translational rotating mechanism configured to cause the polishing head to make a translational rotating motion. The substrate holder includes a plurality of rollers which are rotatable about their own axes. The plurality of rollers have substrate-holding surfaces capable of contacting a periphery of the substrate. The polishing head is disposed below the substrate-holding surfaces. The polishing head includes a polishing blade configured to press the polishing tape against the back surface of the substrate, and a pressing mechanism configured to push the polishing blade upward.

A substrate processing method which can clean a peripheral portion of a substrate after polishing and can check the cleaning effect of the peripheral portion of the substrate is disclosed. The substrate processing method includes polishing a peripheral portion of the substrate by pressing a polishing tape having abrasive grains against the peripheral portion of the substrate with a first head, cleaning the peripheral portion of the substrate by supplying a cleaning liquid to the peripheral portion of the substrate after polishing, bringing a tape having no abrasive grains into contact with the peripheral portion of the substrate after cleaning by a second head, applying light to the tape and receiving reflected light from the tape by a sensor, and judging that the peripheral portion of the substrate is contaminated when an intensity of the received reflected light is lower than a predetermined value.

Disclosed herein are a metal plate including a plurality of pattern portions, a patterning apparatus configured to form a plurality of patterns on the metal plate, and a patterning method using the same. The metal plate to be used in a household appliance includes a plurality of pattern portions in which a hairline pattern is formed on a surface of the metal plate, wherein the plurality of pattern portions includes a first pattern portion having a first hairline pattern and a second pattern portion having a second hairline pattern different from the first hairline pattern.

The present invention relates to a grinding device for machining an, in particular plate-shaped workpiece (W). The grinding device comprises an emitter (31) for emitting electromagnetic waves in the direction of the abrasive belt (10) and a detector (32) for detecting electromagnetic waves which are reflected by the abrasive belt (10).

This disclosure relates to a belt grinder includes frame and first grinding assembly. The first grinding assembly includes transmission roller set, grinding belt and adjusting assembly. The transmission roller set includes driving roller and driven roller. Both the driving roller and the driven roller are rotatably disposed on the frame. The grinding belt is installed over the driving roller and the driven roller. The adjusting assembly includes rotatable component and contact rollers. The rotatable component is rotatably disposed on the frame. Rotation axis of the rotatable component is parallel to rotation axis of the driving roller. The contact rollers are rotatably disposed on the rotatable component. Contact rollers are different in shape. The rotatable component is rotatable with respect to the frame so as to force one of the contact rollers to contact or to be separated from the grinding belt.

A polishing apparatus which can efficiently polish an entirety of a back surface of a substrate, with the back surface facing downward, is disclosed. The polishing apparatus includes: a substrate holder configured to rotate the substrate; a polishing head configured to polish the back surface of the substrate; a tape advancing device; and a translational rotating mechanism configured to cause the polishing head to make a translational rotating motion. The substrate holder includes a plurality of rollers which are rotatable about their own axes. The plurality of rollers have substrate-holding surfaces capable of contacting a periphery of the substrate. The polishing head is disposed below the substrate-holding surfaces. The polishing head includes a polishing blade configured to press the polishing tape against the back surface of the substrate, and a pressing mechanism configured to push the polishing blade upward.