Patent classifications
B29L2031/736
Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles
A polishing article manufacturing system includes a feed section and a take-up section, the take-up section comprising a supply roll having a polishing article disposed thereon for a chemical mechanical polishing process, a print section comprising a plurality of printheads disposed between the feed section and the take-up section, and a curing section disposed between the feed section and the take-up section, the curing section comprising one or both of a thermal curing device and an electromagnetic curing device.
Process for spraying back-adhesive on CMP pad
A process for spraying back-adhesive of a CMP pad, includes steps of: horizontally placing an underlayment on middle portions of an upper conveying roller and a lower conveying roller of a hot melt machine for feeding; providing an upper layer glue-coated paper closely attached with an upper surface of the underlayment on the upper conveying roller, providing a lower layer glue-coated paper closely attached with a lower surface of the underlayment on the lower conveying roller; spraying hot melt adhesive on an upper surface of the lower layer glue-coated paper via an ejector nozzle of the hot melt machine; wherein the upper layer glue-coated paper, the underlayment and the lower layer glue-coated paper are transmitted and adhered with each other on the upper conveying roller and the lower conveying roller.
POLISHING PAD MATERIAL MELTING DEVICE
Provided is a polishing pad material melting device including: a melting unit configured to melt a solid material; a flow path through which the material melted in the melting unit is circulated; and a filter unit fluidically connected to the flow path and including a filter unit body configured to filter the material melted in the melting unit, wherein the flow path includes a circulation path through which the material melted by the melting unit is circulated, and the filter unit is fluidically connected to the circulation path.
COMPOSITE POLISHING PAD INCLUDING CARBON NANOTUBES, AND METHOD FOR PRODUCING SAME
A composite polishing pad for chemical mechanical polishing (CMP) and a method for producing the composite CMP. The composite polishing pad for CMP contains a polymer substrate layer including a plurality of protrusions formed on the upper surface thereof; and a carbon nanotube layer including carbon nanotubes embedded in and fixed to the upper portion of the substrate layer.
CORRECTION OF FABRICATED SHAPES IN ADDITIVE MANUFACTURING USING INITIAL LAYER
Data indicative of a desired shape of the polishing pad to be fabricated by droplet ejection by the additive manufacturing system is received. The data includes a desired shape defining a desired profile including a polishing surface having one or more partitions separated by one or more grooves on the polishing pad. Data indicative of distortions from the desired profile caused by dispensing of layers by droplet ejection by the additive manufacturing system is generated. Data indicative of an initial layer to dispense by droplet ejection is generated to at least partially compensate for the distortions from the desired profile. The initial layer is dispensed on a support by droplet ejection. Overlying layers are dispensed on the initial layer by droplet ejection by the additive manufacturing system to form the polishing pad.
CORRECTION OF FABRICATED SHAPES IN ADDITIVE MANUFACTURING USING SACRIFICIAL MATERIAL
A method of fabricating a polishing pad using an additive manufacturing system includes depositing a first set of successive layers onto a support by droplet ejection. Depositing the first set of successive layers includes dispensing a polishing pad precursor to first regions corresponding to partitions of the polishing pad and dispensing a sacrificial material to second regions corresponding to grooves of the polishing pad. A second set of successive layers is deposited by droplet ejection over the first set of successive layers. The second set of successive layers corresponds to a lower portion of the polishing pad. The first set of successive layer and the second set of successive layers provide a body. The body is removed from the support. Removing the sacrificial material from the body provides the polishing pad with a polishing surface that has the partitions separated by the grooves.
CORRECTION OF FABRICATED SHAPES IN ADDITIVE MANUFACTURING USING MODIFIED EDGE
A method of fabricating a polishing pad using an additive manufacturing system includes depositing successive layers by droplet ejection to form the polishing pad. The polishing pad includes a polishing surface having one or more partitions separated by one or more grooves. Depositing a layer of the successive layers includes dispensing first regions corresponding to edges of the one or more partitions by a first droplet ejection process. After curing the first regions, a second region corresponding to interior of the one or more partitions is dispensed between the edges by a different second droplet ejection process.
Printing a Chemical Mechanical Polishing Pad
A method of fabricating a polishing layer of a polishing pad includes successively depositing a plurality of layers with a 3D printer, each layer of the plurality of polishing layers deposited by ejecting a pad material precursor from a nozzle and solidifying the pad material precursor to form a solidified pad material.
PRINTED CHEMICAL MECHANICAL POLISHING PAD HAVING PARTICLES THEREIN
A method of fabricating a polishing layer of a polishing pad includes determining a desired distribution of particles to be embedded within a polymer matrix of the polishing layer. A plurality of layers of the polymer matrix is successively deposited with a 3D printer, each layer of the plurality of layers of polymer matrix being deposited by ejecting a polymer matrix precursor from a nozzle. A plurality of layers of the particles is successively deposited according to the desired distribution with the 3D printer. The polymer matrix precursor is solidified into a polymer matrix having the particles embedded in the desired distribution.
Auto catch apparatus and method of use in making chemical mechanical polishing pads
The present invention provides an apparatus for use in mixing and dispensing a curable fluid stream (stream) into an open mold to fill the mold to make polishing pads for chemical mechanical planarization of substrates. The apparatus comprises an actuator frame on which is mounted (i) a set of two plates releasably attached to the actuator frame and adapted to cut the stream when the mold is full and to release from the actuator frame after cutting the stream, and (ii) a dispenser unit for continuous pouring of the stream into an open mold, the apparatus adapted to enable removal of the released plates from the actuator during the continuous pouring after the mold is full, e.g. by raising the actuator frame and the (ii) dispenser unit, whereby one can place a container above the mold to catch the plates.