An apparatus for treating gaseous pollutants includes a gas inlet part, a first treatment unit, a second treatment unit and a non-mechanical flow-guiding device. The gas inlet part includes a gas inlet chamber and at least one guide pipe. The guide pipe communicates with the gas inlet chamber and guides an effluent stream from a semiconductor process to the gas inlet chamber. The first treatment unit is coupled to a bottom end of the gas inlet part and is configured to abate the effluent stream. The non-mechanical flow-guiding device is coupled to the first treatment unit. The flow-guiding device is configured to guide the effluent stream to move toward an opening. The second treatment unit is coupled to the flow-guiding device via the opening, receives the effluent stream from the first treatment unit and further abates the effluent stream.

An apparatus for treating gaseous pollutants includes a gas inlet part, a first treatment unit, a second treatment unit and a non-mechanical flow-guiding device. The gas inlet part includes a gas inlet chamber and at least one guide pipe. The guide pipe communicates with the gas inlet chamber and guides an effluent stream from a semiconductor process to the gas inlet chamber. The first treatment unit is coupled to a bottom end of the gas inlet part and is configured to abate the effluent stream. The non-mechanical flow-guiding device is coupled to the first treatment unit. The flow-guiding device is configured to guide the effluent stream to move toward an opening. The second treatment unit is coupled to the flow-guiding device via the opening, receives the effluent stream from the first treatment unit and further abates the effluent stream.

The invention provides a device and system for decomposing and oxidizing of gaseous pollutants. A novel reaction portion reduces particle formation in fluids during treatment, thereby improving the defect of particle accumulation in a reaction portion. Also, the system includes the device, wherein a modular design enables the system to have the advantage of easy repair and maintenance.

The invention provides a device and system for decomposing and oxidizing of gaseous pollutants. A novel reaction portion reduces particle formation in fluids during treatment, thereby improving the defect of particle accumulation in a reaction portion. Also, the system includes the device, wherein a modular design enables the system to have the advantage of easy repair and maintenance.

An article for use in a plasma processing apparatus includes a gas supply pipe, and a component disposed in the gas supply pipe. The component is configured to cause radicals of gas passing through the gas supply pipe to be deactivated in the component.

An article for use in a plasma processing apparatus includes a gas supply pipe, and a component disposed in the gas supply pipe. The component is configured to cause radicals of gas passing through the gas supply pipe to be deactivated in the component.

A recovery device for a volatile organic compound is a device for recovering the volatile organic compound in a coating drying oven which dries a coating film of a workpiece coated with a water-soluble coating. The coating drying oven includes: an evaporation zone in which moisture of the workpiece is evaporated; and a curing zone to cure the coating film. The recovery device includes: a first take-out passage for taking out first furnace air in the evaporation zone; a second take-out passage for taking out second furnace air in the curing zone; a mixing chamber configured to mix the first furnace air and the second furnace air to obtain mixed air; and a cooling recovery unit configured to cool the mixed air and recover, as a condensate, the volatile organic compound contained in the mixed air, together with the moisture.

A corona plasma cell includes a polarized electrode and a ground electrode, including a cylinder and a porous film, with the cylinder having a low profile and the polarized electrode not entering the cylinder; a corona plasma dual element including a first cell, a second cell having such a structure, which first and second cell are symmetrically arranged; and finally a plasma reactor including a plurality of cells or dual elements.

A corona plasma cell includes a polarized electrode and a ground electrode, including a cylinder and a porous film, with the cylinder having a low profile and the polarized electrode not entering the cylinder; a corona plasma dual element including a first cell, a second cell having such a structure, which first and second cell are symmetrically arranged; and finally a plasma reactor including a plurality of cells or dual elements.

The present disclosure is directed to a trap filter system having a plurality of filters, the plurality of filters having filtering materials to remove contaminants from a flow of gas effluents generated by a semiconductor processing tool and a bypass mechanism configured to selectively direct or shut off the flow of gas effluents to one or more of the plurality of filters while the semiconductor processing tool remains in operation. Each of the plurality of filters is removable and replaceable when the filtering material is unable to effectuate the removal of contaminants.