The present invention relates generally to the field of emission control equipment for boilers, heaters, kilns, or other flue gas-, or combustion gas-, generating devices (e.g., those located at power plants, processing plants, etc.) and, in particular to a new and useful method and apparatus for: (i) reducing halogen levels necessary to affect gas-phase mercury control; (ii) reducing or preventing the poisoning and/or contamination of an SCR catalyst; and/or (iii) controlling various emissions. In still another embodiment, the present invention relates to a method and apparatus for: (A) simultaneously reducing halogen levels necessary to affect gas-phase mercury control while achieving a reduction in the emission of mercury; and/or (B) reducing the amount of selenium contained in and/or emitted by one or more pieces of emission control equipment for boilers, heaters, kilns, or other flue gas-, or combustion gas-, generating devices (e.g., those located at power plants, processing plants, etc.).

The present invention relates generally to the field of emission control equipment for boilers, heaters, kilns, or other flue gas-, or combustion gas-, generating devices (e.g., those located at power plants, processing plants, etc.) and, in particular to a new and useful method and apparatus for: (i) reducing halogen levels necessary to affect gas-phase mercury control; (ii) reducing or preventing the poisoning and/or contamination of an SCR catalyst; and/or (iii) controlling various emissions. In still another embodiment, the present invention relates to a method and apparatus for: (A) simultaneously reducing halogen levels necessary to affect gas-phase mercury control while achieving a reduction in the emission of mercury; and/or (B) reducing the amount of selenium contained in and/or emitted by one or more pieces of emission control equipment for boilers, heaters, kilns, or other flue gas-, or combustion gas-, generating devices (e.g., those located at power plants, processing plants, etc.).

An object of the present invention is to provide a chemical liquid purification method which makes it possible to obtain a chemical liquid having excellent defect inhibition performance. Another object of the present invention is to provide a chemical liquid. The chemical liquid purification method according to an embodiment of the present invention is a chemical liquid purification method including obtaining a chemical liquid by purifying a substance to be purified containing an organic solvent, in which a content of the stabilizer in the substance to be purified with respect to the total mass of the substance to be purified is equal to or greater than 0.1 mass ppm and less than 100 mass ppm.

An object of the present invention is to provide a chemical liquid purification method which makes it possible to obtain a chemical liquid having excellent defect inhibition performance. Another object of the present invention is to provide a chemical liquid. The chemical liquid purification method according to an embodiment of the present invention is a chemical liquid purification method including obtaining a chemical liquid by purifying a substance to be purified containing an organic solvent, in which a content of the stabilizer in the substance to be purified with respect to the total mass of the substance to be purified is equal to or greater than 0.1 mass ppm and less than 100 mass ppm.

A biowall has a support structure, an irrigation system, and a dissolution system. The support structure holds a plurality of plants thereon. The dissolution system dissolves pollutants from air into solution. Using the irrigation system, the solution with dissolved pollutants therein can then be supplied to roots of one or more plants supported by the biowall support structure. At least a portion of the dissolved pollutants supplied to the roots can be metabolized, for example, by bacteria at the roots of the plants. For example, the pollutants can include volatile organic compounds (VOCs). In some embodiments, the biowall can be constructed as a self-supporting, stand-alone unit.

A biowall has a support structure, an irrigation system, and a dissolution system. The support structure holds a plurality of plants thereon. The dissolution system dissolves pollutants from air into solution. Using the irrigation system, the solution with dissolved pollutants therein can then be supplied to roots of one or more plants supported by the biowall support structure. At least a portion of the dissolved pollutants supplied to the roots can be metabolized, for example, by bacteria at the roots of the plants. For example, the pollutants can include volatile organic compounds (VOCs). In some embodiments, the biowall can be constructed as a self-supporting, stand-alone unit.

The present subject matter relates generally to a method for the removal of oxygen from hydrogen using a manganese, iron, nickel or cobalt based adsorbent. More specifically, the present subject matter relates to the methods for the removal of oxygen from hydrogen using a manganese based adsorbent without the generation of water or other oxides.

The present subject matter relates generally to a method for the removal of oxygen from hydrogen using a manganese, iron, nickel or cobalt based adsorbent. More specifically, the present subject matter relates to the methods for the removal of oxygen from hydrogen using a manganese based adsorbent without the generation of water or other oxides.

A hydrogen fluoride gas removal device includes: a hydrogen fluoride gas removal treatment machine that is configured to perform a treatment of removing the hydrogen fluoride gas from the mixed gas by bringing the mixed gas into contact with a removal agent for removing the hydrogen fluoride gas from the mixed gas; a removal agent supply machine that is configured to supply the removal agent to the hydrogen fluoride gas removal treatment machine; a removal agent moving machine that is configured to move the removal agent, which is accommodated in the hydrogen fluoride gas removal treatment machine, within the hydrogen fluoride gas removal treatment machine; and a removal agent discharge machine that is configured to discharge the used removal agent from the hydrogen fluoride gas removal treatment machine.

A hydrogen fluoride gas removal device includes: a hydrogen fluoride gas removal treatment machine that is configured to perform a treatment of removing the hydrogen fluoride gas from the mixed gas by bringing the mixed gas into contact with a removal agent for removing the hydrogen fluoride gas from the mixed gas; a removal agent supply machine that is configured to supply the removal agent to the hydrogen fluoride gas removal treatment machine; a removal agent moving machine that is configured to move the removal agent, which is accommodated in the hydrogen fluoride gas removal treatment machine, within the hydrogen fluoride gas removal treatment machine; and a removal agent discharge machine that is configured to discharge the used removal agent from the hydrogen fluoride gas removal treatment machine.