The plasma air purifier is an apparatus that simultaneously produces positive ions and negative ions in order to eliminate bacteria, viruses and odors in the air of the surrounding environment. The apparatus includes a housing, a discharge plate, a discharge needle array, a microcontroller, and a power supply. The housing encloses the discharge needle array, the microcontroller, and the power supply, allowing the apparatus to be easily incorporated into a variety of environments and easily transported. The discharge plate is mounted onto the housing via at least one first pillar and at least one second pillar. The discharge plate produces negative ions, and the discharge needle array produces positive ions. The discharge needle array is electronically connected to the microcontroller. The power supply is electrically connected to the microcontroller and the discharge plate. The discharge needle array is electrically connected to the power supply through the microcontroller.

An ostomy pouching device is configured to allow two-way flow of gas between the device and a stoma bag (100). A check valve (104) is configured to allow ambient air into a channel of the device, and thereby into the stoma bag, when a pressure of the gas in the channel is less than a pressure of the ambient air; another check valve (105) is configured to allow gas to flow into a deodorizing reactor (110) when a pressure of the gas in the channel is greater than a pressure of the ambient air. The deodorizing reactor includes a plasma reactor configured to generate plasma in the channel for deodorizing the gas in the channel before being expelled from the device into the ambient air. The plasma reactor is preferably a dielectric barrier discharge (DBD) reactor. It may also include a secondary active carbon filter.

A self-cleaning ion generator device includes a housing having a bottom portion and a top portion selectively secured to each other, the top portion contains a base portion extending to an outer edge and having an internal side and an external side, a first pair of opposed sidewalls and a second pair of opposed sidewalls extend from the outer edge of the base portion forming a cavity therein. Ion terminals extend from the housing, and a cleaning apparatus for cleaning the two ion terminals.

Embodiments disclosed herein include an abatement system for abating compounds produced in semiconductor processes. The abatement system includes an exhaust cooling apparatus located downstream of a plasma source. The exhaust cooling apparatus includes a plate and a cooling plate disposed downstream of the plate. During operation, materials collected on the plate react with cleaning radicals to form a gas. The temperature of the plate is higher than the temperature of the cooling plate in order to improve the reaction rate of the reaction of the cleaning radicals and the materials on the plate.

Implementations of the present disclosure relate to methods and systems for abating F-gases present in the effluent of semiconductor manufacturing processes. In one implementation, a method for abating effluent exiting a processing chamber is provided. The method begins by flowing an effluent from a processing chamber into a plasma source, wherein the effluent comprises one or more F-gases. The method further includes delivering at least one abating reagent to the plasma source, the abating reagent comprising at least one of water vapor and oxygen-containing gas, at operation. The method further includes activating the effluent and the abating reagent in the presence of a plasma to convert the one or more F-gases in the effluent and the abating reagent to an abated material.

A scrubber, an exhaust gas purification system comprising the scrubber, and an air purification method. The treatment water of the scrubber is plasma electrolytic water. The plasma electrolytic water is obtained after water is electrolyzed. The process of electrolysis is carried out in an electromagnetic water treatment device. The electromagnetic water treatment device comprises a cation exchange film, a water flow passage, at least one positive pole panel, at least one negative pole panel, and a magnetic device.

An exhaust gas treatment system for an internal combustion engine includes an exhaust gas pathway configured to receive exhaust gas from the internal combustion engine and a non-thermal plasma generator positioned in the exhaust gas pathway. The non-thermal plasma generator is configured to increase a proportion of nitrogen dioxide in the exhaust gas. The system also includes a first treatment element positioned in the exhaust gas pathway downstream of the non-thermal plasma generator and a second treatment element positioned in the exhaust gas pathway downstream of the first treatment element. At least one of the first treatment element or the second treatment element includes a combined selective catalytic reduction and diesel particulate filter (SCR+F) element.

Apparatus comprising: a fumehood; and an air treatment device for purging unwanted substances from the exhaust air of the fumehood, the air treatment device comprising: a non-thermal plasma reactor stage for producing air byproducts comprising O., N., OH. and O.sub.3 and introducing those air byproducts into the exhaust air of the fumehood so as to treat the exhaust air of the fumehood; and a catalyst stage downstream of the non-thermal plasma reactor stage for further treating the air downstream of the non-thermal plasma reactor stage.

This disclosure relates generally to an emitter for dissociating exhaust gases on a molecular level into their respective elemental constituents. The emitter includes a palladium plated anode and a cathode, at least a portion of which is palladium plated. When properly powered, the emitters create a non-linear quantum dissonance field to dissociate molecules in exhaust.

Provided are a gas phase oxidation/decomposition and absorption integrated device and application thereof in a gas-liquid system. The device comprises a housing (100), a motor (102), and a boost regulator (103); the housing (100) is internally provided with a rotating chamber (120) and a discharge chamber (122); the rotating chamber (120) comprises a rotating shaft (119), a turntable (124), a liquid distributor (123), packing layers (110), a guiding round table (111), a liquid inlet (108), a liquid outlet (112), and a first gas outlet (109); the discharge chamber (122) is located under the rotating chamber (120) and comprises a discharge chamber housing (121) and a plasma generator.