Patent classifications
B08B1/52
CLEANING METHOD AND APPARATUS FOR WASHING TOOL, SUBSTRATE WASHING APPARATUS AND MANUFACTURING METHOD FOR WASHING TOOL
A cleaning apparatus for performs a cleaning process on a washing tool for substrate washing by supplying a washing liquid to the washing tool and bringing the washing tool into contact with a cleaning member. The cleaning apparatus includes: a liquid extraction part that extracts a washing liquid remaining inside the washing tool or a washing liquid flowing out from the washing tool during the cleaning process; a fluorescence analysis part that performs fluorescence analysis on the washing liquid extracted by the liquid extraction part and measures a fluorescence intensity of the washing liquid for an excitation light of a predetermined wavelength; and a judgement part that judges, based on the measured fluorescence intensity, whether or not the cleaning of the washing tool has been completed.
CLEANING METHOD AND APPARATUS FOR WASHING TOOL, SUBSTRATE WASHING APPARATUS AND MANUFACTURING METHOD FOR WASHING TOOL
A cleaning apparatus for performs a cleaning process on a washing tool for substrate washing by supplying a washing liquid to the washing tool and bringing the washing tool into contact with a cleaning member. The cleaning apparatus includes: a liquid extraction part that extracts a washing liquid remaining inside the washing tool or a washing liquid flowing out from the washing tool during the cleaning process; a fluorescence analysis part that performs fluorescence analysis on the washing liquid extracted by the liquid extraction part and measures a fluorescence intensity of the washing liquid for an excitation light of a predetermined wavelength; and a judgement part that judges, based on the measured fluorescence intensity, whether or not the cleaning of the washing tool has been completed.
CLEANING APPARATUS AND CLEANING METHOD
According to one embodiment, there is provided a cleaning apparatus including a substrate cleaner and a member cleaner. The substrate cleaner has a substrate cleaning member placed over a first region to be opposite a substrate and a second region different from the first region. The member cleaner is placed adjacent to the second region.
AUTONOMOUS ROBOTIC BONE DUST SCRAPER
Scraping bone dust off of pieces of meat may be performed using a sensor camera, a computing system, and a robotic arm equipped with a scraper. The camera may provide images of a piece of meat that may be processed in the computing system, either alone or in combination with the sensor camera, to determine how to control the robotic arm. A pair of bone scraping systems may be used in combination with a flipping device disposed between them to enable bone dust scraping from both sides of the piece of meat.
AUTONOMOUS ROBOTIC BONE DUST SCRAPER
Scraping bone dust off of pieces of meat may be performed using a sensor camera, a computing system, and a robotic arm equipped with a scraper. The camera may provide images of a piece of meat that may be processed in the computing system, either alone or in combination with the sensor camera, to determine how to control the robotic arm. A pair of bone scraping systems may be used in combination with a flipping device disposed between them to enable bone dust scraping from both sides of the piece of meat.
Skive System with Skive Assembly and Cleaner
A robot arm including a skive assembly coupled thereto. The skive assembly includes a coupler coupled to an end of the robot arm and a plurality of skive tools extending from the coupler opposite to the robot arm, where each skive tool includes a rod extending from the coupler and a skive attached to the rod opposite to the coupler. In one embodiment, the plurality of skive tools is three skive tools positioned in a circle and spaced 120 relative to each other. Each rod is extendable and retractable from the coupler independent from the other rods so as to allow the extended skive to perform a skiving operation without interference from the other skives. The robot arm also includes a nozzle configured for dispensing a sealant onto a seam of a part, where the skives remove some of the sealant after the sealant has been dispensed.
Skive System with Skive Assembly and Cleaner
A robot arm including a skive assembly coupled thereto. The skive assembly includes a coupler coupled to an end of the robot arm and a plurality of skive tools extending from the coupler opposite to the robot arm, where each skive tool includes a rod extending from the coupler and a skive attached to the rod opposite to the coupler. In one embodiment, the plurality of skive tools is three skive tools positioned in a circle and spaced 120 relative to each other. Each rod is extendable and retractable from the coupler independent from the other rods so as to allow the extended skive to perform a skiving operation without interference from the other skives. The robot arm also includes a nozzle configured for dispensing a sealant onto a seam of a part, where the skives remove some of the sealant after the sealant has been dispensed.
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
The apparatus includes a controller for controlling a liquid discharge unit and a support unit, in which the controller controls the support unit and the liquid discharge unit so that a substrate processing operation in which a treatment solution is supplied to the substrate to process the substrate; a substrate unloading operation in which the substrate is unloaded from the processing container after the substrate processing operation; and a container cleaning operation in which the processing container is cleaned after the substrate unloading operation are sequentially performed, and in the container cleaning operation, a primary cleaning is performed by discharging the cleaning solution from a first nozzle to the support unit, and then a secondary cleaning is performed by discharging the antistatic liquid from a second nozzle to the support unit or the processing container.
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
The apparatus includes a controller for controlling a liquid discharge unit and a support unit, in which the controller controls the support unit and the liquid discharge unit so that a substrate processing operation in which a treatment solution is supplied to the substrate to process the substrate; a substrate unloading operation in which the substrate is unloaded from the processing container after the substrate processing operation; and a container cleaning operation in which the processing container is cleaned after the substrate unloading operation are sequentially performed, and in the container cleaning operation, a primary cleaning is performed by discharging the cleaning solution from a first nozzle to the support unit, and then a secondary cleaning is performed by discharging the antistatic liquid from a second nozzle to the support unit or the processing container.
BRUSH MODULE, BRUSH CLEANING DEVICE, AND BRUSH CLEANING METHOD USING THE SAME
A brush apparatus includes a core portion rotating around a length direction as an axis, a main body portion at least partially surrounding the core portion, a plurality of protrusion portions protruding from the main body portion, and a detection portion disposed in at least a part of the main body portion and the plurality of protrusion portions. The detection portion is formed of poly vinyl acetal (PVA) including detection components that react with ceria.