Patent classifications
B32B15/018
Preferably oriented nanotwinned Au film, method of preparing the same, and bonding structure comprising the same
The present invention is related to a preferably oriented nanotwinned Au film, a method of preparing the same, and a bonding structure comprising the same. The nanotwinned Au film has a thickness direction. The nanotwinned Au film is stacked along a [220] crystallographic axis orientation in the thickness direction. At least 50% by volume of the nanotwinned Au film is composed of a plurality of nanotwinned Au grains which are adjacent to each other, arranged in a direction perpendicular to the thickness direction, and stacked along a [111] crystallographic axis orientation.
ARTICLES INCLUDING A MULTI-LAYER COATING AND METHODS
Articles including a multi-layer coating and methods for applying coatings are described herein. The article may include a substrate on which the multi-layer coating is formed. In some embodiments, the coating includes multiple metallic layers.
ARTICLES INCLUDING NICKEL-FREE COATING AND METHODS
Articles including a nickel-free coating and methods for applying coatings are described herein.
LAMINATE AND METHOD FOR PRODUCING SAME
A laminate including a metallic base material, a nickel-containing plating film layer formed on the metallic base material, and a gold plating film layer formed on the nickel-containing plating film layer, in which pinholes in the gold plating film layer are sealed with a passive film having a thickness of 15 nm or greater. Also disclosed is a constituent member of a semiconductor production device including the laminate and a method for producing the laminate.
Wiring board and method for manufacturing same
A wiring board and a method for manufacturing the wiring board in which an initial Cu plated layer is formed by plating so as to cover the surface of a metallized layer and then the initial Cu plated layer is heated to be softened or melted. Copper in the softened or melted initial Cu plated layer enters into open pore portions of the metallized layer. In addition, during the heating, components of the metallized layer and components of the initial Cu plated layer are mutually thermally diffused. Consequently, when solidified later (that is, when the initial Cu plated layer becomes a lower Cu plated layer), the adhesiveness between the metallized layer and the lower Cu plated layer is improved due to, for example, an anchoring effect and a mutual thermal diffusion effect.
LAMINATE AND METHOD FOR PRODUCING SAME
A laminate including a metallic base material, a first nickel-containing plating film layer formed on the metallic base material, a gold plating film layer formed on the first nickel-containing plating film layer, a second nickel-containing plating film layer formed on the gold plating film layer, and a nickel fluoride film layer formed on the second nickel-containing plating film layer. Also disclosed is a method for producing the laminate as well as a constituent member of a semiconductor production device including the laminate.
Method of improving ductility of needle for root canal treatment devices and method of manufacturing needle for root canal treatment devices including method of improving ductility of needle for root canal treatment devices
The present disclosure relates to a method of manufacturing a needle for root canal treatment devices having improved ductility. The method of the present disclosure includes a step of manufacturing a hollow needle body in a desired shape using an alloy or a single metal, a step of filling the hollow of the needle body with a packing member, a step of heat-treating the needle body at a predetermined temperature under an inert gas atmosphere after the needle body is placed in a vacuum chamber, and a step of cooling and hardening the needle body.
METAL FOIL WITH CARRIER AND PREPARATION METHOD THEREOF
A metal foil that has a carrier and a preparation method thereof. The metal foil with a carrier comprises a carrier layer, a barrier layer, a striping layer, and a metal foil layer. The carrier layer, the barrier layer, the striping lay, and the metal foil layer are sequentially stacked, or the carrier layer, the striping layer, the barrier layer, and the metal foil layer are sequentially stacked. The diffusion depth of the carrier layer to the metal foil layer is less than or equal to 3 μm and the diffusion depth of the metal foil layer toward the carrier layer is less than or equal to 3 μm at a temperature of 20-400° C. By setting the barrier layer, the carrier layer and the metal foil layer are prevented from diffusing mutually to cause bonding at a high temperature, so that the carrier layer and the metal foil layer are easy to peel off
MAGNETIC HEAD AND MAGNETIC RECORDING DEVICE
According to one embodiment, a magnetic head includes a shield, a magnetic pole, a first magnetic layer provided between the shield and the magnetic pole, a second magnetic layer provided between the first magnetic layer and the magnetic pole, a third magnetic layer provided between the second magnetic layer and the magnetic pole, a first nonmagnetic layer provided between the shield and the first magnetic layer, a second nonmagnetic layer provided between the first magnetic layer and the second magnetic layer, a third nonmagnetic layer provided between the second magnetic layer and the third magnetic layer, and a fourth nonmagnetic layer provided between the third magnetic layer and the magnetic pole. The first and third nonmagnetic layers include one of Cu, Ag, Au, Al, and Ti. The second and fourth nonmagnetic layers include one of Ta, Pt, Ir, W, Mo, Cr, Tb, Rh, Pd, and Ru.
ELECTRICAL CONTACT ELEMENT
An electrical contact element for a plug-in connector has a metallic base body and a wear layer applied to the base body. The wear layer consists of pure ruthenium or of an alloy with the components 50-100% w/w ruthenium, 0-30% w/w nickel, 0-20% w/w chromium, 0-20% w/w cobalt, 0-20% w/w platinum and 0-1% w/w further alloy elements. A metallic intermediary layer is arranged between the base body and the wear layer, which has a thickness ranging from 1.5 μm to 4.0 μm.