A structure including a first semiconductor chip with front and rear surfaces and a cavity in the rear surface. A second semiconductor chip is mounted within the cavity. The first chip may have vias extending from the cavity to the front surface and via conductors within these vias serving to connect the additional microelectronic element to the active elements of the first chip. The structure may have a volume comparable to that of the first chip alone and yet provide the functionality of a multi-chip assembly. A composite chip incorporating a body and a layer of semiconductor material mounted on a front surface of the body similarly may have a cavity extending into the body from the rear surface and may have an additional microelectronic element mounted in such cavity.

An imaging circuit includes a first vertical trench gate and a neighboring second vertical trench gate. The imaging circuit includes a gate control circuit. The gate control circuit operates in a first operating mode to generate a first space charge region accelerating photogenerated charge carriers of a first charge-carrier type to a first collection contact in and in a second operating mode to generate a second space charge region accelerating photogenerated charge carriers of the first charge-carrier type to the first collection contact. The imaging circuit further includes an image processing circuit which determines distance information of an object based on photogenerated charge carriers of the first charge carrier type collected at the first collection contact in the first operating mode and color information of the object based on photogenerated charge carriers of the first charge carrier type collected at the first collection contact in the second operating mode.

An image sensor pixel includes a photodiode region formed in a semiconductor layer, a pinning layer and a depletion adjustment layer. The photodiode region receives visible and infrared light from a light incident side of the image sensor pixel. The pinning layer is disposed between a front surface of the semiconductor layer and the photodiode region, while the depletion adjustment layer is disposed between the pinning layer and the photodiode region. The depletion adjustment layer is configured to adjust a depletion region of the photodiode region to reduce charge carriers induced in the photodiode region by the received infrared light.

A stack-type semiconductor device includes a lower device and an upper device disposed on the lower device. The lower device includes a lower substrate, a lower interconnection on the lower substrate, a lower pad on the lower interconnection, and a lower interlayer insulating layer covering side surfaces of the lower interconnection and the lower pad. The upper device includes an upper substrate, an upper interconnection under the upper substrate, an upper pad under the upper interconnection, and an upper interlayer insulating layer covering side surfaces of the upper interconnection and the upper pad. Each of the pads has a thick portion and a thin portion. The thin portions of the pads are bonded to each other, the thick portion of the lower pad contacts the bottom of the upper interlayer insulating layer, and the thick portion of the upper pad contacts the top of the lower interlayer insulating layer.

An optical apparatus including an optical functional layer having a high refractive index and a method of manufacturing the optical apparatus are provided. The optical functional layer includes a phase change material that has a first refractive index during heat treatment in a first temperature range and has a second refractive index, which is higher than the first refractive index, during heat treatment in a second temperature range that is higher than the first temperature range. The optical functional layer may be configured to have the second refractive index by using a micro-heater without having to be deposited at a high temperature.

An apparatus is described that includes a first semiconductor chip having a first pixel array. The first pixel array has visible light sensitive pixels. The apparatus includes a second semiconductor chip having a second pixel array. The first semiconductor chip is stacked on the second semiconductor chip such that the second pixel array resides beneath the first pixel array. The second pixel array has IR light sensitive pixels for time-of-flight based depth detection.

An apparatus is described that includes a first semiconductor chip having a first pixel array. The first pixel array has visible light sensitive pixels. The apparatus includes a second semiconductor chip having a second pixel array. The first semiconductor chip is stacked on the second semiconductor chip such that the second pixel array resides beneath the first pixel array. The second pixel array has IR light sensitive pixels for time-of-flight based depth detection.

A solid state imaging device includes: a pixel array unit that has a plurality of pixels 2-dimensionally arranged in a matrix and a plurality of signal lines arranged along a column direction; A/D conversion units that are provided corresponding to the respective signal lines and convert an analog signal output from a pixel through the signal line into a digital signal; and a switching unit that switches or converts the analog signal output through each signal line into a digital signal using any of an A/D conversion unit provided corresponding to the signal line through which the analog signal is transmitted, and an A/D conversion unit provided corresponding to a signal line other than the signal line through which the analog signal is transmitted.

There is provided a solid-state imaging device including a substrate having a surface over which a plurality of photodiodes are formed, and a protection film that is transparent, has a water-proofing property, and includes a side wall part vertical to the surface of the substrate and a ceiling part covering a region surrounded by the side wall part, the side wall part and the ceiling part surrounding a region where the plurality of photodiodes are arranged over the substrate.

A two-side illuminated image sensor includes: a first optical sensor layer and a second optical sensor layer each including a plurality of optical sensing cells, and a signal wiring layer disposed between the first and second optical sensor layers. The first and second optical sensor layers may include a first color filter layer and a second color filter layer each including a plurality of color filters corresponding to the plurality of optical sensing cells.