A method for producing a semiconductor device includes depositing an oxide film containing an impurity having a first conductivity type on a substrate. A nitride film and an oxide film containing an impurity having a second conductivity type different from the first conductivity type are deposited. The oxide film having the first conductivity type, the nitride film, and the oxide film having the second conductivity type are etched to form a contact hole. Epitaxial growth is performed in the contact hole to form a pillar-shaped silicon layer. The nitride film is removed and a metal is deposited to form an output terminal.

A semiconductor device includes a third first-conductivity-type semiconductor layer on a semiconductor substrate, and a first pillar-shaped semiconductor layer on the semiconductor substrate. The first pillar-shaped semiconductor layer including a first first-conductivity-type semiconductor layer, a first body region, a second first-conductivity-type semiconductor layer, a first second-conductivity-type semiconductor layer, a second body region, a second second-conductivity-type semiconductor layer, and a third second-conductivity-type semiconductor layer. A first gate insulating film is around the first body region, and a first gate is around the first gate insulating film. A second gate insulating film is around the second body region and a second gate is around the second gate insulating film. An output terminal is connected to the second first-conductivity-type semiconductor layer and the first second-conductivity-type semiconductor layer, and a first contact connects the first gate and the second gate.

A method for integrating vertical transistors and electric fuses includes forming fins through a dielectric layer and a dummy gate stack on a substrate; thinning top portions of the fins by an etch process; epitaxially growing top source/drain regions on thinned portions of the fins in a transistor region and top cathode/anode regions on the thinned portions of the fins in a fuse region; and removing the dummy gate layer and exposing sidewalls of the fins. The fuse region is blocked to form a gate structure in the transistor region. The transistor region is blocked and the fuse region is exposed to conformally deposit a metal on exposed sidewalls of the fins. The metal is annealed to form silicided fins. Portions of the substrate are separated to form bottom source/drain regions for vertical transistors in the transistor region and bottom cathode/anode regions for fuses in the fuse region.

A method for producing a semiconductor device includes forming a fin-shaped semiconductor layer on a substrate, forming a first insulating film around the fin-shaped semiconductor layer, and a first metal film is formed around the first insulating film. A pillar-shaped semiconductor layer is formed on the fin-shaped semiconductor layer and a gate insulating film is formed around the pillar-shaped semiconductor layer. A gate electrode is formed around the gate insulating film, the gate electrode being made of a third metal, and a gate line is connected to the gate electrode. A second insulating film is formed around a sidewall of an upper portion of the pillar-shaped semiconductor layer, and a second metal film is formed around the second insulating film.

A semiconductor device includes a fin-shaped semiconductor layer, a first insulating film around the fin-shaped semiconductor layer, and a first metal film around the first insulating film. A pillar-shaped semiconductor layer is on the fin-shaped semiconductor layer, and a gate insulating film is around the pillar-shaped semiconductor layer. A gate electrode is around the gate insulating film and is made of a third metal. A gate line is connected to the gate electrode, and an upper portion of the fin-shaped semiconductor layer and the first metal film are electrically connected to each other.

An SGT is produced by forming a first insulating film around a fin-shaped semiconductor layer, forming a pillar-shaped semiconductor layer in an upper portion of the fin-shaped layer, forming a second insulating film, a polysilicon gate electrode covering the second insulating film, and a polysilicon gate line, forming a diffusion layer in an upper portion of the fin-shaped layer and a lower portion of the pillar-shaped layer, forming a metal-semiconductor compound in an upper portion of the diffusion layer in the fin-shaped layer, depositing an interlayer insulating film, exposing and etching the polysilicon gate electrode and gate line, depositing a first metal, forming a metal gate electrode and a metal gate line, and forming a third metal sidewall on an upper side wall of the pillar-shaped layer. The third metal sidewall is connected to an upper surface of the pillar-shaped layer.

Energy-filtered cold electron devices use electron energy filtering through discrete energy levels of quantum wells or quantum dots that are formed through band bending of tunneling barrier conduction band. These devices can obtain low effective electron temperatures of less than or equal to 45K at room temperature, steep electrical current turn-on/turn-off capabilities with a steepness of less than or equal to 10 mV/decade at room temperature, subthreshold swings of less than or equal to 10 mV/decade at room temperature, and/or supply voltages of less than or equal to 0.1 V.

A semiconductor device including a semiconductor substrate including a plurality of active regions and a device isolation region for isolating the plurality of active regions; and a buried bit line and a buried gate electrode which are formed in the semiconductor substrate. The device isolation region includes a first device isolation region extending in a first direction and a second device isolation region extending in a second direction crossing with the first direction and having a shield pillar formed therein.

A device includes a vertical transistor comprising a first buried layer over a substrate, a first well over the first buried layer, a first gate in a first trench, wherein the first trench is formed partially through the first buried layer, and wherein a dielectric layer and the first gate are in the first trench, a second gate in a second trench, wherein the second trench is formed partially through the first buried layer, and wherein the second trench is of a same depth as the first trench, a first drain/source region and a second drain/source region formed on opposite sides of the first trench and a first lateral transistor comprising a second buried layer formed over the substrate, a second well over the second buried layer and drain/source regions over the second well.

A semiconductor component including: a semiconductor substrate; and a semiconductor device provided thereon, the device being a field-effect transistor that includes: a gate insulating film provided on the substrate; a gate electrode provided via the film; and a pair of source-drain regions provided to sandwich the electrode, the substrate including a patterned surface in a portion where the electrode is provided, the patterned surface of the substrate including a raised portion where the film is formed to cover a surface that lies on the same plane as a surface of the pair of source-drain regions, and the electrode is formed on a top surface of the film, and the patterned surface of the substrate including a recessed portion where the film is formed to cover surfaces of a groove formed toward the interior than the surface of the pair of source-drain regions, and the electrode is formed so as to fill the groove provided with the film.