A fitting for an upper brush in a double brush scrubbing chamber of a wafer cleaning system is disclosed. The fitting includes a base plate, a flanged pipe, and a threaded connector. The base plate includes a threaded hole with a stop surface therein and a channel extending from the stop surface through a lower surface of the base plate. The flanged pipe is inserted into the base plate such that the flange at the top end of a hollow tube rests on the stop surface and the hollow tube passes through the channel of the base plate. The threaded connector has a passage therethrough, and engages the threaded hole of the base plate to fix the flanged pipe in place. This structure is able to provide fluid while minimizing particle generation.

A cleaning system for cleaning a circular panel or any other circular surface is provided. The system has a base mechanically fastened to the circular panel. An axis stub pivotally connected to the base and attached to a pivot member provides rotation for a blade set. The blade set includes a first blade and a second blade configured to rotate independently about the pivot member in either a clockwise or a counter clockwise direction, wherein the second blade is configured to sit above the first bade, each blade having at least one row of sprinkler holes positioned on each side of the blade running lengthwise. The at least one row of sprinkler holes are configured to eject a fluid to either clean, cool, or thaw the circular panel. The first blade includes a roller having cleaning implements configured to clean the circular panel as the first blade rotates about the pivot member.

A cleaning system for cleaning a circular panel or any other circular surface is provided. The system has a base mechanically fastened to the circular panel. An axis stub pivotally connected to the base and attached to a pivot member provides rotation for a blade set. The blade set includes a first blade and a second blade configured to rotate independently about the pivot member in either a clockwise or a counter clockwise direction, wherein the second blade is configured to sit above the first bade, each blade having at least one row of sprinkler holes positioned on each side of the blade running lengthwise. The at least one row of sprinkler holes are configured to eject a fluid to either clean, cool, or thaw the circular panel. The first blade includes a roller having cleaning implements configured to clean the circular panel as the first blade rotates about the pivot member.

A method for automatically cleaning a probe card includes the following operations. A first wafer is tested in a chamber of a testing machine. A yield of the first wafer is monitored by a tool online monitor system (TOMS). An instruction file is transmitted by the TOMS to a tester, in which the instruction file compiles a first program code of the TOMS into a second program code of the tester. The second program code of the tester is received by the tester. A general purpose interface bus (GPIB) command is transferred to a testing machine by the tester. A cleaning operation is performed by the testing machine.

The robotic device conducts an action on a curved ferromagnetic surface. The robotic device includes a chassis platform and at least one magnetic side drive module. The chassis platform rolls on the curved ferromagnetic surface and is maintained thereon by virtue of the curved ferromagnetic surface being ferromagnetic. The at least one magnetic side drive module is pivotally attached to the chassis platform and is for conducting the action on the curved ferromagnetic surface as the chassis platform rolls on the curved ferromagnetic surface.

The robotic device conducts an action on a curved ferromagnetic surface. The robotic device includes a chassis platform and at least one magnetic side drive module. The chassis platform rolls on the curved ferromagnetic surface and is maintained thereon by virtue of the curved ferromagnetic surface being ferromagnetic. The at least one magnetic side drive module is pivotally attached to the chassis platform and is for conducting the action on the curved ferromagnetic surface as the chassis platform rolls on the curved ferromagnetic surface.

The present invention relates to an apparatus for cleaning press rolls for electrodes, comprising two or more cleaning units provided with cleaning members having grains. According to the present invention, the apparatus for cleaning press rolls for electrodes comprises a plurality of, i.e., two or more, cleaning units, wherein the cleaning units respectively comprise cleaning members having grains with different directions, thus allowing a residual cleaning solution and contaminants to be effectively removed. In addition, when press rolls are cleaned using the apparatus for cleaning press rolls according to the present invention, an aqueous cleaning solution and an alcoholic cleaning solution, which have different properties, can be used together, and after cleaning, the cleaning solutions do not remain on the press rolls, and thus subsequently, secondary contamination of electrodes is prevented, and accordingly, when electrodes are manufactured, the occurrence of defects in the electrodes can be reduced.

The present invention relates to an apparatus for cleaning press rolls for electrodes, comprising two or more cleaning units provided with cleaning members having grains. According to the present invention, the apparatus for cleaning press rolls for electrodes comprises a plurality of, i.e., two or more, cleaning units, wherein the cleaning units respectively comprise cleaning members having grains with different directions, thus allowing a residual cleaning solution and contaminants to be effectively removed. In addition, when press rolls are cleaned using the apparatus for cleaning press rolls according to the present invention, an aqueous cleaning solution and an alcoholic cleaning solution, which have different properties, can be used together, and after cleaning, the cleaning solutions do not remain on the press rolls, and thus subsequently, secondary contamination of electrodes is prevented, and accordingly, when electrodes are manufactured, the occurrence of defects in the electrodes can be reduced.

A self-cleaning ion generator device includes a housing having a bottom portion and a top portion selectively secured to each other, the top portion contains a base portion extending to an outer edge and having an internal side and an external side, a first pair of opposed sidewalls and a second pair of opposed sidewalls extend from the outer edge of the base portion forming a cavity therein. Ion terminals extend from the housing, and a cleaning apparatus for cleaning the two ion terminals.

A self-cleaning ion generator device includes a housing having a bottom portion and a top portion selectively secured to each other, the top portion contains a base portion extending to an outer edge and having an internal side and an external side, a first pair of opposed sidewalls and a second pair of opposed sidewalls extend from the outer edge of the base portion forming a cavity therein. Ion terminals extend from the housing, and a cleaning apparatus for cleaning the two ion terminals.